DE2129999A1 - Photopolymerisierbare Massen - Google Patents

Photopolymerisierbare Massen

Info

Publication number
DE2129999A1
DE2129999A1 DE19712129999 DE2129999A DE2129999A1 DE 2129999 A1 DE2129999 A1 DE 2129999A1 DE 19712129999 DE19712129999 DE 19712129999 DE 2129999 A DE2129999 A DE 2129999A DE 2129999 A1 DE2129999 A1 DE 2129999A1
Authority
DE
Germany
Prior art keywords
cellulose
acid
photopolymerizable
parts
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19712129999
Other languages
German (de)
English (en)
Inventor
Shunichi Koyanagi
Niigata Nakakubiki
Niigata Naoetsu
Kinya Ogawa
Shigeru Ono
Fujio Sekigawa
Hiroshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE2129999A1 publication Critical patent/DE2129999A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/112Cellulosic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
DE19712129999 1970-06-17 1971-06-16 Photopolymerisierbare Massen Withdrawn DE2129999A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP45052638A JPS4917482B1 (enExample) 1970-06-17 1970-06-17

Publications (1)

Publication Number Publication Date
DE2129999A1 true DE2129999A1 (de) 1971-12-23

Family

ID=12920355

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712129999 Withdrawn DE2129999A1 (de) 1970-06-17 1971-06-16 Photopolymerisierbare Massen

Country Status (5)

Country Link
US (1) US3708305A (enExample)
JP (1) JPS4917482B1 (enExample)
DE (1) DE2129999A1 (enExample)
FR (1) FR2099142A5 (enExample)
GB (1) GB1325796A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
JPS58212994A (ja) * 1982-06-07 1983-12-10 Sony Corp 昇華転写式カラ−ハ−ドコピ−用印画紙
JPS6281402A (ja) * 1985-10-07 1987-04-14 Shin Etsu Chem Co Ltd セルロ−スエ−テル酸性ジカルボン酸エステルの製造方法
US5656746A (en) * 1996-03-28 1997-08-12 The Proctor & Gamble Company Temporary wet strength polymers from oxidized reaction product of polyhydroxy polymer and 1,2-disubstituted carboxylic alkene
US5698688A (en) * 1996-03-28 1997-12-16 The Procter & Gamble Company Aldehyde-modified cellulosic fibers for paper products having high initial wet strength
EP1388759A1 (en) * 2002-08-06 2004-02-11 Shin-Etsu Chemical Co., Ltd. Positive photoresist composition

Also Published As

Publication number Publication date
FR2099142A5 (enExample) 1972-03-10
US3708305A (en) 1973-01-02
JPS4917482B1 (enExample) 1974-05-01
GB1325796A (en) 1973-08-08

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Legal Events

Date Code Title Description
OD Request for examination
8136 Disposal/non-payment of the fee for publication/grant