DE2517656B2 - Photopolymerisierbares Gemisch und dieses enthaltendes Aufzeichnungsmaterial - Google Patents

Photopolymerisierbares Gemisch und dieses enthaltendes Aufzeichnungsmaterial

Info

Publication number
DE2517656B2
DE2517656B2 DE19752517656 DE2517656A DE2517656B2 DE 2517656 B2 DE2517656 B2 DE 2517656B2 DE 19752517656 DE19752517656 DE 19752517656 DE 2517656 A DE2517656 A DE 2517656A DE 2517656 B2 DE2517656 B2 DE 2517656B2
Authority
DE
Germany
Prior art keywords
film
binder
photopolymerizable
weight
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19752517656
Other languages
German (de)
English (en)
Other versions
DE2517656A1 (de
Inventor
Ernst New Brunswick Leberzammer
Leo New Shrewsbury Roos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE2517656A1 publication Critical patent/DE2517656A1/de
Publication of DE2517656B2 publication Critical patent/DE2517656B2/de
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
DE19752517656 1974-04-23 1975-04-22 Photopolymerisierbares Gemisch und dieses enthaltendes Aufzeichnungsmaterial Ceased DE2517656B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (2)

Publication Number Publication Date
DE2517656A1 DE2517656A1 (de) 1975-10-30
DE2517656B2 true DE2517656B2 (de) 1980-11-13

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752517656 Ceased DE2517656B2 (de) 1974-04-23 1975-04-22 Photopolymerisierbares Gemisch und dieses enthaltendes Aufzeichnungsmaterial

Country Status (6)

Country Link
JP (1) JPS556210B2 (enrdf_load_stackoverflow)
BE (1) BE828237A (enrdf_load_stackoverflow)
CA (1) CA1056189A (enrdf_load_stackoverflow)
DE (1) DE2517656B2 (enrdf_load_stackoverflow)
FR (1) FR2269108B1 (enrdf_load_stackoverflow)
GB (1) GB1507704A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
DE3814566C1 (enrdf_load_stackoverflow) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung
DE2812016A1 (de) * 1977-03-22 1978-09-28 Du Pont Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
JP2756623B2 (ja) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 光重合性組成物
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
WO2015117100A1 (en) 2014-02-02 2015-08-06 Molaire Consulting Llc Noncrystallizable sensitized layers for oled and oeds

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (enrdf_load_stackoverflow) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702C3 (de) * 1971-05-13 1988-05-26 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
DE3814566C1 (enrdf_load_stackoverflow) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De

Also Published As

Publication number Publication date
CA1056189A (en) 1979-06-12
GB1507704A (en) 1978-04-19
JPS50147323A (enrdf_load_stackoverflow) 1975-11-26
FR2269108B1 (enrdf_load_stackoverflow) 1981-10-30
FR2269108A1 (enrdf_load_stackoverflow) 1975-11-21
JPS556210B2 (enrdf_load_stackoverflow) 1980-02-14
DE2517656A1 (de) 1975-10-30
BE828237A (fr) 1975-10-22

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Legal Events

Date Code Title Description
8263 Opposition against grant of a patent
8235 Patent refused