BE832918A - Dispositif pour dessiner optiquement des masques pour des composants a semiconducteurs sous la demande d'un calculateur - Google Patents

Dispositif pour dessiner optiquement des masques pour des composants a semiconducteurs sous la demande d'un calculateur

Info

Publication number
BE832918A
BE832918A BE159612A BE159612A BE832918A BE 832918 A BE832918 A BE 832918A BE 159612 A BE159612 A BE 159612A BE 159612 A BE159612 A BE 159612A BE 832918 A BE832918 A BE 832918A
Authority
BE
Belgium
Prior art keywords
demand
computer
semiconductor components
drawing masks
optically
Prior art date
Application number
BE159612A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE832918A publication Critical patent/BE832918A/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Holo Graphy (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
BE159612A 1974-08-29 1975-08-29 Dispositif pour dessiner optiquement des masques pour des composants a semiconducteurs sous la demande d'un calculateur BE832918A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441472A DE2441472A1 (de) 1974-08-29 1974-08-29 Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente

Publications (1)

Publication Number Publication Date
BE832918A true BE832918A (fr) 1976-03-01

Family

ID=5924427

Family Applications (1)

Application Number Title Priority Date Filing Date
BE159612A BE832918A (fr) 1974-08-29 1975-08-29 Dispositif pour dessiner optiquement des masques pour des composants a semiconducteurs sous la demande d'un calculateur

Country Status (6)

Country Link
US (1) US3985439A (https=)
JP (1) JPS5150578A (https=)
BE (1) BE832918A (https=)
DE (1) DE2441472A1 (https=)
FR (1) FR2283466A1 (https=)
NL (1) NL7510189A (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109256A (en) * 1976-05-13 1978-08-22 Fuji Photo Film Co., Ltd. Laser computer output microfilmer
US4053905A (en) * 1976-06-23 1977-10-11 Gte Laboratories Incorporated Optical scanning apparatus for photolithography of a color cathode ray tube having an aperture mask
JPS5465602A (en) * 1977-11-01 1979-05-26 Dainippon Screen Mfg Method of scanning and recording halftone image
US4225224A (en) * 1979-03-13 1980-09-30 The United States Of America As Represented By The Secretary Of The Army Process and apparatus for laser illumination of printing plates
FR2455298A1 (fr) * 1979-04-23 1980-11-21 Thomson Csf Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif
US4433902A (en) 1980-06-16 1984-02-28 Ncr Corporation Projection printer
SE449531B (sv) * 1980-12-11 1987-05-04 Gerhard Westerberg Forfarande och anordning for kontroll av mikromasker
US4440839A (en) * 1981-03-18 1984-04-03 United Technologies Corporation Method of forming laser diffraction grating for beam sampling device
US4412719A (en) * 1981-04-10 1983-11-01 Environmental Research Institute Of Michigan Method and article having predetermined net reflectance characteristics
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS62141559A (ja) * 1985-12-16 1987-06-25 Mitsubishi Electric Corp 投影露光装置
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1324136A1 (en) * 2001-12-28 2003-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1391135A (fr) * 1964-01-23 1965-03-05 Perfectionnements aux tireuses optiques multiples
US3545854A (en) * 1966-06-17 1970-12-08 Gen Electric Semiconductor mask making
US3656849A (en) * 1967-02-20 1972-04-18 Texas Instruments Inc Multiple image systems
FR1592510A (https=) * 1968-05-15 1970-05-19
US3584948A (en) * 1968-06-24 1971-06-15 Bell Telephone Labor Inc Apparatus and method for producing multiple images
GB1305605A (https=) * 1969-03-01 1973-02-07
US3791275A (en) * 1972-10-17 1974-02-12 Xerox Corp Multiple image formation through self-imaging

Also Published As

Publication number Publication date
DE2441472A1 (de) 1976-03-11
FR2283466A1 (fr) 1976-03-26
NL7510189A (nl) 1976-03-02
US3985439A (en) 1976-10-12
JPS5150578A (https=) 1976-05-04
FR2283466B1 (https=) 1978-04-07

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