FR2269108A1 - - Google Patents

Info

Publication number
FR2269108A1
FR2269108A1 FR7512476A FR7512476A FR2269108A1 FR 2269108 A1 FR2269108 A1 FR 2269108A1 FR 7512476 A FR7512476 A FR 7512476A FR 7512476 A FR7512476 A FR 7512476A FR 2269108 A1 FR2269108 A1 FR 2269108A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7512476A
Other languages
French (fr)
Other versions
FR2269108B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2269108A1 publication Critical patent/FR2269108A1/fr
Application granted granted Critical
Publication of FR2269108B1 publication Critical patent/FR2269108B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
FR7512476A 1974-04-23 1975-04-22 Expired FR2269108B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (2)

Publication Number Publication Date
FR2269108A1 true FR2269108A1 (enrdf_load_stackoverflow) 1975-11-21
FR2269108B1 FR2269108B1 (enrdf_load_stackoverflow) 1981-10-30

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7512476A Expired FR2269108B1 (enrdf_load_stackoverflow) 1974-04-23 1975-04-22

Country Status (6)

Country Link
JP (1) JPS556210B2 (enrdf_load_stackoverflow)
BE (1) BE828237A (enrdf_load_stackoverflow)
CA (1) CA1056189A (enrdf_load_stackoverflow)
DE (1) DE2517656B2 (enrdf_load_stackoverflow)
FR (1) FR2269108B1 (enrdf_load_stackoverflow)
GB (1) GB1507704A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
FR2384813A1 (fr) * 1977-03-22 1978-10-20 Du Pont Plastisols et organosols acryliques et leurs applications
FR2384812A1 (fr) * 1977-03-22 1978-10-20 Du Pont Plastisols et organosols prepares avec des liants polyelectrolytes
FR2385761A1 (fr) * 1977-03-22 1978-10-27 Du Pont Plastisols et organosols acryliques, compositions et elements photosensibles formes a partir d'eux
FR2413689A1 (fr) * 1977-12-30 1979-07-27 Somar Mfg Compositions de matieres sensibles a la lumiere, photodurcissables
FR2609186A1 (fr) * 1984-04-03 1988-07-01 Wolfen Filmfab Veb Matiere photopolymerisable

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
DE3814566C1 (enrdf_load_stackoverflow) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De
JP2756623B2 (ja) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 光重合性組成物
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
WO2015117100A1 (en) 2014-02-02 2015-08-06 Molaire Consulting Llc Noncrystallizable sensitized layers for oled and oeds

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (enrdf_load_stackoverflow) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702C3 (de) * 1971-05-13 1988-05-26 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
FR2384813A1 (fr) * 1977-03-22 1978-10-20 Du Pont Plastisols et organosols acryliques et leurs applications
FR2384812A1 (fr) * 1977-03-22 1978-10-20 Du Pont Plastisols et organosols prepares avec des liants polyelectrolytes
FR2385761A1 (fr) * 1977-03-22 1978-10-27 Du Pont Plastisols et organosols acryliques, compositions et elements photosensibles formes a partir d'eux
FR2413689A1 (fr) * 1977-12-30 1979-07-27 Somar Mfg Compositions de matieres sensibles a la lumiere, photodurcissables
FR2609186A1 (fr) * 1984-04-03 1988-07-01 Wolfen Filmfab Veb Matiere photopolymerisable

Also Published As

Publication number Publication date
CA1056189A (en) 1979-06-12
GB1507704A (en) 1978-04-19
JPS50147323A (enrdf_load_stackoverflow) 1975-11-26
FR2269108B1 (enrdf_load_stackoverflow) 1981-10-30
JPS556210B2 (enrdf_load_stackoverflow) 1980-02-14
DE2517656B2 (de) 1980-11-13
DE2517656A1 (de) 1975-10-30
BE828237A (fr) 1975-10-22

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Legal Events

Date Code Title Description
ST Notification of lapse