DE69230119T2 - Verfahren zur Herstellung einer Schattenmaske durch Ätzen einer Resistschicht - Google Patents

Verfahren zur Herstellung einer Schattenmaske durch Ätzen einer Resistschicht

Info

Publication number
DE69230119T2
DE69230119T2 DE69230119T DE69230119T DE69230119T2 DE 69230119 T2 DE69230119 T2 DE 69230119T2 DE 69230119 T DE69230119 T DE 69230119T DE 69230119 T DE69230119 T DE 69230119T DE 69230119 T2 DE69230119 T2 DE 69230119T2
Authority
DE
Germany
Prior art keywords
etching
producing
resist layer
shadow mask
shadow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69230119T
Other languages
English (en)
Other versions
DE69230119D1 (de
Inventor
Osamu Nakamura
Takeshi Ikemagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3161578A external-priority patent/JP2637864B2/ja
Priority claimed from JP17910891A external-priority patent/JPH07107828B2/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE69230119D1 publication Critical patent/DE69230119D1/de
Publication of DE69230119T2 publication Critical patent/DE69230119T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
DE69230119T 1991-07-02 1992-07-02 Verfahren zur Herstellung einer Schattenmaske durch Ätzen einer Resistschicht Expired - Fee Related DE69230119T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3161578A JP2637864B2 (ja) 1991-07-02 1991-07-02 シャドーマスクの製造方法
JP17910891A JPH07107828B2 (ja) 1991-07-19 1991-07-19 薄板鋼板のエッチング貫通孔形成方法

Publications (2)

Publication Number Publication Date
DE69230119D1 DE69230119D1 (de) 1999-11-18
DE69230119T2 true DE69230119T2 (de) 2000-03-30

Family

ID=26487658

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69230119T Expired - Fee Related DE69230119T2 (de) 1991-07-02 1992-07-02 Verfahren zur Herstellung einer Schattenmaske durch Ätzen einer Resistschicht

Country Status (3)

Country Link
US (2) US5348825A (de)
EP (1) EP0521721B1 (de)
DE (1) DE69230119T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5532545A (en) * 1993-05-19 1996-07-02 Matsushita Electronics Corporation Color cathode ray tube
JPH0737492A (ja) * 1993-07-21 1995-02-07 Dainippon Printing Co Ltd アパーチャーグリルの製造方法
EP0641009B1 (de) * 1993-08-25 2000-01-05 Kabushiki Kaisha Toshiba Farbkathodenstrahlröhre und deren Herstellungsverfahren
JP3282347B2 (ja) * 1993-09-07 2002-05-13 ソニー株式会社 エッチング法、色選別機構及びその作製方法、並びに、陰極線管
TW373222B (en) 1996-07-02 1999-11-01 Toshiba Corp Shade shelter lid fabricating method, shade shelter lid fabricating device, and the cleaning device using for the same
US6508945B1 (en) * 2000-02-24 2003-01-21 Sony Corporation Aperture grill for use in cathode ray tube and method for producing same
CN102033425B (zh) * 2010-10-26 2012-07-11 中国航天科技集团公司第五研究院第五一○研究所 一种微机械百叶窗的制作方法
KR101854796B1 (ko) * 2011-09-15 2018-05-09 삼성디스플레이 주식회사 마스크 제조 방법
CN103449355B (zh) * 2012-05-31 2016-03-30 中国科学院微电子研究所 纳米孔阵列的制作方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3609033A (en) * 1969-08-15 1971-09-28 Buckbee Mears Co Mask for etching enlargement
US3929532A (en) * 1974-07-17 1975-12-30 Rca Corp Method for etching apertured work piece
NL7500247A (nl) * 1975-01-09 1976-07-13 Philips Nv Werkwijze voor het etsen van openingen in een dunne metalen band.
US4362595A (en) * 1980-05-19 1982-12-07 The Boeing Company Screen fabrication by hand chemical blanking
JPS62247085A (ja) * 1986-04-17 1987-10-28 Dainippon Screen Mfg Co Ltd フオトエッチング法による金属薄板の加工方法
JPS63286588A (ja) * 1987-05-19 1988-11-24 Toshiba Corp シャドウマスクの製造方法
JP2716714B2 (ja) * 1988-01-27 1998-02-18 株式会社東芝 シャドウマスクの製造方法
JPH01252788A (ja) * 1988-03-30 1989-10-09 Nissha Printing Co Ltd メタルマスクの製造方法
EP0422614B1 (de) * 1989-10-13 1996-12-27 Kabushiki Kaisha Toshiba Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske

Also Published As

Publication number Publication date
US5348825A (en) 1994-09-20
EP0521721A2 (de) 1993-01-07
DE69230119D1 (de) 1999-11-18
US5567555A (en) 1996-10-22
EP0521721B1 (de) 1999-10-13
EP0521721A3 (en) 1993-04-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee