DE2341734B2 - Verfahren zur Herstellung einer Reliefdruckform - Google Patents
Verfahren zur Herstellung einer ReliefdruckformInfo
- Publication number
- DE2341734B2 DE2341734B2 DE19732341734 DE2341734A DE2341734B2 DE 2341734 B2 DE2341734 B2 DE 2341734B2 DE 19732341734 DE19732341734 DE 19732341734 DE 2341734 A DE2341734 A DE 2341734A DE 2341734 B2 DE2341734 B2 DE 2341734B2
- Authority
- DE
- Germany
- Prior art keywords
- film
- thickness
- refractive index
- acid
- photopolymerizable layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47082087A JPS5040043B2 (it) | 1972-08-18 | 1972-08-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2341734A1 DE2341734A1 (de) | 1974-03-07 |
DE2341734B2 true DE2341734B2 (de) | 1978-09-14 |
Family
ID=13764647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19732341734 Ceased DE2341734B2 (de) | 1972-08-18 | 1973-08-17 | Verfahren zur Herstellung einer Reliefdruckform |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5040043B2 (it) |
DE (1) | DE2341734B2 (it) |
FR (1) | FR2196488B1 (it) |
GB (1) | GB1426376A (it) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS513621A (en) * | 1974-06-28 | 1976-01-13 | Shigeru Usami | Reriifusakuseihoho |
FR2514159A1 (fr) * | 1981-10-02 | 1983-04-08 | Rhone Poulenc Syst | Composition photosensible et plaque lithographique realisee a l'aide de cette composition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL101499C (it) * | 1951-08-20 | |||
US3573975A (en) * | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
CA923358A (en) * | 1969-08-01 | 1973-03-27 | Fuji Photo Film Co. | Light-sensitive stencil printing material |
-
1972
- 1972-08-18 JP JP47082087A patent/JPS5040043B2/ja not_active Expired
-
1973
- 1973-08-13 FR FR7329564A patent/FR2196488B1/fr not_active Expired
- 1973-08-17 GB GB3891573A patent/GB1426376A/en not_active Expired
- 1973-08-17 DE DE19732341734 patent/DE2341734B2/de not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
GB1426376A (en) | 1976-02-25 |
JPS4937702A (it) | 1974-04-08 |
FR2196488B1 (it) | 1974-11-08 |
DE2341734A1 (de) | 1974-03-07 |
JPS5040043B2 (it) | 1975-12-22 |
FR2196488A1 (it) | 1974-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8228 | New agent |
Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN |
|
8235 | Patent refused |