FR2196488B1 - - Google Patents

Info

Publication number
FR2196488B1
FR2196488B1 FR7329564A FR7329564A FR2196488B1 FR 2196488 B1 FR2196488 B1 FR 2196488B1 FR 7329564 A FR7329564 A FR 7329564A FR 7329564 A FR7329564 A FR 7329564A FR 2196488 B1 FR2196488 B1 FR 2196488B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7329564A
Other languages
French (fr)
Other versions
FR2196488A1 (it
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of FR2196488A1 publication Critical patent/FR2196488A1/fr
Application granted granted Critical
Publication of FR2196488B1 publication Critical patent/FR2196488B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7329564A 1972-08-18 1973-08-13 Expired FR2196488B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47082087A JPS5040043B2 (it) 1972-08-18 1972-08-18

Publications (2)

Publication Number Publication Date
FR2196488A1 FR2196488A1 (it) 1974-03-15
FR2196488B1 true FR2196488B1 (it) 1974-11-08

Family

ID=13764647

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7329564A Expired FR2196488B1 (it) 1972-08-18 1973-08-13

Country Status (4)

Country Link
JP (1) JPS5040043B2 (it)
DE (1) DE2341734B2 (it)
FR (1) FR2196488B1 (it)
GB (1) GB1426376A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513621A (en) * 1974-06-28 1976-01-13 Shigeru Usami Reriifusakuseihoho
FR2514159A1 (fr) * 1981-10-02 1983-04-08 Rhone Poulenc Syst Composition photosensible et plaque lithographique realisee a l'aide de cette composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (it) * 1951-08-20
US3573975A (en) * 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material

Also Published As

Publication number Publication date
GB1426376A (en) 1976-02-25
FR2196488A1 (it) 1974-03-15
DE2341734B2 (de) 1978-09-14
DE2341734A1 (de) 1974-03-07
JPS5040043B2 (it) 1975-12-22
JPS4937702A (it) 1974-04-08

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