DE2009284C3 - Fotomasken-Projektionseinrichtung - Google Patents
Fotomasken-ProjektionseinrichtungInfo
- Publication number
- DE2009284C3 DE2009284C3 DE19702009284 DE2009284A DE2009284C3 DE 2009284 C3 DE2009284 C3 DE 2009284C3 DE 19702009284 DE19702009284 DE 19702009284 DE 2009284 A DE2009284 A DE 2009284A DE 2009284 C3 DE2009284 C3 DE 2009284C3
- Authority
- DE
- Germany
- Prior art keywords
- projection
- mask
- compensation
- image
- lighting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005855 radiation Effects 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 43
- 230000003287 optical effect Effects 0.000 claims description 31
- 238000003384 imaging method Methods 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 8
- 238000010521 absorption reaction Methods 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 6
- 230000002745 absorbent Effects 0.000 claims 2
- 239000002250 absorbent Substances 0.000 claims 2
- 238000009827 uniform distribution Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 description 9
- 230000000875 corresponding effect Effects 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1748069 | 1969-02-27 | ||
| JP1748169 | 1969-02-27 | ||
| JP44099699A JPS5023276B1 (enrdf_load_stackoverflow) | 1969-12-11 | 1969-12-11 | |
| JP1220270 | 1970-02-12 | ||
| JP45015124A JPS5147026B1 (enrdf_load_stackoverflow) | 1970-02-20 | 1970-02-20 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2009284A1 DE2009284A1 (de) | 1970-09-10 |
| DE2009284B2 DE2009284B2 (de) | 1974-01-03 |
| DE2009284C3 true DE2009284C3 (de) | 1974-08-22 |
Family
ID=27519374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19702009284 Expired DE2009284C3 (de) | 1969-02-27 | 1970-02-27 | Fotomasken-Projektionseinrichtung |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2009284C3 (enrdf_load_stackoverflow) |
| GB (1) | GB1305792A (enrdf_load_stackoverflow) |
| NL (1) | NL7002828A (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3853398A (en) * | 1972-07-05 | 1974-12-10 | Canon Kk | Mask pattern printing device |
| US4473293A (en) * | 1979-04-03 | 1984-09-25 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
| US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
| US4597664A (en) * | 1980-02-29 | 1986-07-01 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| US4452526A (en) * | 1980-02-29 | 1984-06-05 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| DE3173163D1 (en) * | 1980-02-29 | 1986-01-23 | Eaton Optimetrix Inc | Alignment apparatus |
| DD158824A1 (de) * | 1980-11-03 | 1983-02-02 | Adelbrecht Schorcht | Anordnung zur automatischen justierung mindestens eines gegenstandes |
| US4577958A (en) * | 1982-06-18 | 1986-03-25 | Eaton Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
| JPS5928337A (ja) * | 1982-08-09 | 1984-02-15 | Hitachi Ltd | プロジエクシヨンアライナ |
| US4577957A (en) * | 1983-01-07 | 1986-03-25 | Eaton-Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
| CN112083578B (zh) * | 2020-08-26 | 2021-06-22 | 中国科学院西安光学精密机械研究所 | 用于光电设备像面对接的目标模拟器、调试系统及方法 |
-
1970
- 1970-02-27 DE DE19702009284 patent/DE2009284C3/de not_active Expired
- 1970-02-27 NL NL7002828A patent/NL7002828A/xx unknown
- 1970-02-27 GB GB957070A patent/GB1305792A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1305792A (enrdf_load_stackoverflow) | 1973-02-07 |
| DE2009284B2 (de) | 1974-01-03 |
| DE2009284A1 (de) | 1970-09-10 |
| NL7002828A (enrdf_load_stackoverflow) | 1970-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| SH | Request for examination between 03.10.1968 and 22.04.1971 | ||
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 |