JPS50147323A - - Google Patents

Info

Publication number
JPS50147323A
JPS50147323A JP50048750A JP4875075A JPS50147323A JP S50147323 A JPS50147323 A JP S50147323A JP 50048750 A JP50048750 A JP 50048750A JP 4875075 A JP4875075 A JP 4875075A JP S50147323 A JPS50147323 A JP S50147323A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50048750A
Other languages
Japanese (ja)
Other versions
JPS556210B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50147323A publication Critical patent/JPS50147323A/ja
Publication of JPS556210B2 publication Critical patent/JPS556210B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP4875075A 1974-04-23 1975-04-23 Expired JPS556210B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (2)

Publication Number Publication Date
JPS50147323A true JPS50147323A (enrdf_load_stackoverflow) 1975-11-26
JPS556210B2 JPS556210B2 (enrdf_load_stackoverflow) 1980-02-14

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4875075A Expired JPS556210B2 (enrdf_load_stackoverflow) 1974-04-23 1975-04-23

Country Status (6)

Country Link
JP (1) JPS556210B2 (enrdf_load_stackoverflow)
BE (1) BE828237A (enrdf_load_stackoverflow)
CA (1) CA1056189A (enrdf_load_stackoverflow)
DE (1) DE2517656B2 (enrdf_load_stackoverflow)
FR (1) FR2269108B1 (enrdf_load_stackoverflow)
GB (1) GB1507704A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung
DE2812016A1 (de) * 1977-03-22 1978-09-28 Du Pont Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
DE3814566C1 (enrdf_load_stackoverflow) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De
JP2756623B2 (ja) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 光重合性組成物
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
WO2015117100A1 (en) 2014-02-02 2015-08-06 Molaire Consulting Llc Noncrystallizable sensitized layers for oled and oeds

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845227A (enrdf_load_stackoverflow) * 1970-12-28 1973-06-28

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (enrdf_load_stackoverflow) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702C3 (de) * 1971-05-13 1988-05-26 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845227A (enrdf_load_stackoverflow) * 1970-12-28 1973-06-28

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate

Also Published As

Publication number Publication date
CA1056189A (en) 1979-06-12
GB1507704A (en) 1978-04-19
FR2269108B1 (enrdf_load_stackoverflow) 1981-10-30
FR2269108A1 (enrdf_load_stackoverflow) 1975-11-21
JPS556210B2 (enrdf_load_stackoverflow) 1980-02-14
DE2517656B2 (de) 1980-11-13
DE2517656A1 (de) 1975-10-30
BE828237A (fr) 1975-10-22

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