DE2422157A1 - Verfahren zur glassubstratsaeuberung - Google Patents
Verfahren zur glassubstratsaeuberungInfo
- Publication number
- DE2422157A1 DE2422157A1 DE2422157A DE2422157A DE2422157A1 DE 2422157 A1 DE2422157 A1 DE 2422157A1 DE 2422157 A DE2422157 A DE 2422157A DE 2422157 A DE2422157 A DE 2422157A DE 2422157 A1 DE2422157 A1 DE 2422157A1
- Authority
- DE
- Germany
- Prior art keywords
- gas
- active
- substrates
- water
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 title claims description 22
- 238000004140 cleaning Methods 0.000 title claims description 9
- 239000007789 gas Substances 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 238000010849 ion bombardment Methods 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000000889 atomisation Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US369620A US3868271A (en) | 1973-06-13 | 1973-06-13 | Method of cleaning a glass substrate by ionic bombardment in a wet active gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2422157A1 true DE2422157A1 (de) | 1975-01-09 |
Family
ID=23456198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2422157A Pending DE2422157A1 (de) | 1973-06-13 | 1974-05-08 | Verfahren zur glassubstratsaeuberung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3868271A (https=) |
| JP (1) | JPS5028515A (https=) |
| BR (1) | BR7404853D0 (https=) |
| DE (1) | DE2422157A1 (https=) |
| FR (1) | FR2233292B1 (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5125148A (en) * | 1974-08-26 | 1976-03-01 | Hitachi Ltd | Ekishohyojibanno seizohoho |
| IT1052390B (it) * | 1975-11-24 | 1981-06-20 | Selenia Ind Elettroniche | Perfezionamento nei procedimenti di fabbricazione di dispositivi a semiconduttori in particolare di incisione per erosione ionica |
| JPS5322515A (en) * | 1976-08-12 | 1978-03-02 | Fujitsu Ltd | Method of surface treatment of glass substrate of sodaalime glass |
| DE2647088B2 (de) * | 1976-10-19 | 1979-04-05 | Kernforschungsanlage Juelich Gmbh, 5170 Juelich | Verfahren und Vorrichtung zum Reinigen von Oberflächen |
| US4132567A (en) * | 1977-10-13 | 1979-01-02 | Fsi Corporation | Apparatus for and method of cleaning and removing static charges from substrates |
| US4278493A (en) * | 1980-04-28 | 1981-07-14 | International Business Machines Corporation | Method for cleaning surfaces by ion milling |
| US4690370A (en) * | 1982-09-29 | 1987-09-01 | M. U. Engineering & Manufacturing, Inc. | Rhodium coated mold |
| US4608268A (en) * | 1985-07-23 | 1986-08-26 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
| WO1987002603A1 (en) * | 1985-10-29 | 1987-05-07 | Hughes Aircraft Company | Method and apparatus for atomic beam irradiation |
| JPS6361224A (ja) * | 1986-09-01 | 1988-03-17 | Minolta Camera Co Ltd | 集束性光伝送体アレイの色補正コ−テイング方法 |
| EP0269977B1 (en) | 1986-11-27 | 1994-06-01 | Kao Corporation | Alkaline cellulases and microorganisms capable of producing same |
| MY103919A (en) * | 1988-03-30 | 1993-10-30 | Kao Corp | Mutant resistant to cell membrane synthesis inhibitor and process for preparing the same. |
| DE4120202A1 (de) * | 1991-06-19 | 1992-12-24 | Leica Mikroskopie & Syst | Verfahren zur emissionsfreien, insbesondere fckw-freien, reinigung von praezisions-optiken bzw. -optikbaugruppen |
| US5312647A (en) * | 1992-07-24 | 1994-05-17 | Dielectric Coating Industries | Method and apparatus of vacuum deposition |
| JP4897186B2 (ja) | 2002-03-27 | 2012-03-14 | 花王株式会社 | 変異アルカリセルラーゼ |
| US20040011381A1 (en) * | 2002-07-17 | 2004-01-22 | Klebanoff Leonard E. | Method for removing carbon contamination from optic surfaces |
| CA2589346A1 (en) | 2004-12-09 | 2006-06-15 | Dow Global Technologies Inc. | Enzyme stabilization |
| CN106164776B (zh) | 2014-04-09 | 2019-04-23 | Asml荷兰有限公司 | 用于清洁对象的装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2501563A (en) * | 1946-02-20 | 1950-03-21 | Libbey Owens Ford Glass Co | Method of forming strongly adherent metallic compound films by glow discharge |
| US2467953A (en) * | 1946-09-19 | 1949-04-19 | Distillation Products Inc | Use of glow discharge in vacuum coating processes |
| US2985756A (en) * | 1957-12-09 | 1961-05-23 | Edwards High Vacuum Ltd | Ionic bombardment cleaning apparatus |
| US3192892A (en) * | 1961-11-24 | 1965-07-06 | Sperry Rand Corp | Ion bombardment cleaning and coating apparatus |
| US3326177A (en) * | 1963-09-12 | 1967-06-20 | Pennsalt Chemicals Corp | Metal vapor coating apparatus |
| US3654108A (en) * | 1969-09-23 | 1972-04-04 | Air Reduction | Method for glow cleaning |
-
1973
- 1973-06-13 US US369620A patent/US3868271A/en not_active Expired - Lifetime
-
1974
- 1974-04-12 FR FR7414313A patent/FR2233292B1/fr not_active Expired
- 1974-05-08 DE DE2422157A patent/DE2422157A1/de active Pending
- 1974-05-15 JP JP49053496A patent/JPS5028515A/ja active Pending
- 1974-06-12 BR BR4853/74A patent/BR7404853D0/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US3868271A (en) | 1975-02-25 |
| JPS5028515A (https=) | 1975-03-24 |
| FR2233292B1 (https=) | 1976-12-17 |
| FR2233292A1 (https=) | 1975-01-10 |
| BR7404853D0 (pt) | 1975-01-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |