DE2441472A1 - Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente - Google Patents

Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente

Info

Publication number
DE2441472A1
DE2441472A1 DE2441472A DE2441472A DE2441472A1 DE 2441472 A1 DE2441472 A1 DE 2441472A1 DE 2441472 A DE2441472 A DE 2441472A DE 2441472 A DE2441472 A DE 2441472A DE 2441472 A1 DE2441472 A1 DE 2441472A1
Authority
DE
Germany
Prior art keywords
light
projection lens
arrangement
mask
masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE2441472A
Other languages
German (de)
English (en)
Inventor
Horst Dr Kiemle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Priority to DE2441472A priority Critical patent/DE2441472A1/de
Priority to US05/605,190 priority patent/US3985439A/en
Priority to FR7526254A priority patent/FR2283466A1/fr
Priority to JP10389575A priority patent/JPS5150578A/ja
Priority to NL7510189A priority patent/NL7510189A/xx
Priority to BE159612A priority patent/BE832918A/xx
Publication of DE2441472A1 publication Critical patent/DE2441472A1/de
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Holo Graphy (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE2441472A 1974-08-29 1974-08-29 Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente Pending DE2441472A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE2441472A DE2441472A1 (de) 1974-08-29 1974-08-29 Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente
US05/605,190 US3985439A (en) 1974-08-29 1975-08-15 Device for the light-optical, computer-controlled drawing of masks for semiconductor components
FR7526254A FR2283466A1 (fr) 1974-08-29 1975-08-26 Dispositif pour dessiner optiquement des masques pour des composants a semi-conducteurs sous la commande d'un calculateur
JP10389575A JPS5150578A (https=) 1974-08-29 1975-08-27
NL7510189A NL7510189A (nl) 1974-08-29 1975-08-28 Inrichting voor het met licht en door een reken- tuig gestuurd tekenen van maskers voor halfgelei- der-bouwelementen.
BE159612A BE832918A (fr) 1974-08-29 1975-08-29 Dispositif pour dessiner optiquement des masques pour des composants a semiconducteurs sous la demande d'un calculateur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441472A DE2441472A1 (de) 1974-08-29 1974-08-29 Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente

Publications (1)

Publication Number Publication Date
DE2441472A1 true DE2441472A1 (de) 1976-03-11

Family

ID=5924427

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2441472A Pending DE2441472A1 (de) 1974-08-29 1974-08-29 Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente

Country Status (6)

Country Link
US (1) US3985439A (https=)
JP (1) JPS5150578A (https=)
BE (1) BE832918A (https=)
DE (1) DE2441472A1 (https=)
FR (1) FR2283466A1 (https=)
NL (1) NL7510189A (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109256A (en) * 1976-05-13 1978-08-22 Fuji Photo Film Co., Ltd. Laser computer output microfilmer
US4053905A (en) * 1976-06-23 1977-10-11 Gte Laboratories Incorporated Optical scanning apparatus for photolithography of a color cathode ray tube having an aperture mask
JPS5465602A (en) * 1977-11-01 1979-05-26 Dainippon Screen Mfg Method of scanning and recording halftone image
US4225224A (en) * 1979-03-13 1980-09-30 The United States Of America As Represented By The Secretary Of The Army Process and apparatus for laser illumination of printing plates
FR2455298A1 (fr) * 1979-04-23 1980-11-21 Thomson Csf Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif
US4433902A (en) 1980-06-16 1984-02-28 Ncr Corporation Projection printer
SE449531B (sv) * 1980-12-11 1987-05-04 Gerhard Westerberg Forfarande och anordning for kontroll av mikromasker
US4440839A (en) * 1981-03-18 1984-04-03 United Technologies Corporation Method of forming laser diffraction grating for beam sampling device
US4412719A (en) * 1981-04-10 1983-11-01 Environmental Research Institute Of Michigan Method and article having predetermined net reflectance characteristics
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS62141559A (ja) * 1985-12-16 1987-06-25 Mitsubishi Electric Corp 投影露光装置
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1324136A1 (en) * 2001-12-28 2003-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1391135A (fr) * 1964-01-23 1965-03-05 Perfectionnements aux tireuses optiques multiples
US3545854A (en) * 1966-06-17 1970-12-08 Gen Electric Semiconductor mask making
US3656849A (en) * 1967-02-20 1972-04-18 Texas Instruments Inc Multiple image systems
FR1592510A (https=) * 1968-05-15 1970-05-19
US3584948A (en) * 1968-06-24 1971-06-15 Bell Telephone Labor Inc Apparatus and method for producing multiple images
GB1305605A (https=) * 1969-03-01 1973-02-07
US3791275A (en) * 1972-10-17 1974-02-12 Xerox Corp Multiple image formation through self-imaging

Also Published As

Publication number Publication date
BE832918A (fr) 1976-03-01
FR2283466A1 (fr) 1976-03-26
NL7510189A (nl) 1976-03-02
US3985439A (en) 1976-10-12
JPS5150578A (https=) 1976-05-04
FR2283466B1 (https=) 1978-04-07

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