DE2445480A1 - Verfahren zur herstellung eines leistungstransistors - Google Patents
Verfahren zur herstellung eines leistungstransistorsInfo
- Publication number
- DE2445480A1 DE2445480A1 DE19742445480 DE2445480A DE2445480A1 DE 2445480 A1 DE2445480 A1 DE 2445480A1 DE 19742445480 DE19742445480 DE 19742445480 DE 2445480 A DE2445480 A DE 2445480A DE 2445480 A1 DE2445480 A1 DE 2445480A1
- Authority
- DE
- Germany
- Prior art keywords
- zone
- emitter
- base
- base zone
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H10P10/00—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H10P95/00—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/05—Etch and refill
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/139—Schottky barrier
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/145—Shaped junctions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742445480 DE2445480A1 (de) | 1974-09-24 | 1974-09-24 | Verfahren zur herstellung eines leistungstransistors |
| US05/589,276 US3970487A (en) | 1974-09-24 | 1975-06-16 | Method of manufacturing a power transistor |
| GB32784/75A GB1501894A (en) | 1974-09-24 | 1975-08-06 | Method of manufacturing a power transistor |
| FR7526330A FR2286503A1 (fr) | 1974-09-24 | 1975-08-19 | Procede de fabrication d'un transistor de puissance |
| JP50103108A JPS5151289A (enExample) | 1974-09-24 | 1975-08-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742445480 DE2445480A1 (de) | 1974-09-24 | 1974-09-24 | Verfahren zur herstellung eines leistungstransistors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2445480A1 true DE2445480A1 (de) | 1976-04-01 |
Family
ID=5926552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742445480 Withdrawn DE2445480A1 (de) | 1974-09-24 | 1974-09-24 | Verfahren zur herstellung eines leistungstransistors |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3970487A (enExample) |
| JP (1) | JPS5151289A (enExample) |
| DE (1) | DE2445480A1 (enExample) |
| FR (1) | FR2286503A1 (enExample) |
| GB (1) | GB1501894A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL184589C (nl) * | 1979-07-13 | 1989-09-01 | Philips Nv | Halfgeleiderinrichting voor het opwekken van een elektronenbundel en werkwijze voor het vervaardigen van een dergelijke halfgeleiderinrichting. |
| US4954455A (en) * | 1984-12-18 | 1990-09-04 | Advanced Micro Devices | Semiconductor memory device having protection against alpha strike induced errors |
| IT1298516B1 (it) * | 1998-01-30 | 2000-01-12 | Sgs Thomson Microelectronics | Dispositivo elettronico di potenza integrato su un materiale semiconduttore e relativo processo di fabricazione |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6502122A (enExample) * | 1964-02-24 | 1965-08-25 | ||
| FR1488176A (fr) * | 1965-08-02 | 1967-07-07 | Gen Electric | Perfectionnements aux dispositifs à semiconducteurs |
| US3678573A (en) * | 1970-03-10 | 1972-07-25 | Westinghouse Electric Corp | Self-aligned gate field effect transistor and method of preparing |
| JPS4814638B1 (enExample) * | 1970-04-03 | 1973-05-09 | ||
| NL170348C (nl) * | 1970-07-10 | 1982-10-18 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij op een oppervlak van een halfgeleiderlichaam een tegen dotering en tegen thermische oxydatie maskerend masker wordt aangebracht, de door de vensters in het masker vrijgelaten delen van het oppervlak worden onderworpen aan een etsbehandeling voor het vormen van verdiepingen en het halfgeleiderlichaam met het masker wordt onderworpen aan een thermische oxydatiebehandeling voor het vormen van een oxydepatroon dat de verdiepingen althans ten dele opvult. |
| US3806361A (en) * | 1972-01-24 | 1974-04-23 | Motorola Inc | Method of making electrical contacts for and passivating a semiconductor device |
-
1974
- 1974-09-24 DE DE19742445480 patent/DE2445480A1/de not_active Withdrawn
-
1975
- 1975-06-16 US US05/589,276 patent/US3970487A/en not_active Expired - Lifetime
- 1975-08-06 GB GB32784/75A patent/GB1501894A/en not_active Expired
- 1975-08-19 FR FR7526330A patent/FR2286503A1/fr active Granted
- 1975-08-27 JP JP50103108A patent/JPS5151289A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5151289A (enExample) | 1976-05-06 |
| GB1501894A (en) | 1978-02-22 |
| FR2286503B1 (enExample) | 1978-04-07 |
| US3970487A (en) | 1976-07-20 |
| FR2286503A1 (fr) | 1976-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1614283C3 (de) | Verfahren zum Herstellen einer Halbleiteranordnung | |
| EP0239652B1 (de) | Verfahren zum Herstellen einer monolithisch integrierten Schaltung mit mindestens einem bipolaren Planartransistor | |
| DE69030415T2 (de) | Verfahren zur Herstellung eines DMOS Transistors | |
| EP0001586B1 (de) | Integrierte Halbleiteranordnung mit vertikalen NPN- und PNP-Strukturen und Verfahren zur Herstellung | |
| DE1439935A1 (de) | Halbleitereinrichtung und Verfahren zu deren Herstellung | |
| DE2610828C2 (de) | Thyristor mit passivierter Oberfläche | |
| EP0020998B1 (de) | Verfahren zum Herstellen eines bipolaren Transistors mit ionenimplantierter Emitterzone | |
| DE68928087T2 (de) | Substratsstruktur für zusammengesetztes Halbleiterbauelement | |
| DE2749607C3 (de) | Halbleiteranordnung und Verfahren zu deren Herstellung | |
| DE1564547B2 (de) | Integrierte, monolithische Halbleiterschaltung und Verfahren zu ihrer Herstellung | |
| DE2546314A1 (de) | Feldeffekt-transistorstruktur und verfahren zur herstellung | |
| DE3223230C2 (enExample) | ||
| DE1903870A1 (de) | Verfahren zum Herstellen monolithischer Halbleiteranordnungen | |
| DE3689705T2 (de) | Zener-Diode. | |
| DE2236897A1 (de) | Verfahren zur herstellung von halbleiterbauteilen | |
| DE2800363C2 (de) | Halbleiteranordnung und Verfahren zu deren Herstellung | |
| DE2100224C3 (de) | Maskierungs- und Metallisierungsverfahren bei der Herstellung von Halbleiterzonen | |
| DE2403816C3 (de) | Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
| DE69431609T2 (de) | Verfahren zur Herstellung einer Halbleiteranordnung mit einem Bipolartransistor | |
| DE2445480A1 (de) | Verfahren zur herstellung eines leistungstransistors | |
| DE2546673A1 (de) | Verfahren zur herstellung einer halbleiterstruktur | |
| DE1803026C3 (de) | Halbleiterbauelement und Verfahren zu seiner Herstellung | |
| DE69322226T2 (de) | Integriertes Dünnschichtverfahren zur Erlangung von hohen Ballastwerten für Überlagerungsstrukturen | |
| DE2639364B2 (de) | Thyristor | |
| DE2627307C3 (de) | Verfahren zum Herstellen einer Halbleiteranordnung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |