DE2448821C2 - Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial - Google Patents
Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und SchichtübertragungsmaterialInfo
- Publication number
- DE2448821C2 DE2448821C2 DE19742448821 DE2448821A DE2448821C2 DE 2448821 C2 DE2448821 C2 DE 2448821C2 DE 19742448821 DE19742448821 DE 19742448821 DE 2448821 A DE2448821 A DE 2448821A DE 2448821 C2 DE2448821 C2 DE 2448821C2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- copper
- photopolymerizable
- photopolymerizable layer
- adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742448821 DE2448821C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
IT5172675A IT1048315B (it) | 1974-10-14 | 1975-10-10 | Procedimento per l applicazione di uno strato di copiatura e materiale di riporto per realizzarlo |
CH1317375A CH599575A5 (fr) | 1974-10-14 | 1975-10-10 | |
CA237,470A CA1075955A (fr) | 1974-10-14 | 1975-10-10 | Couche de copie photopolymerisable et thermoplastique, contenant un derive d'amide d'un acide benzene-mercaptoalcanoique |
JP12315275A JPS588496B2 (ja) | 1974-10-14 | 1975-10-13 | コウジユウゴウセイフクシヤソウオホドコスホウホウ |
FR7531234A FR2288336A1 (fr) | 1974-10-14 | 1975-10-13 | Procede pour appliquer une couche reprographique photopolymerisable (cas 1) |
BE160896A BE834453A (fr) | 1974-10-14 | 1975-10-13 | Procede pour appliquer une couche reprographique |
SE7511439A SE402653B (sv) | 1974-10-14 | 1975-10-13 | Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering |
GB4180175A GB1530288A (en) | 1974-10-14 | 1975-10-13 | Photopolymerisable copying materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742448821 DE2448821C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2448821A1 DE2448821A1 (de) | 1976-04-22 |
DE2448821C2 true DE2448821C2 (de) | 1986-01-30 |
Family
ID=5928227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19742448821 Expired DE2448821C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS588496B2 (fr) |
BE (1) | BE834453A (fr) |
CA (1) | CA1075955A (fr) |
CH (1) | CH599575A5 (fr) |
DE (1) | DE2448821C2 (fr) |
FR (1) | FR2288336A1 (fr) |
GB (1) | GB1530288A (fr) |
IT (1) | IT1048315B (fr) |
SE (1) | SE402653B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4234423A1 (de) * | 1992-10-13 | 1994-04-21 | Imm Inst Mikrotech | Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2849894A1 (de) | 1978-11-17 | 1980-05-29 | Hoechst Ag | Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen |
JPS59122898U (ja) * | 1983-02-07 | 1984-08-18 | 松下電器産業株式会社 | 衣類乾燥機 |
DE3909003A1 (de) * | 1989-03-18 | 1990-09-27 | Basf Ag | Photopolymerisierbares schichtuebertragungsmaterial |
US5320933A (en) * | 1990-03-30 | 1994-06-14 | Morton International, Inc. | Photoimageable composition having improved adhesion promoter |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA943803A (en) * | 1970-04-02 | 1974-03-19 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and process of applying same |
NL7107486A (fr) * | 1970-06-11 | 1971-12-14 | ||
US3645772A (en) * | 1970-06-30 | 1972-02-29 | Du Pont | Process for improving bonding of a photoresist to copper |
CA980163A (en) * | 1970-12-23 | 1975-12-23 | Jack R. Celeste | Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds |
US3820993A (en) * | 1971-05-07 | 1974-06-28 | Horizons Research Inc | Light sensitive reproduction and electron beam sensitive material |
-
1974
- 1974-10-14 DE DE19742448821 patent/DE2448821C2/de not_active Expired
-
1975
- 1975-10-10 IT IT5172675A patent/IT1048315B/it active
- 1975-10-10 CA CA237,470A patent/CA1075955A/fr not_active Expired
- 1975-10-10 CH CH1317375A patent/CH599575A5/xx not_active IP Right Cessation
- 1975-10-13 FR FR7531234A patent/FR2288336A1/fr active Granted
- 1975-10-13 GB GB4180175A patent/GB1530288A/en not_active Expired
- 1975-10-13 SE SE7511439A patent/SE402653B/xx not_active IP Right Cessation
- 1975-10-13 BE BE160896A patent/BE834453A/fr not_active IP Right Cessation
- 1975-10-13 JP JP12315275A patent/JPS588496B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4234423A1 (de) * | 1992-10-13 | 1994-04-21 | Imm Inst Mikrotech | Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung |
Also Published As
Publication number | Publication date |
---|---|
DE2448821A1 (de) | 1976-04-22 |
SE7511439L (sv) | 1976-04-15 |
FR2288336A1 (fr) | 1976-05-14 |
GB1530288A (en) | 1978-10-25 |
SE402653B (sv) | 1978-07-10 |
JPS5164919A (ja) | 1976-06-04 |
BE834453A (fr) | 1976-04-13 |
JPS588496B2 (ja) | 1983-02-16 |
CA1075955A (fr) | 1980-04-22 |
FR2288336B1 (fr) | 1979-04-27 |
IT1048315B (it) | 1980-11-20 |
CH599575A5 (fr) | 1978-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2361041C3 (de) | Photopolymerisierbares Gemisch | |
EP0005750B1 (fr) | Mélange photopolymérisable et matière de revêtement photosensible | |
DE2064079C2 (de) | Photopolymerisierbares Gemisch | |
DE3715412C2 (fr) | ||
DE3036694A1 (de) | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch | |
DE2123702A1 (de) | Lichtempfindliches Schichtübertragungsmaterial | |
DE2822189A1 (de) | Photopolymerisierbares gemisch | |
EP0339306B1 (fr) | Composition sensible à la lumière avec des liants contenant des groupes carboxyliques | |
DE2064080B2 (de) | lichtempfindliches Gemisch | |
DE2363806B2 (de) | Lichtempfindliches Gemisch | |
DE2602410A1 (de) | Verfahren zur herstellung eines fotoaetzgrundes und fotopolymerisierbare masse hierfuer | |
DE2027467B2 (de) | Photopolymerisierbare Kopiermasse | |
DE2039861B2 (de) | Photopolymerisierbare kopiermasse | |
DE2522057A1 (de) | Verfahren zur herstellung von druckbildern, insbesondere gedruckten schaltungen, und druckfarben zur durchfuehrung des verfahrens | |
DE2063571B2 (de) | Fotopolymerisierbares Gemisch und ein Verfahren zur Herstellung von reliefartigen Aufzeichnungen | |
DE1079949B (de) | Lichtempfindliche Kopierschicht | |
DE2830622A1 (de) | Verfahren zur bilderzeugung und dafuer verwendbares lichtempfindliches element | |
EP0141921B1 (fr) | Mélange photopolymérisable et matériel pour l'enregistrement fabriqué à partir de ce mélange | |
DE2448850C2 (de) | Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial | |
EP0222320B1 (fr) | Composition photopolymérisable, matériau d'enregistrement préparé avec cette composition et procédé pour fabriquer des images en relief | |
DE2517656B2 (de) | Photopolymerisierbares Gemisch und dieses enthaltendes Aufzeichnungsmaterial | |
DE2448821C2 (de) | Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial | |
EP0013310B1 (fr) | Procédé de fabrication d'une image photorésist | |
DE2723613A1 (de) | Bildherstellungsverfahren mittels polymerer photolackmuster | |
DE2057473C2 (de) | Lichtempfindliches Gemisch |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OD | Request for examination | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition |