DE2114652A1 - Verfahren zum Regenerieren von Elektrolyten fur die chemische Ab scheidung von Metallen - Google Patents
Verfahren zum Regenerieren von Elektrolyten fur die chemische Ab scheidung von MetallenInfo
- Publication number
- DE2114652A1 DE2114652A1 DE19712114652 DE2114652A DE2114652A1 DE 2114652 A1 DE2114652 A1 DE 2114652A1 DE 19712114652 DE19712114652 DE 19712114652 DE 2114652 A DE2114652 A DE 2114652A DE 2114652 A1 DE2114652 A1 DE 2114652A1
- Authority
- DE
- Germany
- Prior art keywords
- metal
- cell
- metal ions
- metals
- regenerating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 title claims description 19
- 229910052751 metal Inorganic materials 0.000 title claims description 19
- 239000003792 electrolyte Substances 0.000 title claims description 11
- 238000000034 method Methods 0.000 title claims description 10
- 238000005234 chemical deposition Methods 0.000 title claims description 6
- 230000001172 regenerating effect Effects 0.000 title claims description 5
- 150000002739 metals Chemical group 0.000 title claims description 4
- 229910021645 metal ion Inorganic materials 0.000 claims description 11
- 239000000243 solution Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 239000008151 electrolyte solution Substances 0.000 claims description 4
- 230000001502 supplementing effect Effects 0.000 claims description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 230000008929 regeneration Effects 0.000 description 9
- 238000011069 regeneration method Methods 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Chemically Coating (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712114652 DE2114652A1 (de) | 1971-03-23 | 1971-03-23 | Verfahren zum Regenerieren von Elektrolyten fur die chemische Ab scheidung von Metallen |
| GB814272A GB1384118A (en) | 1971-03-23 | 1972-02-22 | Treatment processes using metal ion-containing treating solutions |
| IT2194072A IT950267B (it) | 1971-03-23 | 1972-03-16 | Procedimento per rigenerare elettro liti per la deposizione chimica di di metalli |
| FR7209967A FR2130529B1 (https=) | 1971-03-23 | 1972-03-22 | |
| JP47029365A JPS5234572B1 (https=) | 1971-03-23 | 1972-03-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712114652 DE2114652A1 (de) | 1971-03-23 | 1971-03-23 | Verfahren zum Regenerieren von Elektrolyten fur die chemische Ab scheidung von Metallen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2114652A1 true DE2114652A1 (de) | 1972-10-05 |
Family
ID=5802817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712114652 Pending DE2114652A1 (de) | 1971-03-23 | 1971-03-23 | Verfahren zum Regenerieren von Elektrolyten fur die chemische Ab scheidung von Metallen |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5234572B1 (https=) |
| DE (1) | DE2114652A1 (https=) |
| FR (1) | FR2130529B1 (https=) |
| GB (1) | GB1384118A (https=) |
| IT (1) | IT950267B (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2713392A1 (de) * | 1977-03-23 | 1978-09-28 | Ruwel Gmbh | Verfahren und einrichtung zum herstellen von zur chemischen metallabscheidung geeigneten metallkomplexverbindungen und zum betrieb chemischer metallisierungsbaeder |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4425205A (en) * | 1982-03-13 | 1984-01-10 | Kanto Kasei Co., Ltd. | Process for regenerating electroless plating bath and a regenerating apparatus of electroless plating bath |
| CN114672792B (zh) * | 2022-04-20 | 2024-11-22 | 深圳市恒博智造有限公司 | 一种具有负载及镀镍时间控制功能的镀镍用镍缸装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3303111A (en) * | 1963-08-12 | 1967-02-07 | Arthur L Peach | Electro-electroless plating method |
| IL31031A (en) * | 1967-12-04 | 1972-08-30 | Stauffer Chemical Co | Process of chemical nickel plating and baths therefore |
-
1971
- 1971-03-23 DE DE19712114652 patent/DE2114652A1/de active Pending
-
1972
- 1972-02-22 GB GB814272A patent/GB1384118A/en not_active Expired
- 1972-03-16 IT IT2194072A patent/IT950267B/it active
- 1972-03-22 FR FR7209967A patent/FR2130529B1/fr not_active Expired
- 1972-03-23 JP JP47029365A patent/JPS5234572B1/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2713392A1 (de) * | 1977-03-23 | 1978-09-28 | Ruwel Gmbh | Verfahren und einrichtung zum herstellen von zur chemischen metallabscheidung geeigneten metallkomplexverbindungen und zum betrieb chemischer metallisierungsbaeder |
Also Published As
| Publication number | Publication date |
|---|---|
| IT950267B (it) | 1973-06-20 |
| GB1384118A (en) | 1975-02-19 |
| FR2130529A1 (https=) | 1972-11-03 |
| JPS5234572B1 (https=) | 1977-09-03 |
| FR2130529B1 (https=) | 1976-08-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| OHN | Withdrawal |