DE2410218A1 - Masse zur photosensibilisierung von aethylenisch ungesaettigten verbindungen - Google Patents

Masse zur photosensibilisierung von aethylenisch ungesaettigten verbindungen

Info

Publication number
DE2410218A1
DE2410218A1 DE19742410218 DE2410218A DE2410218A1 DE 2410218 A1 DE2410218 A1 DE 2410218A1 DE 19742410218 DE19742410218 DE 19742410218 DE 2410218 A DE2410218 A DE 2410218A DE 2410218 A1 DE2410218 A1 DE 2410218A1
Authority
DE
Germany
Prior art keywords
ethylenically unsaturated
methylene blue
compounds
peroxide
visible light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742410218
Other languages
German (de)
English (en)
Inventor
Robert Tze-Yau Lu
Alfred Joseph Restaino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeneca Inc
Original Assignee
ICI Americas Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICI Americas Inc filed Critical ICI Americas Inc
Publication of DE2410218A1 publication Critical patent/DE2410218A1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66Polyesters containing oxygen in the form of ether groups
    • C08G63/668Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE19742410218 1973-03-16 1974-03-04 Masse zur photosensibilisierung von aethylenisch ungesaettigten verbindungen Pending DE2410218A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US34185673A 1973-03-16 1973-03-16

Publications (1)

Publication Number Publication Date
DE2410218A1 true DE2410218A1 (de) 1974-09-19

Family

ID=23339300

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742410218 Pending DE2410218A1 (de) 1973-03-16 1974-03-04 Masse zur photosensibilisierung von aethylenisch ungesaettigten verbindungen

Country Status (6)

Country Link
JP (1) JPS49121885A (enrdf_load_stackoverflow)
CA (1) CA1004523A (enrdf_load_stackoverflow)
DE (1) DE2410218A1 (enrdf_load_stackoverflow)
FR (1) FR2221484A1 (enrdf_load_stackoverflow)
GB (2) GB1440900A (enrdf_load_stackoverflow)
IT (1) IT1003752B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105382A4 (en) * 1982-04-07 1985-02-28 Sony Corp PHOTOSENSITIVE IMAGE FORMING MATERIAL.

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4222835A (en) * 1978-05-25 1980-09-16 Westinghouse Electric Corp. In depth curing of resins induced by UV radiation
JPS57202304A (en) * 1981-06-08 1982-12-11 Toshiba Chem Corp Curing of photo-curing resin composition
PL134871B1 (en) * 1982-05-31 1985-09-30 Polska Akademia Nauk Zaklad Method of obtaining a polymer for making soft contact lenses
JPS60165647A (ja) * 1984-02-08 1985-08-28 Hitachi Chem Co Ltd 光重合性組成物
JPS6125138A (ja) * 1984-07-13 1986-02-04 Hitachi Chem Co Ltd 光重合性組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105382A4 (en) * 1982-04-07 1985-02-28 Sony Corp PHOTOSENSITIVE IMAGE FORMING MATERIAL.

Also Published As

Publication number Publication date
FR2221484A1 (enrdf_load_stackoverflow) 1974-10-11
GB1440900A (en) 1976-06-30
CA1004523A (en) 1977-02-01
IT1003752B (it) 1976-06-10
GB1440899A (en) 1976-06-30
JPS49121885A (enrdf_load_stackoverflow) 1974-11-21

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Legal Events

Date Code Title Description
OHW Rejection