DE19829172A1 - Verfahren zur Herstellung von Antireflexschichten - Google Patents

Verfahren zur Herstellung von Antireflexschichten

Info

Publication number
DE19829172A1
DE19829172A1 DE19829172A DE19829172A DE19829172A1 DE 19829172 A1 DE19829172 A1 DE 19829172A1 DE 19829172 A DE19829172 A DE 19829172A DE 19829172 A DE19829172 A DE 19829172A DE 19829172 A1 DE19829172 A1 DE 19829172A1
Authority
DE
Germany
Prior art keywords
layer
reflective
polymer
produced
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19829172A
Other languages
German (de)
English (en)
Inventor
Ullrich Steiner
Stefan Walheim
Erik Schaeffer
Stefan Eggert
Juergen Mlynek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universitaet Konstanz
Original Assignee
Universitaet Konstanz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaet Konstanz filed Critical Universitaet Konstanz
Priority to DE19829172A priority Critical patent/DE19829172A1/de
Priority to AT99932749T priority patent/ATE235066T1/de
Priority to AU49023/99A priority patent/AU4902399A/en
Priority to DE59904643T priority patent/DE59904643D1/de
Priority to EP99932749A priority patent/EP1092164B1/de
Priority to ES99932749T priority patent/ES2195588T3/es
Priority to JP2000557167A priority patent/JP4389240B2/ja
Priority to PCT/EP1999/004491 priority patent/WO2000000854A1/de
Publication of DE19829172A1 publication Critical patent/DE19829172A1/de
Priority to US09/739,245 priority patent/US6605229B2/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/77—Coatings having a rough surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE19829172A 1998-06-30 1998-06-30 Verfahren zur Herstellung von Antireflexschichten Withdrawn DE19829172A1 (de)

Priority Applications (9)

Application Number Priority Date Filing Date Title
DE19829172A DE19829172A1 (de) 1998-06-30 1998-06-30 Verfahren zur Herstellung von Antireflexschichten
AT99932749T ATE235066T1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten
AU49023/99A AU4902399A (en) 1998-06-30 1999-06-29 Method for producing anti-reflection coatings
DE59904643T DE59904643D1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten
EP99932749A EP1092164B1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten
ES99932749T ES2195588T3 (es) 1998-06-30 1999-06-29 Procedimiento para la produccion de capas antirreflejo.
JP2000557167A JP4389240B2 (ja) 1998-06-30 1999-06-29 反射防止膜を作製する方法
PCT/EP1999/004491 WO2000000854A1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten
US09/739,245 US6605229B2 (en) 1998-06-30 2000-12-19 Process for producing antireflection coatings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19829172A DE19829172A1 (de) 1998-06-30 1998-06-30 Verfahren zur Herstellung von Antireflexschichten

Publications (1)

Publication Number Publication Date
DE19829172A1 true DE19829172A1 (de) 2000-01-05

Family

ID=7872505

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19829172A Withdrawn DE19829172A1 (de) 1998-06-30 1998-06-30 Verfahren zur Herstellung von Antireflexschichten
DE59904643T Expired - Lifetime DE59904643D1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59904643T Expired - Lifetime DE59904643D1 (de) 1998-06-30 1999-06-29 Verfahren zur herstellung von antireflexschichten

Country Status (8)

Country Link
US (1) US6605229B2 (https=)
EP (1) EP1092164B1 (https=)
JP (1) JP4389240B2 (https=)
AT (1) ATE235066T1 (https=)
AU (1) AU4902399A (https=)
DE (2) DE19829172A1 (https=)
ES (1) ES2195588T3 (https=)
WO (1) WO2000000854A1 (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1069088A1 (en) * 1999-07-16 2001-01-17 Asahi Glass Co., Ltd. Antiglare-antireflection film and process for producing it
EP1580816A2 (de) 2004-03-27 2005-09-28 Forschungszentrum Karlsruhe GmbH Element, umfassend ein reflektierendes Substrat und eine Antireflexschicht, Verfahren zu seiner Herstellung und seine Verwendung
DE102005005396B3 (de) * 2005-02-03 2006-06-14 Innovent E.V. Technologieentwicklung Beschichtetes AsSe-Chalkogenidglas und Verfahren zur Herstellung dieses beschichteten Glases
WO2007093339A1 (en) * 2006-02-14 2007-08-23 Dsm Ip Assets B.V. Anti-reflective coated glas plate
DE102008020324A1 (de) 2008-04-23 2009-10-29 Clariant International Limited Polysilazane enthaltende Beschichtungen zur Erhöhung der Lichtausbeute von verkapselten Solarzellen
DE102009050568A1 (de) * 2009-10-23 2011-04-28 Schott Ag Einrichtung mit verminderten Reibeigenschaften
WO2011137144A1 (en) * 2010-04-30 2011-11-03 Corning Incorporated Anti-glare surface and method of making

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US6805903B2 (en) * 2000-08-29 2004-10-19 Japan Science And Technology Corporation Method of forming optical thin film
GB0109295D0 (en) 2001-04-12 2001-05-30 Univ Cambridge Tech Optoelectronic devices and a method for producing the same
US6470599B1 (en) * 2001-04-23 2002-10-29 Young Chu Climbing shoe with concave sole
US20030215626A1 (en) * 2002-03-22 2003-11-20 Hiller Jeri?Apos;Ann Nanoporous coatings
US20050244571A1 (en) 2002-05-21 2005-11-03 Interfloat Corporation Method and device for the production of an antireflective coating, antireflective coating, and antireflective-coated substrate
AU2003223826A1 (en) 2002-05-21 2003-12-02 Interfloat Corporation Method and use of a device for coating plate-shaped substrates
US8101015B2 (en) * 2003-10-07 2012-01-24 Honeywell International Inc. Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof
TWI323728B (en) * 2004-08-31 2010-04-21 Ind Tech Res Inst Polymer film with three-dimensional nanopores and fabrication method thereof
TWI288827B (en) * 2004-08-31 2007-10-21 Ind Tech Res Inst Three-dimensional nano-porous film and fabrication method thereof
US20070104922A1 (en) * 2005-11-08 2007-05-10 Lei Zhai Superhydrophilic coatings
FR2896887B1 (fr) * 2006-02-02 2008-05-30 Essilor Int Article comportant un revetement mesoporeux presentant un profil d'indice de refraction et ses procedes de fabrication
US20080268229A1 (en) * 2006-08-09 2008-10-30 Daeyeon Lee Superhydrophilic coatings
CN101796146B (zh) * 2007-09-07 2013-09-04 3M创新有限公司 包含经表面改性的高折射率纳米粒子的自组装抗反射涂层
US20090071537A1 (en) * 2007-09-17 2009-03-19 Ozgur Yavuzcetin Index tuned antireflective coating using a nanostructured metamaterial
TWI385073B (zh) * 2008-10-28 2013-02-11 Benq Materials Corp 光學薄膜及其製作方法
US20100301437A1 (en) * 2009-06-01 2010-12-02 Kla-Tencor Corporation Anti-Reflective Coating For Sensors Suitable For High Throughput Inspection Systems
US20110151222A1 (en) * 2009-12-22 2011-06-23 Agc Flat Glass North America, Inc. Anti-reflective coatings and methods of making the same
WO2011139856A2 (en) 2010-04-29 2011-11-10 Battelle Memorial Institute High refractive index composition
JP6080349B2 (ja) * 2010-11-26 2017-02-15 キヤノン株式会社 光学部材および撮像装置
WO2013069544A1 (ja) 2011-11-09 2013-05-16 Jsr株式会社 パターン形成用自己組織化組成物及びパターン形成方法
JP5835123B2 (ja) 2012-06-21 2015-12-24 Jsr株式会社 パターン形成用自己組織化組成物及びパターン形成方法
US20140268348A1 (en) * 2013-03-13 2014-09-18 Intermolecular Inc. Anti-Reflective Coatings with Porosity Gradient and Methods for Forming the Same
CN109263151B (zh) 2013-12-19 2021-02-05 3M创新有限公司 多层复合材料制品
US9347890B2 (en) 2013-12-19 2016-05-24 Kla-Tencor Corporation Low-noise sensor and an inspection system using a low-noise sensor
JP6398695B2 (ja) 2013-12-26 2018-10-03 Jsr株式会社 下地膜形成用組成物及び自己組織化リソグラフィープロセス
KR102238922B1 (ko) 2013-12-26 2021-04-12 제이에스알 가부시끼가이샤 하지막 형성용 조성물 및 자기 조직화 리소그래피 방법
US9748294B2 (en) 2014-01-10 2017-08-29 Hamamatsu Photonics K.K. Anti-reflection layer for back-illuminated sensor
JP6394042B2 (ja) 2014-02-13 2018-09-26 Jsr株式会社 パターン形成用組成物及びパターン形成方法
US9410901B2 (en) 2014-03-17 2016-08-09 Kla-Tencor Corporation Image sensor, an inspection system and a method of inspecting an article
JP6264148B2 (ja) 2014-03-28 2018-01-24 Jsr株式会社 パターン形成用組成物及びパターン形成方法
US9690192B2 (en) 2014-04-21 2017-06-27 Jsr Corporation Composition for base, and directed self-assembly lithography method
WO2015200003A1 (en) 2014-06-23 2015-12-30 3M Innovative Properties Company Silicon-containing polymer and method of making a silicon-containing polymer
JP2016033107A (ja) * 2014-07-29 2016-03-10 キヤノン株式会社 相分離ガラス膜の製造方法、多孔質ガラス膜の製造方法、ガラス部材、撮像装置
JP6413888B2 (ja) 2015-03-30 2018-10-31 Jsr株式会社 パターン形成用組成物、パターン形成方法及びブロック共重合体
TW201700595A (zh) 2015-04-01 2017-01-01 Jsr股份有限公司 圖案形成用組成物及圖案形成方法
US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
US20170082783A1 (en) * 2015-06-25 2017-03-23 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Processing of superhydrophobic, infrared transmissive, anti-reflective nanostructured surfaces
KR20180112778A (ko) 2016-02-08 2018-10-12 제이에스알 가부시끼가이샤 콘택트 홀 패턴의 형성 방법 및 조성물
US10778925B2 (en) 2016-04-06 2020-09-15 Kla-Tencor Corporation Multiple column per channel CCD sensor architecture for inspection and metrology
US10313622B2 (en) 2016-04-06 2019-06-04 Kla-Tencor Corporation Dual-column-parallel CCD sensor and inspection systems using a sensor
JP6955176B2 (ja) 2016-07-06 2021-10-27 Jsr株式会社 膜形成用組成物、膜形成方法及び自己組織化リソグラフィープロセス
WO2018008481A1 (ja) 2016-07-07 2018-01-11 Jsr株式会社 パターン形成用組成物及びパターン形成方法
US10691019B2 (en) 2016-10-07 2020-06-23 Jsr Corporation Pattern-forming method and composition
US10725209B2 (en) * 2017-01-17 2020-07-28 The Penn State Research Foundation Broadband and omnidirectional polymer antireflection coatings
US9847232B1 (en) 2017-03-24 2017-12-19 Jsr Corporation Pattern-forming method
JP7135554B2 (ja) 2018-08-03 2022-09-13 Jsr株式会社 下層膜形成用組成物、自己組織化膜の下層膜及びその形成方法並びに自己組織化リソグラフィープロセス
KR20200040668A (ko) 2018-10-10 2020-04-20 제이에스알 가부시끼가이샤 패턴 형성 방법 및 패턴화된 기판
US11462405B2 (en) 2018-10-10 2022-10-04 Jsr Corporation Pattern-forming method and patterned substrate
US11114491B2 (en) 2018-12-12 2021-09-07 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor

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US4830879A (en) * 1986-09-25 1989-05-16 Battelle Memorial Institute Broadband antireflective coating composition and method
US5254904A (en) * 1991-05-21 1993-10-19 U.S. Philips Corporation Antireflective coating layer in particular for a cathode ray tube
EP0597490A1 (en) * 1992-11-13 1994-05-18 Central Glass Company, Limited Reflectance reducing film and method of forming same on glass substrate
US5403368A (en) * 1991-11-29 1995-04-04 Central Glass Company, Limited Metal oxide film having minutely roughed surface and method of forming same on glass substrate

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US4830879A (en) * 1986-09-25 1989-05-16 Battelle Memorial Institute Broadband antireflective coating composition and method
US5254904A (en) * 1991-05-21 1993-10-19 U.S. Philips Corporation Antireflective coating layer in particular for a cathode ray tube
US5403368A (en) * 1991-11-29 1995-04-04 Central Glass Company, Limited Metal oxide film having minutely roughed surface and method of forming same on glass substrate
EP0597490A1 (en) * 1992-11-13 1994-05-18 Central Glass Company, Limited Reflectance reducing film and method of forming same on glass substrate

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1069088A1 (en) * 1999-07-16 2001-01-17 Asahi Glass Co., Ltd. Antiglare-antireflection film and process for producing it
EP1580816A2 (de) 2004-03-27 2005-09-28 Forschungszentrum Karlsruhe GmbH Element, umfassend ein reflektierendes Substrat und eine Antireflexschicht, Verfahren zu seiner Herstellung und seine Verwendung
DE102005005396B3 (de) * 2005-02-03 2006-06-14 Innovent E.V. Technologieentwicklung Beschichtetes AsSe-Chalkogenidglas und Verfahren zur Herstellung dieses beschichteten Glases
WO2007093339A1 (en) * 2006-02-14 2007-08-23 Dsm Ip Assets B.V. Anti-reflective coated glas plate
DE102008020324A1 (de) 2008-04-23 2009-10-29 Clariant International Limited Polysilazane enthaltende Beschichtungen zur Erhöhung der Lichtausbeute von verkapselten Solarzellen
DE102009050568A1 (de) * 2009-10-23 2011-04-28 Schott Ag Einrichtung mit verminderten Reibeigenschaften
WO2011047840A2 (de) 2009-10-23 2011-04-28 Schott Ag Einrichtung mit verminderten reibeigenschaften
WO2011137144A1 (en) * 2010-04-30 2011-11-03 Corning Incorporated Anti-glare surface and method of making
EP3178796A1 (en) * 2010-04-30 2017-06-14 Corning Incorporated Glass article comprising anti-glare surface

Also Published As

Publication number Publication date
DE59904643D1 (de) 2003-04-24
ATE235066T1 (de) 2003-04-15
JP2002519728A (ja) 2002-07-02
AU4902399A (en) 2000-01-17
ES2195588T3 (es) 2003-12-01
US20010024684A1 (en) 2001-09-27
EP1092164A1 (de) 2001-04-18
US6605229B2 (en) 2003-08-12
WO2000000854A1 (de) 2000-01-06
JP4389240B2 (ja) 2009-12-24
EP1092164B1 (de) 2003-03-19

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