DE2400587A1 - Verfahren zum aufbringen von duennfilmbelaegen auf langgestreckte traeger bzw. einrichtung zur ausfuehrung des verfahrens - Google Patents

Verfahren zum aufbringen von duennfilmbelaegen auf langgestreckte traeger bzw. einrichtung zur ausfuehrung des verfahrens

Info

Publication number
DE2400587A1
DE2400587A1 DE2400587A DE2400587A DE2400587A1 DE 2400587 A1 DE2400587 A1 DE 2400587A1 DE 2400587 A DE2400587 A DE 2400587A DE 2400587 A DE2400587 A DE 2400587A DE 2400587 A1 DE2400587 A1 DE 2400587A1
Authority
DE
Germany
Prior art keywords
carrier
drum
path
pressure vessel
plasma vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2400587A
Other languages
German (de)
English (en)
Inventor
Manfred Rudolf Kuehnle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Information Systems Inc
Original Assignee
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Information Systems Inc filed Critical Coulter Information Systems Inc
Publication of DE2400587A1 publication Critical patent/DE2400587A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE2400587A 1973-01-12 1974-01-07 Verfahren zum aufbringen von duennfilmbelaegen auf langgestreckte traeger bzw. einrichtung zur ausfuehrung des verfahrens Withdrawn DE2400587A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (1)

Publication Number Publication Date
DE2400587A1 true DE2400587A1 (de) 1974-07-18

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2400587A Withdrawn DE2400587A1 (de) 1973-01-12 1974-01-07 Verfahren zum aufbringen von duennfilmbelaegen auf langgestreckte traeger bzw. einrichtung zur ausfuehrung des verfahrens

Country Status (15)

Country Link
US (1) US3884787A (xx)
JP (1) JPS5747267B2 (xx)
AT (1) AT341335B (xx)
BE (1) BE809464A (xx)
CA (1) CA1018475A (xx)
CH (1) CH597622A5 (xx)
DD (1) DD109035A5 (xx)
DE (1) DE2400587A1 (xx)
FR (1) FR2322667A1 (xx)
GB (1) GB1461921A (xx)
IL (1) IL43966A (xx)
IT (1) IT1002650B (xx)
LU (1) LU69122A1 (xx)
NL (1) NL7317670A (xx)
SE (1) SE392919B (xx)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0269144A1 (en) * 1986-10-31 1988-06-01 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
EP0785569A3 (de) * 1996-01-20 2005-07-20 Siegfried Dr. Strämke Plasmareaktor
DE102005058869A1 (de) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Verfahren und Vorrichtung zur Beschichtung von Bändern

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
JPS5976571A (ja) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd 塗布装置
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
EP0364619B1 (de) * 1988-10-19 1993-12-29 Ibm Deutschland Gmbh Vorrichtung zum Plasma- oder reaktiven Ionenätzen und Verfahren zum Ätzen schlecht wärmeleitender Substrate
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
ES2263734T3 (es) * 2002-03-15 2006-12-16 Vhf Technologies Sa Aparato y procedimiento para fabricar dispositivos semi-conductores flexibles.
CH696013A5 (de) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
WO2006071148A1 (en) * 2004-12-29 2006-07-06 Sca Hygiene Products Ab A hands-free paper towel dispenser and dispensing system
KR100750654B1 (ko) * 2006-09-15 2007-08-20 한국전기연구원 장선 테이프 증착장치
KR100928222B1 (ko) * 2007-10-31 2009-11-24 한국전기연구원 가이드 롤러가 구비된 장선 증착 장치
US20090194505A1 (en) * 2008-01-24 2009-08-06 Microcontinuum, Inc. Vacuum coating techniques
EP2113585A1 (en) * 2008-04-29 2009-11-04 Applied Materials, Inc. Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
EP2508315B1 (de) 2011-04-07 2013-09-18 Gedore-Werkzeugfabrik GmbH & Co. KG Spaltkeil
EP2909355B1 (en) * 2012-10-22 2018-09-26 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (ko) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 유기물 증착 장치
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
JP2023538038A (ja) * 2020-08-21 2023-09-06 アプライド マテリアルズ インコーポレイテッド フレキシブル基板を処理するための処理システム並びにフレキシブル基板の特性及びフレキシブル基板上の１つ又は複数のコーティングの特性のうちの少なくとも１つを測定する方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
BE485884A (xx) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
NL260813A (xx) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (de) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur Herstellung eines elektrischen Schaltkontaktes
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0269144A1 (en) * 1986-10-31 1988-06-01 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US5057199A (en) * 1986-10-31 1991-10-15 N. V. Bekaert S. A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
EP0785569A3 (de) * 1996-01-20 2005-07-20 Siegfried Dr. Strämke Plasmareaktor
DE102005058869A1 (de) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Verfahren und Vorrichtung zur Beschichtung von Bändern

Also Published As

Publication number Publication date
NL7317670A (xx) 1974-07-16
IL43966A0 (en) 1974-06-30
IT1002650B (it) 1976-05-20
US3884787A (en) 1975-05-20
FR2322667A1 (fr) 1977-04-01
JPS49104972A (xx) 1974-10-04
CA1018475A (en) 1977-10-04
ATA9674A (de) 1977-05-15
BE809464A (fr) 1974-07-08
IL43966A (en) 1976-12-31
AT341335B (de) 1978-02-10
LU69122A1 (xx) 1975-12-09
DD109035A5 (xx) 1974-10-12
JPS5747267B2 (xx) 1982-10-08
SE392919B (sv) 1977-04-25
FR2322667B1 (xx) 1978-10-27
GB1461921A (en) 1977-01-19
CH597622A5 (xx) 1978-04-14

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Legal Events

Date Code Title Description
OD Request for examination
OGA New person/name/address of the applicant
8139 Disposal/non-payment of the annual fee