JPS50152803A - - Google Patents

Info

Publication number
JPS50152803A
JPS50152803A JP6042374A JP6042374A JPS50152803A JP S50152803 A JPS50152803 A JP S50152803A JP 6042374 A JP6042374 A JP 6042374A JP 6042374 A JP6042374 A JP 6042374A JP S50152803 A JPS50152803 A JP S50152803A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6042374A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6042374A priority Critical patent/JPS50152803A/ja
Priority to DE19752523719 priority patent/DE2523719A1/de
Publication of JPS50152803A publication Critical patent/JPS50152803A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP6042374A 1974-05-29 1974-05-29 Pending JPS50152803A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6042374A JPS50152803A (ja) 1974-05-29 1974-05-29
DE19752523719 DE2523719A1 (de) 1974-05-29 1975-05-28 Lichtempfindliche elemente

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6042374A JPS50152803A (ja) 1974-05-29 1974-05-29

Publications (1)

Publication Number Publication Date
JPS50152803A true JPS50152803A (ja) 1975-12-09

Family

ID=13141775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6042374A Pending JPS50152803A (ja) 1974-05-29 1974-05-29

Country Status (2)

Country Link
JP (1) JPS50152803A (ja)
DE (1) DE2523719A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS58178348A (ja) * 1982-04-13 1983-10-19 Nippon Synthetic Chem Ind Co Ltd:The 画像形成法
JPS59177544A (ja) * 1983-03-29 1984-10-08 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法
JPH0529212A (ja) * 1990-08-30 1993-02-05 American Teleph & Telegr Co <Att> デバイスの製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3433911A1 (de) * 1984-09-15 1986-03-27 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
CA1337864C (en) * 1988-03-28 1996-01-02 Isao Kobayashi Electrodeposition coating process of photoresist for printed circuit board
JPH05507154A (ja) * 1990-09-18 1993-10-14 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 酸触媒レジスト用保護膜
US5326674A (en) * 1991-04-30 1994-07-05 Fuji Photo Film Co., Ltd. Method for processing photosensitive copying materials

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS58178348A (ja) * 1982-04-13 1983-10-19 Nippon Synthetic Chem Ind Co Ltd:The 画像形成法
JPH0229207B2 (ja) * 1982-04-13 1990-06-28 Nippon Synthetic Chem Ind
JPS59177544A (ja) * 1983-03-29 1984-10-08 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法
JPH0368378B2 (ja) * 1983-03-29 1991-10-28 Nippon Synthetic Chem Ind
JPH0529212A (ja) * 1990-08-30 1993-02-05 American Teleph & Telegr Co <Att> デバイスの製造方法

Also Published As

Publication number Publication date
DE2523719A1 (de) 1975-12-11

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