DE2414005A1 - Antistatisches photographisches material - Google Patents

Antistatisches photographisches material

Info

Publication number
DE2414005A1
DE2414005A1 DE2414005A DE2414005A DE2414005A1 DE 2414005 A1 DE2414005 A1 DE 2414005A1 DE 2414005 A DE2414005 A DE 2414005A DE 2414005 A DE2414005 A DE 2414005A DE 2414005 A1 DE2414005 A1 DE 2414005A1
Authority
DE
Germany
Prior art keywords
antistatic
film
photographic material
static
photographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE2414005A
Other languages
German (de)
English (en)
Inventor
Takayuki Inayama
Itsuki Toriya
Nobuo Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2414005A1 publication Critical patent/DE2414005A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/89—Macromolecular substances therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/89—Macromolecular substances therefor
    • G03C1/895—Polyalkylene oxides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyamides (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE2414005A 1973-03-22 1974-03-22 Antistatisches photographisches material Pending DE2414005A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3283773A JPS5718175B2 (US20020051482A1-20020502-M00012.png) 1973-03-22 1973-03-22

Publications (1)

Publication Number Publication Date
DE2414005A1 true DE2414005A1 (de) 1974-10-03

Family

ID=12369919

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2414005A Pending DE2414005A1 (de) 1973-03-22 1974-03-22 Antistatisches photographisches material

Country Status (4)

Country Link
US (1) US3876430A (US20020051482A1-20020502-M00012.png)
JP (1) JPS5718175B2 (US20020051482A1-20020502-M00012.png)
DE (1) DE2414005A1 (US20020051482A1-20020502-M00012.png)
GB (1) GB1410581A (US20020051482A1-20020502-M00012.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4118231A (en) * 1972-03-08 1978-10-03 Konishiroku Photo Industry Co., Ltd. Light-sensitive silver halide photographic materials containing antistatic agents
CH638362GA3 (US20020051482A1-20020502-M00012.png) * 1977-06-10 1983-09-30
LU78153A1 (fr) * 1977-09-20 1979-05-25 Oreal Compositions cosmetiques a base de polymeres polyammonium quaternaires et procede de preparation
JP2684438B2 (ja) * 1990-07-20 1997-12-03 富士写真フイルム株式会社 帯電防止されたハロゲン化銀写真感光材料およびその製造法
US6066442A (en) 1995-10-23 2000-05-23 Konica Corporation Plastic film having an improved anti-static property
KR100526402B1 (ko) 2002-11-22 2005-11-08 주식회사 엘지화학 고리형 올레핀계 부가 중합체를 포함하는 네가티브Ｃ-플레이트(ｎｅｇａｔｉｖｅ Ｃ-ｐｌａｔｅ)형 광학이방성 필름 및 이의 제조방법
KR100618153B1 (ko) 2003-02-06 2006-08-29 주식회사 엘지화학 편광막의 보호필름, 편광판 및 이의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE634515A (US20020051482A1-20020502-M00012.png) * 1962-07-19
JPS4930520B1 (US20020051482A1-20020502-M00012.png) * 1969-09-04 1974-08-13
JPS4843809B1 (US20020051482A1-20020502-M00012.png) * 1970-12-18 1973-12-20
US3811887A (en) * 1970-12-18 1974-05-21 Konishiroku Photo Ind Photographic material comprising bisacylhydrazinium compounds

Also Published As

Publication number Publication date
JPS5718175B2 (US20020051482A1-20020502-M00012.png) 1982-04-15
GB1410581A (en) 1975-10-22
US3876430A (en) 1975-04-08
JPS49121523A (US20020051482A1-20020502-M00012.png) 1974-11-20

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