NL7002828A - - Google Patents

Info

Publication number
NL7002828A
NL7002828A NL7002828A NL7002828A NL7002828A NL 7002828 A NL7002828 A NL 7002828A NL 7002828 A NL7002828 A NL 7002828A NL 7002828 A NL7002828 A NL 7002828A NL 7002828 A NL7002828 A NL 7002828A
Authority
NL
Netherlands
Application number
NL7002828A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP44099699A external-priority patent/JPS5023276B1/ja
Priority claimed from JP45015124A external-priority patent/JPS5147026B1/ja
Application filed filed Critical
Publication of NL7002828A publication Critical patent/NL7002828A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL7002828A 1969-02-27 1970-02-27 NL7002828A (enrdf_load_stackoverflow)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP1748069 1969-02-27
JP1748169 1969-02-27
JP44099699A JPS5023276B1 (enrdf_load_stackoverflow) 1969-12-11 1969-12-11
JP1220270 1970-02-12
JP45015124A JPS5147026B1 (enrdf_load_stackoverflow) 1970-02-20 1970-02-20

Publications (1)

Publication Number Publication Date
NL7002828A true NL7002828A (enrdf_load_stackoverflow) 1970-08-31

Family

ID=27519374

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7002828A NL7002828A (enrdf_load_stackoverflow) 1969-02-27 1970-02-27

Country Status (3)

Country Link
DE (1) DE2009284C3 (enrdf_load_stackoverflow)
GB (1) GB1305792A (enrdf_load_stackoverflow)
NL (1) NL7002828A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112083578A (zh) * 2020-08-26 2020-12-15 中国科学院西安光学精密机械研究所 用于光电设备像面对接的目标模拟器、调试系统及方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3853398A (en) * 1972-07-05 1974-12-10 Canon Kk Mask pattern printing device
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
EP0035113B1 (en) * 1980-02-29 1985-12-11 Eaton-Optimetrix Inc. Alignment apparatus
DD158824A1 (de) * 1980-11-03 1983-02-02 Adelbrecht Schorcht Anordnung zur automatischen justierung mindestens eines gegenstandes
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112083578A (zh) * 2020-08-26 2020-12-15 中国科学院西安光学精密机械研究所 用于光电设备像面对接的目标模拟器、调试系统及方法
CN112083578B (zh) * 2020-08-26 2021-06-22 中国科学院西安光学精密机械研究所 用于光电设备像面对接的目标模拟器、调试系统及方法

Also Published As

Publication number Publication date
GB1305792A (enrdf_load_stackoverflow) 1973-02-07
DE2009284B2 (de) 1974-01-03
DE2009284C3 (de) 1974-08-22
DE2009284A1 (de) 1970-09-10

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