DE2123887A1 - Maske zum Belichten strahlungsempfindlicher Schichten - Google Patents
Maske zum Belichten strahlungsempfindlicher SchichtenInfo
- Publication number
- DE2123887A1 DE2123887A1 DE19712123887 DE2123887A DE2123887A1 DE 2123887 A1 DE2123887 A1 DE 2123887A1 DE 19712123887 DE19712123887 DE 19712123887 DE 2123887 A DE2123887 A DE 2123887A DE 2123887 A1 DE2123887 A1 DE 2123887A1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- radiation
- exposure
- opaque
- mask according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims description 15
- 239000000463 material Substances 0.000 claims description 50
- 150000002222 fluorine compounds Chemical class 0.000 claims description 8
- 229910052566 spinel group Inorganic materials 0.000 claims description 7
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 description 21
- 229920002120 photoresistant polymer Polymers 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- 230000000873 masking effect Effects 0.000 description 11
- 239000000758 substrate Substances 0.000 description 9
- JSUIEZRQVIVAMP-UHFFFAOYSA-N gallium iron Chemical compound [Fe].[Ga] JSUIEZRQVIVAMP-UHFFFAOYSA-N 0.000 description 7
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 2
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910017768 LaF 3 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- VRPQIIJGEJVXBK-UHFFFAOYSA-N fluoro hypofluorite lanthanum Chemical compound [La].FOF VRPQIIJGEJVXBK-UHFFFAOYSA-N 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- MTRJKZUDDJZTLA-UHFFFAOYSA-N iron yttrium Chemical compound [Fe].[Y] MTRJKZUDDJZTLA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/943—Movable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/945—Special, e.g. metal
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5123770A | 1970-06-30 | 1970-06-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2123887A1 true DE2123887A1 (de) | 1972-01-05 |
| DE2123887B2 DE2123887B2 (en, 2012) | 1979-01-11 |
| DE2123887C3 DE2123887C3 (en, 2012) | 1979-09-06 |
Family
ID=21970124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712123887 Granted DE2123887A1 (de) | 1970-06-30 | 1971-05-14 | Maske zum Belichten strahlungsempfindlicher Schichten |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3661436A (en, 2012) |
| JP (1) | JPS513631B1 (en, 2012) |
| CA (1) | CA939548A (en, 2012) |
| DE (1) | DE2123887A1 (en, 2012) |
| FR (1) | FR2095598A5 (en, 2012) |
| GB (1) | GB1330915A (en, 2012) |
| SE (1) | SE359688B (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2325598A1 (de) * | 1972-06-20 | 1974-01-10 | Ibm | Dauerhafte, durchsichtige photomaske |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3895147A (en) * | 1971-12-27 | 1975-07-15 | Ibm | Fabrication mask using divalent rare earth element |
| US3816223A (en) * | 1971-12-27 | 1974-06-11 | Ibm | Fabrication mask using rare earth orthoferrites |
| US3857689A (en) * | 1971-12-28 | 1974-12-31 | Nippon Selfoc Co Ltd | Ion exchange process for manufacturing integrated optical circuits |
| US4600481A (en) * | 1982-12-30 | 1986-07-15 | Eltech Systems Corporation | Aluminum production cell components |
| US4884870A (en) * | 1988-10-17 | 1989-12-05 | Chrysler Motors Corporation | Lens structure for a vehicle radio or the like |
| US4884872A (en) * | 1988-10-27 | 1989-12-05 | Chrysler Motors Corporation | Lens structure for a combined radio/audio tape cassette player or the like |
| EP1373151A1 (en) * | 2001-02-24 | 2004-01-02 | Corning Incorporated | Oxygen doping of silicon oxyfluoride glass |
| US7818875B2 (en) * | 2005-12-07 | 2010-10-26 | Hitachi Global Storage Technologies Netherlands B.V. | Method of manufacturing a magnetic head with integration of a small flash field, zero bias, and non-reactive ion milling for pole tip uniformity |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3135823A (en) * | 1960-06-28 | 1964-06-02 | Pritikin Nathan | Metallic element embedding process and product |
| US3498833A (en) * | 1966-07-08 | 1970-03-03 | Fairchild Camera Instr Co | Double masking technique for integrated circuit |
| US3508982A (en) * | 1967-01-03 | 1970-04-28 | Itt | Method of making an ultra-violet selective template |
| US3510371A (en) * | 1967-01-25 | 1970-05-05 | Itt | Method of making an ultraviolet sensitive template |
-
1970
- 1970-06-30 US US51237A patent/US3661436A/en not_active Expired - Lifetime
-
1971
- 1971-05-06 FR FR7118047A patent/FR2095598A5/fr not_active Expired
- 1971-05-13 GB GB1482471*[A patent/GB1330915A/en not_active Expired
- 1971-05-14 DE DE19712123887 patent/DE2123887A1/de active Granted
- 1971-05-21 JP JP46034183A patent/JPS513631B1/ja active Pending
- 1971-05-21 CA CA113,584A patent/CA939548A/en not_active Expired
- 1971-06-30 SE SE08448/71A patent/SE359688B/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2325598A1 (de) * | 1972-06-20 | 1974-01-10 | Ibm | Dauerhafte, durchsichtige photomaske |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2095598A5 (en, 2012) | 1972-02-11 |
| SE359688B (en, 2012) | 1973-09-03 |
| DE2123887C3 (en, 2012) | 1979-09-06 |
| GB1330915A (en) | 1973-09-19 |
| US3661436A (en) | 1972-05-09 |
| CA939548A (en) | 1974-01-08 |
| DE2123887B2 (en, 2012) | 1979-01-11 |
| JPS513631B1 (en, 2012) | 1976-02-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |