DE2254859C2 - Verfahren und Vorrichtung zur Herstellung von feinverteilten Metalloxiden - Google Patents
Verfahren und Vorrichtung zur Herstellung von feinverteilten MetalloxidenInfo
- Publication number
- DE2254859C2 DE2254859C2 DE2254859A DE2254859A DE2254859C2 DE 2254859 C2 DE2254859 C2 DE 2254859C2 DE 2254859 A DE2254859 A DE 2254859A DE 2254859 A DE2254859 A DE 2254859A DE 2254859 C2 DE2254859 C2 DE 2254859C2
- Authority
- DE
- Germany
- Prior art keywords
- gas
- openings
- section
- cross
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 18
- 229910044991 metal oxide Inorganic materials 0.000 title claims description 9
- 150000004706 metal oxides Chemical class 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000007789 gas Substances 0.000 claims description 66
- 238000002347 injection Methods 0.000 claims description 24
- 239000007924 injection Substances 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 229910001507 metal halide Inorganic materials 0.000 claims description 14
- 150000005309 metal halides Chemical class 0.000 claims description 13
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 7
- 239000000376 reactant Substances 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 4
- 239000005049 silicon tetrachloride Substances 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- -1 titanium halide Chemical class 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Fire-Extinguishing Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB757072*[A GB1358224A (en) | 1972-02-18 | 1972-02-18 | Gas supply process and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2254859A1 DE2254859A1 (de) | 1973-08-23 |
| DE2254859C2 true DE2254859C2 (de) | 1982-04-15 |
Family
ID=9835674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2254859A Expired DE2254859C2 (de) | 1972-02-18 | 1972-11-09 | Verfahren und Vorrichtung zur Herstellung von feinverteilten Metalloxiden |
Country Status (11)
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6161055U (enrdf_load_stackoverflow) * | 1984-09-28 | 1986-04-24 | ||
| US8741257B2 (en) | 2009-11-10 | 2014-06-03 | E I Du Pont De Nemours And Company | Process for in-situ formation of chlorides of silicon and aluminum in the preparation of titanium dioxide |
| US8734755B2 (en) | 2010-02-22 | 2014-05-27 | E I Du Pont De Nemours And Company | Process for in-situ formation of chlorides of silicon, aluminum and titanium in the preparation of titanium dioxide |
| CN102596815A (zh) | 2010-09-21 | 2012-07-18 | 纳幕尔杜邦公司 | 在二氧化钛的制备中原位形成氯化物的方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1097764A (en) * | 1965-03-18 | 1968-01-03 | British Titan Products | Oxide process |
-
0
- BE BE794694D patent/BE794694A/xx unknown
-
1972
- 1972-02-18 GB GB757072*[A patent/GB1358224A/en not_active Expired
- 1972-10-03 CA CA153,075A patent/CA990475A/en not_active Expired
- 1972-11-09 DE DE2254859A patent/DE2254859C2/de not_active Expired
- 1972-12-11 IT IT54596/72A patent/IT973983B/it active
-
1973
- 1973-01-12 NL NL737300458A patent/NL145827B/xx not_active IP Right Cessation
- 1973-01-15 FR FR7301331A patent/FR2172098B1/fr not_active Expired
- 1973-01-16 AU AU51131/73A patent/AU463695B2/en not_active Expired
- 1973-01-24 NO NO281/73A patent/NO137493C/no unknown
- 1973-01-25 ZA ZA730560A patent/ZA73560B/xx unknown
- 1973-01-25 JP JP1062773A patent/JPS5525125B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AU463695B2 (en) | 1975-07-31 |
| CA990475A (en) | 1976-06-08 |
| BE794694A (fr) | 1973-07-30 |
| IT973983B (it) | 1974-06-10 |
| NL7300458A (enrdf_load_stackoverflow) | 1973-08-21 |
| DE2254859A1 (de) | 1973-08-23 |
| GB1358224A (en) | 1974-07-03 |
| NO137493B (no) | 1977-11-28 |
| AU5113173A (en) | 1974-07-18 |
| NO137493C (no) | 1978-03-08 |
| NL145827B (nl) | 1975-05-15 |
| FR2172098B1 (enrdf_load_stackoverflow) | 1976-05-14 |
| ZA73560B (en) | 1973-10-31 |
| JPS5525125B2 (enrdf_load_stackoverflow) | 1980-07-03 |
| FR2172098A1 (enrdf_load_stackoverflow) | 1973-09-28 |
| JPS4893596A (enrdf_load_stackoverflow) | 1973-12-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| D2 | Grant after examination |