DE2364850A1 - Verfahren zum fotoaetzen und fototiefdrucken unter verwendung von durch spaltbruchstuecken und/oder alphateilchen verursachte strahlen-aetzspuren von getonten fotographien - Google Patents
Verfahren zum fotoaetzen und fototiefdrucken unter verwendung von durch spaltbruchstuecken und/oder alphateilchen verursachte strahlen-aetzspuren von getonten fotographienInfo
- Publication number
- DE2364850A1 DE2364850A1 DE2364850A DE2364850A DE2364850A1 DE 2364850 A1 DE2364850 A1 DE 2364850A1 DE 2364850 A DE2364850 A DE 2364850A DE 2364850 A DE2364850 A DE 2364850A DE 2364850 A1 DE2364850 A1 DE 2364850A1
- Authority
- DE
- Germany
- Prior art keywords
- image
- photograph
- protective layer
- radiation
- toned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 66
- 238000005530 etching Methods 0.000 title claims description 32
- 238000007639 printing Methods 0.000 title claims description 29
- 239000002245 particle Substances 0.000 title claims description 26
- 230000005855 radiation Effects 0.000 title claims description 20
- 239000000463 material Substances 0.000 claims description 30
- 239000011241 protective layer Substances 0.000 claims description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 25
- 229910052709 silver Inorganic materials 0.000 claims description 25
- 239000004332 silver Substances 0.000 claims description 25
- 239000010410 layer Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 239000012634 fragment Substances 0.000 claims description 21
- 239000011521 glass Substances 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 7
- 239000004033 plastic Substances 0.000 claims description 7
- 229920003023 plastic Polymers 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 206010073306 Exposure to radiation Diseases 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- JFALSRSLKYAFGM-FTXFMUIASA-N uranium-233 Chemical compound [233U] JFALSRSLKYAFGM-FTXFMUIASA-N 0.000 claims description 3
- OYEHPCDNVJXUIW-FTXFMUIASA-N 239Pu Chemical compound [239Pu] OYEHPCDNVJXUIW-FTXFMUIASA-N 0.000 claims description 2
- -1 Keianik Substances 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- 229920002678 cellulose Polymers 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000010445 mica Substances 0.000 claims description 2
- 229910052618 mica group Inorganic materials 0.000 claims description 2
- 239000010959 steel Substances 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims 4
- 230000002269 spontaneous effect Effects 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- 238000005034 decoration Methods 0.000 claims 2
- 230000001419 dependent effect Effects 0.000 claims 2
- CXENHBSYCFFKJS-OXYODPPFSA-N (Z,E)-alpha-farnesene Chemical compound CC(C)=CCC\C(C)=C\C\C=C(\C)C=C CXENHBSYCFFKJS-OXYODPPFSA-N 0.000 claims 1
- ZOXJGFHDIHLPTG-BJUDXGSMSA-N Boron-10 Chemical compound [10B] ZOXJGFHDIHLPTG-BJUDXGSMSA-N 0.000 claims 1
- 238000001357 Galvanic etching Methods 0.000 claims 1
- HZEBHPIOVYHPMT-OUBTZVSYSA-N Polonium-210 Chemical compound [210Po] HZEBHPIOVYHPMT-OUBTZVSYSA-N 0.000 claims 1
- LXQXZNRPTYVCNG-BJUDXGSMSA-N americium-242 Chemical compound [242Am] LXQXZNRPTYVCNG-BJUDXGSMSA-N 0.000 claims 1
- 238000000429 assembly Methods 0.000 claims 1
- 230000000712 assembly Effects 0.000 claims 1
- 238000005266 casting Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000003086 colorant Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000011344 liquid material Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 230000000191 radiation effect Effects 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- JFALSRSLKYAFGM-OIOBTWANSA-N uranium-235 Chemical compound [235U] JFALSRSLKYAFGM-OIOBTWANSA-N 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- 239000000976 ink Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000012546 transfer Methods 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 239000000020 Nitrocellulose Substances 0.000 description 4
- 229920001220 nitrocellulos Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000005865 ionizing radiation Effects 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000008280 blood Substances 0.000 description 2
- 210000004369 blood Anatomy 0.000 description 2
- HGLDOAKPQXAFKI-OUBTZVSYSA-N californium-252 Chemical compound [252Cf] HGLDOAKPQXAFKI-OUBTZVSYSA-N 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical group [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 240000007124 Brassica oleracea Species 0.000 description 1
- 235000003899 Brassica oleracea var acephala Nutrition 0.000 description 1
- 235000012905 Brassica oleracea var viridis Nutrition 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229910052572 stoneware Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910002007 uranyl nitrate Inorganic materials 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/40—Chemically transforming developed images
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T5/00—Recording of movements or tracks of particles; Processing or analysis of such tracks
- G01T5/10—Plates or blocks in which tracks of nuclear particles are made visible by after-treatment, e.g. using photographic emulsion, using mica
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/08—Photoprinting; Processes and means for preventing photoprinting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/918—Use of wave energy or electrical discharge during pretreatment of substrate or post-treatment of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Printing Methods (AREA)
- Printing Plates And Materials Therefor (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AUPB176472 | 1972-12-29 | ||
| AUPB286873 | 1973-04-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2364850A1 true DE2364850A1 (de) | 1974-07-04 |
Family
ID=25642010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2364850A Withdrawn DE2364850A1 (de) | 1972-12-29 | 1973-12-28 | Verfahren zum fotoaetzen und fototiefdrucken unter verwendung von durch spaltbruchstuecken und/oder alphateilchen verursachte strahlen-aetzspuren von getonten fotographien |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3922206A (enrdf_load_stackoverflow) |
| JP (1) | JPS507531A (enrdf_load_stackoverflow) |
| DE (1) | DE2364850A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2212564A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1449899A (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52135818A (en) * | 1976-05-10 | 1977-11-14 | Hitachi Metals Ltd | Corrosion resistance alloy steel |
| JPS5318419A (en) * | 1976-08-04 | 1978-02-20 | Hitachi Metals Ltd | Hot working tool steel |
| US4137461A (en) * | 1977-11-16 | 1979-01-30 | The United States Of America As Represented By The Secretary Of The Navy | Photographic image enhancement by photofission |
| US4147564A (en) * | 1977-11-18 | 1979-04-03 | Sri International | Method of controlled surface texturization of crystalline semiconductor material |
| DE2951287C2 (de) * | 1979-12-20 | 1987-01-02 | Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt | Verfahren zur Herstellung von mit einer Vielzahl von feinsten Spitzen versehenen Oberflächen |
| JPS57161051A (en) * | 1981-03-31 | 1982-10-04 | Daido Steel Co Ltd | Steel for plastic mold |
| JP2000155422A (ja) * | 1998-11-20 | 2000-06-06 | Fuji Photo Film Co Ltd | 平版印刷用原板及び平版印刷方法 |
| US7020307B2 (en) * | 2002-02-15 | 2006-03-28 | Inco Limited | Rock fragmentation analysis system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3575732A (en) * | 1969-06-06 | 1971-04-20 | Microwave Ass | Method of fabricating small-area semiconductor devices |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2357913A (en) * | 1941-08-29 | 1944-09-12 | Honeywell Regulator Co | Photographic process for etching figures on glass |
| BE592209A (enrdf_load_stackoverflow) * | 1959-06-25 | |||
| US3627597A (en) * | 1970-01-05 | 1971-12-14 | Nathan A Tiner | Engraving |
| GB1316711A (en) * | 1971-03-15 | 1973-05-16 | Mullard Ltd | Methods of producing films comprising siliceous material |
-
1973
- 1973-12-28 DE DE2364850A patent/DE2364850A1/de not_active Withdrawn
- 1973-12-28 GB GB6000673A patent/GB1449899A/en not_active Expired
- 1973-12-28 US US429177A patent/US3922206A/en not_active Expired - Lifetime
- 1973-12-29 JP JP49004754A patent/JPS507531A/ja active Pending
-
1974
- 1974-01-02 FR FR7400075A patent/FR2212564A1/fr active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3575732A (en) * | 1969-06-06 | 1971-04-20 | Microwave Ass | Method of fabricating small-area semiconductor devices |
Non-Patent Citations (1)
| Title |
|---|
| Science, Vol.149, 23.07.65, Nr.3682, S.383-387 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US3922206A (en) | 1975-11-25 |
| JPS507531A (enrdf_load_stackoverflow) | 1975-01-25 |
| FR2212564A1 (enrdf_load_stackoverflow) | 1974-07-26 |
| GB1449899A (en) | 1976-09-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| 8125 | Change of the main classification | ||
| 8127 | New person/name/address of the applicant |
Owner name: AUSTRALIAN ATOMIC ENERGY COMMISSION, 2234 LUCAS HE |
|
| 8125 | Change of the main classification |
Ipc: G03X / |
|
| 8181 | Inventor (new situation) |
Free format text: THACKRAY, MALCOLM, SUTHERLAND, NEW SOUTH WALES, AU |
|
| 8136 | Disposal/non-payment of the fee for publication/grant |