GB1463616A - Supports for photosensitive polymer coatings - Google Patents
Supports for photosensitive polymer coatingsInfo
- Publication number
- GB1463616A GB1463616A GB1461274A GB1461274A GB1463616A GB 1463616 A GB1463616 A GB 1463616A GB 1461274 A GB1461274 A GB 1461274A GB 1461274 A GB1461274 A GB 1461274A GB 1463616 A GB1463616 A GB 1463616A
- Authority
- GB
- United Kingdom
- Prior art keywords
- compound
- epoxy
- supports
- group
- hydroquinone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 3
- 239000012790 adhesive layer Substances 0.000 abstract 3
- 125000003700 epoxy group Chemical group 0.000 abstract 3
- 239000003822 epoxy resin Substances 0.000 abstract 3
- 229920000647 polyepoxide Polymers 0.000 abstract 3
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 abstract 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 abstract 2
- LAQYHRQFABOIFD-UHFFFAOYSA-N 2-methoxyhydroquinone Chemical compound COC1=CC(O)=CC=C1O LAQYHRQFABOIFD-UHFFFAOYSA-N 0.000 abstract 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 abstract 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 abstract 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 abstract 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 abstract 1
- 239000002202 Polyethylene glycol Substances 0.000 abstract 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 abstract 1
- ACIAHEMYLLBZOI-ZZXKWVIFSA-N Unsaturated alcohol Chemical compound CC\C(CO)=C/C ACIAHEMYLLBZOI-ZZXKWVIFSA-N 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 abstract 1
- 239000001530 fumaric acid Substances 0.000 abstract 1
- -1 glycidyl ester Chemical class 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 abstract 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 abstract 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 abstract 1
- 229920000609 methyl cellulose Polymers 0.000 abstract 1
- 239000001923 methylcellulose Substances 0.000 abstract 1
- 229920006122 polyamide resin Polymers 0.000 abstract 1
- 229920000768 polyamine Polymers 0.000 abstract 1
- 229920001223 polyethylene glycol Polymers 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 abstract 1
- 229920006305 unsaturated polyester Polymers 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
- G03C1/93—Macromolecular substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3754673A JPS5837532B2 (ja) | 1973-04-02 | 1973-04-02 | カンコウセイジユシヨウシジバン |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1463616A true GB1463616A (en) | 1977-02-02 |
Family
ID=12500512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1461274A Expired GB1463616A (en) | 1973-04-02 | 1974-04-02 | Supports for photosensitive polymer coatings |
Country Status (10)
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5492402A (en) * | 1977-12-28 | 1979-07-21 | Asahi Chemical Ind | Photosensitive resin relief printing and fabrication |
| AU1373399A (en) * | 1998-11-12 | 2000-06-05 | Andrew Michael Thompson | Priming composition for bonding photoresists on substrates |
| DE10040929A1 (de) | 2000-08-18 | 2002-02-28 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern |
| JP5548494B2 (ja) * | 2010-03-19 | 2014-07-16 | 東京応化工業株式会社 | 表面改質材料、レジストパターン形成方法及びパターン形成方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE623613A (enrdf_load_stackoverflow) * | 1961-10-16 |
-
1973
- 1973-04-02 JP JP3754673A patent/JPS5837532B2/ja not_active Expired
-
1974
- 1974-03-26 DE DE19742414596 patent/DE2414596C3/de not_active Expired
- 1974-03-29 BE BE142607A patent/BE813020A/xx unknown
- 1974-03-29 FR FR7411264A patent/FR2223197B1/fr not_active Expired
- 1974-04-01 CH CH453174A patent/CH597623A5/xx not_active IP Right Cessation
- 1974-04-01 CA CA196,445A patent/CA1045880A/en not_active Expired
- 1974-04-02 GB GB1461274A patent/GB1463616A/en not_active Expired
- 1974-04-02 NL NL7404486A patent/NL161711C/xx active
- 1974-04-02 DD DD17762674A patent/DD110705A5/xx unknown
- 1974-04-08 IT IT2061074A patent/IT1007425B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| BE813020A (fr) | 1974-07-15 |
| JPS5837532B2 (ja) | 1983-08-17 |
| NL161711B (nl) | 1979-10-15 |
| CA1045880A (en) | 1979-01-09 |
| FR2223197B1 (enrdf_load_stackoverflow) | 1979-07-06 |
| DE2414596A1 (de) | 1974-10-03 |
| FR2223197A1 (enrdf_load_stackoverflow) | 1974-10-25 |
| DE2414596B2 (de) | 1980-11-13 |
| AU6715274A (en) | 1975-10-02 |
| NL7404486A (enrdf_load_stackoverflow) | 1974-10-04 |
| IT1007425B (it) | 1976-10-30 |
| NL161711C (nl) | 1980-03-17 |
| JPS49132167A (enrdf_load_stackoverflow) | 1974-12-18 |
| DD110705A5 (enrdf_load_stackoverflow) | 1975-01-05 |
| DE2414596C3 (de) | 1981-07-23 |
| CH597623A5 (enrdf_load_stackoverflow) | 1978-04-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1492919A (en) | Hardenable coating compositions | |
| KR900018315A (ko) | 교차결합제 및 충격변형제를 함유하는 아크릴 접착조성물 | |
| KR880005188A (ko) | 폴리아민-폴리엔 자외선 피막 | |
| JPH03210374A (ja) | 被覆組成物 | |
| FI821260A0 (fi) | Genom bestraolning polymeriserbar komposition och ur denna framstaelld fotopolymeriserbart kopieringsmaterial | |
| KR850001908A (ko) | 경화 조성물 | |
| MY118879A (en) | Pressure - sensitive adhesive of (meth) acrylate, unsaturated acid, poly(meth) acrytlate and epoxy resin | |
| FR2377826A1 (fr) | Adsorbant polymere polaire a base d'ester de glycidyle pour la chromatographie en phase gazeuse et liquide | |
| FR2361681A1 (fr) | Materiau de reserve photographique pelliculaire sec | |
| KR870010083A (ko) | 복합 아크릴 수지 입자 | |
| ATE36344T1 (de) | Haertbare formmassen. | |
| GB1463616A (en) | Supports for photosensitive polymer coatings | |
| JPS56129212A (en) | Photosensitive polyamide resin composition | |
| KR950032554A (ko) | Crt 접착성 조성물 및 이를 사용하여 수득된 crt | |
| GB1454017A (en) | Negative acting presensitised printing plates | |
| CA2347744A1 (en) | Polymerizable material and sheet material derived therefrom | |
| GB1489402A (en) | Photocurable resin compositions | |
| GB1478141A (en) | Liquid unsaturated resin compositions | |
| KR850007267A (ko) | 구조 접착제 조성물 | |
| KR880012715A (ko) | 복합 아크릴 수지입자 | |
| JPS5817555B2 (ja) | 活性エネルギ−線硬化型粘着剤用組成物 | |
| ATE160369T1 (de) | Fotovernetzbare polyamin-en-zusammensetzungen mit verbesserter härtungsgeschwindigkeit | |
| JPH0128058B2 (enrdf_load_stackoverflow) | ||
| JPS5523143A (en) | Cold-setting resin composition | |
| FR2429233A1 (fr) | Melange renfermant un ether polyglycidylique et un phenol bifonctionnel, et utilisation d'un tel melange pour la preparation de matieres plastiques |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |