DE2523719A1 - Lichtempfindliche elemente - Google Patents

Lichtempfindliche elemente

Info

Publication number
DE2523719A1
DE2523719A1 DE19752523719 DE2523719A DE2523719A1 DE 2523719 A1 DE2523719 A1 DE 2523719A1 DE 19752523719 DE19752523719 DE 19752523719 DE 2523719 A DE2523719 A DE 2523719A DE 2523719 A1 DE2523719 A1 DE 2523719A1
Authority
DE
Germany
Prior art keywords
water
photosensitive
layer
soluble
permeable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752523719
Other languages
German (de)
English (en)
Inventor
Shizuo Miyano
Hiroshi Takahashi
Teruhiko Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2523719A1 publication Critical patent/DE2523719A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE19752523719 1974-05-29 1975-05-28 Lichtempfindliche elemente Withdrawn DE2523719A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6042374A JPS50152803A (fr) 1974-05-29 1974-05-29

Publications (1)

Publication Number Publication Date
DE2523719A1 true DE2523719A1 (de) 1975-12-11

Family

ID=13141775

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752523719 Withdrawn DE2523719A1 (de) 1974-05-29 1975-05-28 Lichtempfindliche elemente

Country Status (2)

Country Link
JP (1) JPS50152803A (fr)
DE (1) DE2523719A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3236602A1 (de) * 1981-10-02 1983-04-21 Kimoto & Co. Ltd., Tokyo Lichtempfindliches maskiermaterial zur herstellung einer platte
EP0162691A2 (fr) * 1984-05-25 1985-11-27 W.R. Grace & Co. Plaque lithographique négative développable à l'eau
EP0175244A2 (fr) * 1984-09-15 1986-03-26 Hoechst Aktiengesellschaft Matériel photosensible pour l'enregistrement et procédé de fabrication
EP0335330A2 (fr) * 1988-03-28 1989-10-04 Kansai Paint Co., Ltd. Procédé de revêtement par électrodéposition de photoréserves pour circuits imprimés
WO1992005474A1 (fr) * 1990-09-18 1992-04-02 International Business Machines Corporation Revetement superficiel pour vernis a masquer catalyses par acide
EP0511659A1 (fr) * 1991-04-30 1992-11-04 Fuji Photo Film Co., Ltd. Procédé de traitement de matériaux de copie photosensibles

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS58178348A (ja) * 1982-04-13 1983-10-19 Nippon Synthetic Chem Ind Co Ltd:The 画像形成法
JPS59177544A (ja) * 1983-03-29 1984-10-08 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法
DE69126586T2 (de) * 1990-08-30 1997-11-27 At & T Corp Verfahren zur Herstellung einer Vorrichtung

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3236602A1 (de) * 1981-10-02 1983-04-21 Kimoto & Co. Ltd., Tokyo Lichtempfindliches maskiermaterial zur herstellung einer platte
EP0162691A2 (fr) * 1984-05-25 1985-11-27 W.R. Grace & Co. Plaque lithographique négative développable à l'eau
EP0162691A3 (fr) * 1984-05-25 1987-04-15 W.R. Grace & Co. Plaque lithographique négative développable à l'eau
EP0175244A2 (fr) * 1984-09-15 1986-03-26 Hoechst Aktiengesellschaft Matériel photosensible pour l'enregistrement et procédé de fabrication
EP0175244A3 (en) * 1984-09-15 1987-01-14 Hoechst Aktiengesellschaft Light-sensitive registration material and process for its production
EP0335330A2 (fr) * 1988-03-28 1989-10-04 Kansai Paint Co., Ltd. Procédé de revêtement par électrodéposition de photoréserves pour circuits imprimés
EP0335330A3 (en) * 1988-03-28 1990-04-11 Kansai Paint Co. Ltd. Electrodeposition coating process of photoresist for printed circuit board
WO1992005474A1 (fr) * 1990-09-18 1992-04-02 International Business Machines Corporation Revetement superficiel pour vernis a masquer catalyses par acide
EP0511659A1 (fr) * 1991-04-30 1992-11-04 Fuji Photo Film Co., Ltd. Procédé de traitement de matériaux de copie photosensibles
US5326674A (en) * 1991-04-30 1994-07-05 Fuji Photo Film Co., Ltd. Method for processing photosensitive copying materials

Also Published As

Publication number Publication date
JPS50152803A (fr) 1975-12-09

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee