BE828237A - Compositions photopolymerisables developpables par des solutions alcalines aqueuses - Google Patents
Compositions photopolymerisables developpables par des solutions alcalines aqueusesInfo
- Publication number
- BE828237A BE828237A BE155651A BE155651A BE828237A BE 828237 A BE828237 A BE 828237A BE 155651 A BE155651 A BE 155651A BE 155651 A BE155651 A BE 155651A BE 828237 A BE828237 A BE 828237A
- Authority
- BE
- Belgium
- Prior art keywords
- aqueous alkaline
- alkaline solutions
- photopolymerisable compositions
- developable
- compositions developable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46331074A | 1974-04-23 | 1974-04-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE828237A true BE828237A (fr) | 1975-10-22 |
Family
ID=23839658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE155651A BE828237A (fr) | 1974-04-23 | 1975-04-22 | Compositions photopolymerisables developpables par des solutions alcalines aqueuses |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS556210B2 (xx) |
BE (1) | BE828237A (xx) |
CA (1) | CA1056189A (xx) |
DE (1) | DE2517656B2 (xx) |
FR (1) | FR2269108B1 (xx) |
GB (1) | GB1507704A (xx) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2361680A1 (fr) * | 1976-08-11 | 1978-03-10 | Du Pont | Plaques d'impression planographiques et leur preparation |
DE2812016A1 (de) * | 1977-03-22 | 1978-09-28 | Du Pont | Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen |
US4176028A (en) * | 1977-03-22 | 1979-11-27 | E. I. Du Pont De Nemours And Company | Plastisols made with polyelectrolyte binders |
DE2812015C3 (de) * | 1977-03-22 | 1984-05-24 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung |
CA1127340A (en) * | 1977-12-30 | 1982-07-06 | Kohtaro Nagasawa | Photocurable light-sensitive composition and material |
US4247623A (en) | 1979-06-18 | 1981-01-27 | Eastman Kodak Company | Blank beam leads for IC chip bonding |
US4342151A (en) | 1979-06-18 | 1982-08-03 | Eastman Kodak Company | Blank and process for the formation of beam leads for IC chip bonding |
JPS5619752A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Chemical Co Ltd | Photosensitive resin composition laminate |
US4341860A (en) | 1981-06-08 | 1982-07-27 | E. I. Du Pont De Nemours And Company | Photoimaging compositions containing substituted cyclohexadienone compounds |
DD250593A1 (de) * | 1984-04-03 | 1987-10-14 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
DE3621477A1 (de) * | 1985-06-26 | 1987-01-08 | Canon Kk | Durch strahlen mit wirksamer energie haertbare harzmischung |
US5182187A (en) * | 1988-02-24 | 1993-01-26 | Hoechst Aktiengesellschaft | Radiation-polymerizable composition and recording material prepared from this composition |
DE3814566C1 (xx) * | 1988-04-29 | 1989-11-16 | Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De | |
JP2756623B2 (ja) * | 1992-02-26 | 1998-05-25 | 富士写真フイルム株式会社 | 光重合性組成物 |
EP1783548B1 (en) | 2005-11-08 | 2017-03-08 | Rohm and Haas Electronic Materials LLC | Method of forming a patterned layer on a substrate |
WO2015117100A1 (en) | 2014-02-02 | 2015-08-06 | Molaire Consulting Llc | Noncrystallizable sensitized layers for oled and oeds |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL218803A (xx) * | 1956-07-09 | |||
DE1296975B (de) * | 1967-11-09 | 1969-06-04 | Kalle Ag | Lichtempfindliches Gemisch |
BE772251A (fr) * | 1970-09-07 | Kalle Ag | Composes photopolymerisables | |
DE2053363C3 (de) * | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
DE2064080C3 (de) * | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
ZA72345B (en) * | 1971-02-04 | 1973-03-28 | Dynachem Corp | Polymerization compositions and processes |
DE2123702C3 (de) * | 1971-05-13 | 1988-05-26 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
GB1425423A (en) * | 1972-04-26 | 1976-02-18 | Eastman Kodak Co | Photopolymerisable compositions |
-
1975
- 1975-04-21 CA CA225,215A patent/CA1056189A/en not_active Expired
- 1975-04-21 GB GB1641275A patent/GB1507704A/en not_active Expired
- 1975-04-22 FR FR7512476A patent/FR2269108B1/fr not_active Expired
- 1975-04-22 DE DE19752517656 patent/DE2517656B2/de not_active Ceased
- 1975-04-22 BE BE155651A patent/BE828237A/xx not_active IP Right Cessation
- 1975-04-23 JP JP4875075A patent/JPS556210B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2269108A1 (xx) | 1975-11-21 |
GB1507704A (en) | 1978-04-19 |
JPS50147323A (xx) | 1975-11-26 |
FR2269108B1 (xx) | 1981-10-30 |
JPS556210B2 (xx) | 1980-02-14 |
CA1056189A (en) | 1979-06-12 |
DE2517656B2 (de) | 1980-11-13 |
DE2517656A1 (de) | 1975-10-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: E.I. DU PONT DE NEMOURS AND CY Effective date: 19890430 |