DE2414596C3 - Verfahren zur Herstellung einer vorsensibilisierten Druckplatte - Google Patents
Verfahren zur Herstellung einer vorsensibilisierten DruckplatteInfo
- Publication number
- DE2414596C3 DE2414596C3 DE19742414596 DE2414596A DE2414596C3 DE 2414596 C3 DE2414596 C3 DE 2414596C3 DE 19742414596 DE19742414596 DE 19742414596 DE 2414596 A DE2414596 A DE 2414596A DE 2414596 C3 DE2414596 C3 DE 2414596C3
- Authority
- DE
- Germany
- Prior art keywords
- weight
- compound
- adhesive layer
- photopolymerizable
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
- G03C1/93—Macromolecular substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3754673A JPS5837532B2 (ja) | 1973-04-02 | 1973-04-02 | カンコウセイジユシヨウシジバン |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2414596A1 DE2414596A1 (de) | 1974-10-03 |
| DE2414596B2 DE2414596B2 (de) | 1980-11-13 |
| DE2414596C3 true DE2414596C3 (de) | 1981-07-23 |
Family
ID=12500512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742414596 Expired DE2414596C3 (de) | 1973-04-02 | 1974-03-26 | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
Country Status (10)
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5492402A (en) * | 1977-12-28 | 1979-07-21 | Asahi Chemical Ind | Photosensitive resin relief printing and fabrication |
| JP2002530697A (ja) * | 1998-11-12 | 2002-09-17 | トンプソン、アンドリュー、マイケル | 基体上にホトレジストを結合するための下塗り組成物 |
| DE10040929A1 (de) | 2000-08-18 | 2002-02-28 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern |
| JP5548494B2 (ja) * | 2010-03-19 | 2014-07-16 | 東京応化工業株式会社 | 表面改質材料、レジストパターン形成方法及びパターン形成方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE623613A (enrdf_load_stackoverflow) * | 1961-10-16 |
-
1973
- 1973-04-02 JP JP3754673A patent/JPS5837532B2/ja not_active Expired
-
1974
- 1974-03-26 DE DE19742414596 patent/DE2414596C3/de not_active Expired
- 1974-03-29 BE BE142607A patent/BE813020A/xx unknown
- 1974-03-29 FR FR7411264A patent/FR2223197B1/fr not_active Expired
- 1974-04-01 CA CA196,445A patent/CA1045880A/en not_active Expired
- 1974-04-01 CH CH453174A patent/CH597623A5/xx not_active IP Right Cessation
- 1974-04-02 DD DD17762674A patent/DD110705A5/xx unknown
- 1974-04-02 GB GB1461274A patent/GB1463616A/en not_active Expired
- 1974-04-02 NL NL7404486A patent/NL161711C/xx active
- 1974-04-08 IT IT2061074A patent/IT1007425B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| CH597623A5 (enrdf_load_stackoverflow) | 1978-04-14 |
| GB1463616A (en) | 1977-02-02 |
| DE2414596A1 (de) | 1974-10-03 |
| IT1007425B (it) | 1976-10-30 |
| NL7404486A (enrdf_load_stackoverflow) | 1974-10-04 |
| FR2223197A1 (enrdf_load_stackoverflow) | 1974-10-25 |
| AU6715274A (en) | 1975-10-02 |
| BE813020A (fr) | 1974-07-15 |
| DE2414596B2 (de) | 1980-11-13 |
| NL161711B (nl) | 1979-10-15 |
| JPS5837532B2 (ja) | 1983-08-17 |
| NL161711C (nl) | 1980-03-17 |
| DD110705A5 (enrdf_load_stackoverflow) | 1975-01-05 |
| JPS49132167A (enrdf_load_stackoverflow) | 1974-12-18 |
| FR2223197B1 (enrdf_load_stackoverflow) | 1979-07-06 |
| CA1045880A (en) | 1979-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: KOHLER, M., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN |
|
| 8339 | Ceased/non-payment of the annual fee |