DE2305902A1 - Verfahren zur erzielung eines genau eingestellten hohen widerstandswerts in einem in einer einkristallinen basis gebildeten widerstand - Google Patents
Verfahren zur erzielung eines genau eingestellten hohen widerstandswerts in einem in einer einkristallinen basis gebildeten widerstandInfo
- Publication number
- DE2305902A1 DE2305902A1 DE2305902A DE2305902A DE2305902A1 DE 2305902 A1 DE2305902 A1 DE 2305902A1 DE 2305902 A DE2305902 A DE 2305902A DE 2305902 A DE2305902 A DE 2305902A DE 2305902 A1 DE2305902 A1 DE 2305902A1
- Authority
- DE
- Germany
- Prior art keywords
- window
- resistance
- resistance value
- diffused area
- diffused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 23
- 238000005530 etching Methods 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 230000003247 decreasing effect Effects 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/40—Resistors
- H10D1/43—Resistors having PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/136—Resistors
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE01790/72A SE354143B (OSRAM) | 1972-02-15 | 1972-02-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2305902A1 true DE2305902A1 (de) | 1973-08-23 |
Family
ID=20258852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2305902A Pending DE2305902A1 (de) | 1972-02-15 | 1973-02-05 | Verfahren zur erzielung eines genau eingestellten hohen widerstandswerts in einem in einer einkristallinen basis gebildeten widerstand |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3860465A (OSRAM) |
| AU (1) | AU468335B2 (OSRAM) |
| DE (1) | DE2305902A1 (OSRAM) |
| FR (1) | FR2172210B1 (OSRAM) |
| GB (1) | GB1415785A (OSRAM) |
| SE (1) | SE354143B (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3912563A (en) * | 1973-06-05 | 1975-10-14 | Matsushita Electric Industrial Co Ltd | Method of making semiconductor piezoresistive strain transducer |
| US4092662A (en) * | 1976-09-29 | 1978-05-30 | Honeywell Inc. | Sensistor apparatus |
| US4332070A (en) * | 1977-01-19 | 1982-06-01 | Fairchild Camera & Instrument Corp. | Method for forming a headless resistor utilizing selective diffusion and special contact formation |
| US4191964A (en) * | 1977-01-19 | 1980-03-04 | Fairchild Camera & Instrument Corp. | Headless resistor |
| US4297670A (en) * | 1977-06-03 | 1981-10-27 | Angstrohm Precision, Inc. | Metal foil resistor |
| DE2908361C2 (de) * | 1979-03-03 | 1985-05-15 | Dynamit Nobel Ag, 5210 Troisdorf | Verfahren zum Erhöhen des Widerstandes elektrischen Zündelementen |
| US4830976A (en) * | 1984-10-01 | 1989-05-16 | American Telephone And Telegraph Company, At&T Bell Laboratories | Integrated circuit resistor |
| US4999731A (en) * | 1986-08-22 | 1991-03-12 | Northern Telecom Limited | Surge protector for telecommunications systems |
| US5057964A (en) * | 1986-12-17 | 1991-10-15 | Northern Telecom Limited | Surge protector for telecommunications terminals |
| US5316978A (en) * | 1993-03-25 | 1994-05-31 | Northern Telecom Limited | Forming resistors for intergrated circuits |
| JPH10242394A (ja) * | 1997-02-27 | 1998-09-11 | Matsushita Electron Corp | 半導体装置の製造方法 |
| DE10302800A1 (de) * | 2003-01-24 | 2004-08-12 | Epcos Ag | Verfahren zur Herstellung eines Bauelements |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3432920A (en) * | 1966-12-01 | 1969-03-18 | Rca Corp | Semiconductor devices and methods of making them |
| US3764409A (en) * | 1969-09-29 | 1973-10-09 | Hitachi Ltd | Method for fabricating a semiconductor component for a semiconductor circuit |
-
1972
- 1972-02-15 SE SE01790/72A patent/SE354143B/xx unknown
-
1973
- 1973-02-01 US US328515A patent/US3860465A/en not_active Expired - Lifetime
- 1973-02-05 DE DE2305902A patent/DE2305902A1/de active Pending
- 1973-02-05 AU AU51792/73A patent/AU468335B2/en not_active Expired
- 1973-02-14 FR FR7305155A patent/FR2172210B1/fr not_active Expired
- 1973-02-14 GB GB737373A patent/GB1415785A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2172210A1 (OSRAM) | 1973-09-28 |
| US3860465A (en) | 1975-01-14 |
| AU5179273A (en) | 1974-08-08 |
| SE354143B (OSRAM) | 1973-02-26 |
| AU468335B2 (en) | 1976-01-08 |
| GB1415785A (en) | 1975-11-26 |
| FR2172210B1 (OSRAM) | 1976-11-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHA | Expiration of time for request for examination |