DE2107286C3 - - Google Patents

Info

Publication number
DE2107286C3
DE2107286C3 DE19712107286 DE2107286A DE2107286C3 DE 2107286 C3 DE2107286 C3 DE 2107286C3 DE 19712107286 DE19712107286 DE 19712107286 DE 2107286 A DE2107286 A DE 2107286A DE 2107286 C3 DE2107286 C3 DE 2107286C3
Authority
DE
Germany
Prior art keywords
carbon
mixture
photoresist layer
polyene
polythiol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19712107286
Other languages
German (de)
English (en)
Other versions
DE2107286B2 (es
DE2107286A1 (de
Inventor
Victor Samuel Frank
Clifton Leroy Kehr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of DE2107286A1 publication Critical patent/DE2107286A1/de
Publication of DE2107286B2 publication Critical patent/DE2107286B2/de
Application granted granted Critical
Publication of DE2107286C3 publication Critical patent/DE2107286C3/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE19712107286 1970-02-26 1971-02-16 Photoresistverfahren Granted DE2107286A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1444970A 1970-02-26 1970-02-26

Publications (3)

Publication Number Publication Date
DE2107286A1 DE2107286A1 (de) 1971-09-02
DE2107286B2 DE2107286B2 (es) 1978-09-07
DE2107286C3 true DE2107286C3 (es) 1979-05-03

Family

ID=21765543

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712107286 Granted DE2107286A1 (de) 1970-02-26 1971-02-16 Photoresistverfahren

Country Status (6)

Country Link
JP (1) JPS497002B1 (es)
BR (1) BR7101076D0 (es)
CA (1) CA926183A (es)
DE (1) DE2107286A1 (es)
FR (1) FR2083085A5 (es)
GB (1) GB1293722A (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate
GB8333853D0 (en) * 1983-12-20 1984-02-01 Ciba Geigy Ag Production of images
GB8402937D0 (en) * 1984-02-03 1984-03-07 Ciba Geigy Ag Production of images
EP1674287A1 (de) * 2004-12-22 2006-06-28 Atlantic ZeiserGmbH Verfahren und Einrichtung zum Erzeugen von dreidimensionalen Informationen auf einer Oberfläche
CN114393939B (zh) * 2021-12-30 2023-06-27 浙江美浓世纪集团有限公司 一种无膜烫金方法

Also Published As

Publication number Publication date
DE2107286B2 (es) 1978-09-07
GB1293722A (en) 1972-10-25
JPS497002B1 (es) 1974-02-18
DE2107286A1 (de) 1971-09-02
CA926183A (en) 1973-05-15
FR2083085A5 (es) 1971-12-10
BR7101076D0 (pt) 1973-04-26

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
EHJ Ceased/non-payment of the annual fee