JPS497002B1 - - Google Patents
Info
- Publication number
- JPS497002B1 JPS497002B1 JP11062070A JP11062070A JPS497002B1 JP S497002 B1 JPS497002 B1 JP S497002B1 JP 11062070 A JP11062070 A JP 11062070A JP 11062070 A JP11062070 A JP 11062070A JP S497002 B1 JPS497002 B1 JP S497002B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1444970A | 1970-02-26 | 1970-02-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS497002B1 true JPS497002B1 (ja) | 1974-02-18 |
Family
ID=21765543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11062070A Pending JPS497002B1 (ja) | 1970-02-26 | 1970-12-14 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS497002B1 (ja) |
| BR (1) | BR7101076D0 (ja) |
| CA (1) | CA926183A (ja) |
| DE (1) | DE2107286A1 (ja) |
| FR (1) | FR2083085A5 (ja) |
| GB (1) | GB1293722A (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4234676A (en) | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
| US4179531A (en) | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| US4248960A (en) * | 1978-01-23 | 1981-02-03 | W. R. Grace & Co. | Radiation responsive relief imageable plastic laminate |
| GB8333853D0 (en) * | 1983-12-20 | 1984-02-01 | Ciba Geigy Ag | Production of images |
| GB8402937D0 (en) * | 1984-02-03 | 1984-03-07 | Ciba Geigy Ag | Production of images |
| EP1674287A1 (de) * | 2004-12-22 | 2006-06-28 | Atlantic ZeiserGmbH | Verfahren und Einrichtung zum Erzeugen von dreidimensionalen Informationen auf einer Oberfläche |
| CN114393939B (zh) * | 2021-12-30 | 2023-06-27 | 浙江美浓世纪集团有限公司 | 一种无膜烫金方法 |
-
1970
- 1970-11-20 CA CA098658A patent/CA926183A/en not_active Expired
- 1970-12-14 JP JP11062070A patent/JPS497002B1/ja active Pending
-
1971
- 1971-01-18 GB GB238271A patent/GB1293722A/en not_active Expired
- 1971-02-16 DE DE19712107286 patent/DE2107286A1/de active Granted
- 1971-02-17 FR FR7105394A patent/FR2083085A5/fr not_active Expired
- 1971-02-17 BR BR107671A patent/BR7101076D0/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CA926183A (en) | 1973-05-15 |
| GB1293722A (en) | 1972-10-25 |
| FR2083085A5 (ja) | 1971-12-10 |
| DE2107286B2 (ja) | 1978-09-07 |
| BR7101076D0 (pt) | 1973-04-26 |
| DE2107286A1 (de) | 1971-09-02 |
| DE2107286C3 (ja) | 1979-05-03 |