JPS5150578A - - Google Patents
Info
- Publication number
- JPS5150578A JPS5150578A JP10389575A JP10389575A JPS5150578A JP S5150578 A JPS5150578 A JP S5150578A JP 10389575 A JP10389575 A JP 10389575A JP 10389575 A JP10389575 A JP 10389575A JP S5150578 A JPS5150578 A JP S5150578A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Holo Graphy (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2441472A DE2441472A1 (de) | 1974-08-29 | 1974-08-29 | Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5150578A true JPS5150578A (https=) | 1976-05-04 |
Family
ID=5924427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10389575A Pending JPS5150578A (https=) | 1974-08-29 | 1975-08-27 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3985439A (https=) |
| JP (1) | JPS5150578A (https=) |
| BE (1) | BE832918A (https=) |
| DE (1) | DE2441472A1 (https=) |
| FR (1) | FR2283466A1 (https=) |
| NL (1) | NL7510189A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62141559A (ja) * | 1985-12-16 | 1987-06-25 | Mitsubishi Electric Corp | 投影露光装置 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4109256A (en) * | 1976-05-13 | 1978-08-22 | Fuji Photo Film Co., Ltd. | Laser computer output microfilmer |
| US4053905A (en) * | 1976-06-23 | 1977-10-11 | Gte Laboratories Incorporated | Optical scanning apparatus for photolithography of a color cathode ray tube having an aperture mask |
| JPS5465602A (en) * | 1977-11-01 | 1979-05-26 | Dainippon Screen Mfg | Method of scanning and recording halftone image |
| US4225224A (en) * | 1979-03-13 | 1980-09-30 | The United States Of America As Represented By The Secretary Of The Army | Process and apparatus for laser illumination of printing plates |
| FR2455298A1 (fr) * | 1979-04-23 | 1980-11-21 | Thomson Csf | Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif |
| US4433902A (en) | 1980-06-16 | 1984-02-28 | Ncr Corporation | Projection printer |
| SE449531B (sv) * | 1980-12-11 | 1987-05-04 | Gerhard Westerberg | Forfarande och anordning for kontroll av mikromasker |
| US4440839A (en) * | 1981-03-18 | 1984-04-03 | United Technologies Corporation | Method of forming laser diffraction grating for beam sampling device |
| US4412719A (en) * | 1981-04-10 | 1983-11-01 | Environmental Research Institute Of Michigan | Method and article having predetermined net reflectance characteristics |
| US4464030A (en) * | 1982-03-26 | 1984-08-07 | Rca Corporation | Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system |
| CA2075026A1 (en) * | 1991-08-08 | 1993-02-09 | William E. Nelson | Method and apparatus for patterning an imaging member |
| EP1324138A3 (en) * | 2001-12-28 | 2007-12-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1324136A1 (en) * | 2001-12-28 | 2003-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1391135A (fr) * | 1964-01-23 | 1965-03-05 | Perfectionnements aux tireuses optiques multiples | |
| US3545854A (en) * | 1966-06-17 | 1970-12-08 | Gen Electric | Semiconductor mask making |
| US3656849A (en) * | 1967-02-20 | 1972-04-18 | Texas Instruments Inc | Multiple image systems |
| FR1592510A (https=) * | 1968-05-15 | 1970-05-19 | ||
| US3584948A (en) * | 1968-06-24 | 1971-06-15 | Bell Telephone Labor Inc | Apparatus and method for producing multiple images |
| GB1305605A (https=) * | 1969-03-01 | 1973-02-07 | ||
| US3791275A (en) * | 1972-10-17 | 1974-02-12 | Xerox Corp | Multiple image formation through self-imaging |
-
1974
- 1974-08-29 DE DE2441472A patent/DE2441472A1/de active Pending
-
1975
- 1975-08-15 US US05/605,190 patent/US3985439A/en not_active Expired - Lifetime
- 1975-08-26 FR FR7526254A patent/FR2283466A1/fr active Granted
- 1975-08-27 JP JP10389575A patent/JPS5150578A/ja active Pending
- 1975-08-28 NL NL7510189A patent/NL7510189A/xx unknown
- 1975-08-29 BE BE159612A patent/BE832918A/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62141559A (ja) * | 1985-12-16 | 1987-06-25 | Mitsubishi Electric Corp | 投影露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| BE832918A (fr) | 1976-03-01 |
| DE2441472A1 (de) | 1976-03-11 |
| FR2283466A1 (fr) | 1976-03-26 |
| NL7510189A (nl) | 1976-03-02 |
| US3985439A (en) | 1976-10-12 |
| FR2283466B1 (https=) | 1978-04-07 |