DE1952878A1 - Fotopolymerisierbarer Lack mit erhoehter Lichtempfindlichkeit - Google Patents

Fotopolymerisierbarer Lack mit erhoehter Lichtempfindlichkeit

Info

Publication number
DE1952878A1
DE1952878A1 DE19691952878 DE1952878A DE1952878A1 DE 1952878 A1 DE1952878 A1 DE 1952878A1 DE 19691952878 DE19691952878 DE 19691952878 DE 1952878 A DE1952878 A DE 1952878A DE 1952878 A1 DE1952878 A1 DE 1952878A1
Authority
DE
Germany
Prior art keywords
aromatic
lacquer
anion
lacquer solution
light sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691952878
Other languages
German (de)
English (en)
Inventor
Rabe Dipl-Chem Dr Charlotte
Pietsch Dipl-Chem Dr Herward
Kuhnert Dipl-Chem Lothar
Baumbach Dipl-Chem Wolfgang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Filmfabrik Wolfen VEB
Original Assignee
Filmfabrik Wolfen VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Filmfabrik Wolfen VEB filed Critical Filmfabrik Wolfen VEB
Publication of DE1952878A1 publication Critical patent/DE1952878A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE19691952878 1969-04-10 1969-10-21 Fotopolymerisierbarer Lack mit erhoehter Lichtempfindlichkeit Pending DE1952878A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13913469 1969-04-10

Publications (1)

Publication Number Publication Date
DE1952878A1 true DE1952878A1 (de) 1970-10-22

Family

ID=5481102

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691952878 Pending DE1952878A1 (de) 1969-04-10 1969-10-21 Fotopolymerisierbarer Lack mit erhoehter Lichtempfindlichkeit

Country Status (6)

Country Link
AT (1) AT303514B (nl)
BE (1) BE745070R (nl)
BG (1) BG23010A3 (nl)
CH (1) CH521607A (nl)
DE (1) DE1952878A1 (nl)
FR (1) FR2038356A6 (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998009712A1 (en) * 1996-09-09 1998-03-12 Destiny Oil Anstalt Method of selective chemisorption of reactive-active gases

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998009712A1 (en) * 1996-09-09 1998-03-12 Destiny Oil Anstalt Method of selective chemisorption of reactive-active gases

Also Published As

Publication number Publication date
BG23010A3 (bg) 1977-05-20
CH521607A (de) 1972-04-15
FR2038356A6 (en) 1971-01-08
AT303514B (de) 1972-10-15
BE745070R (nl) 1970-07-01

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Legal Events

Date Code Title Description
OHB Non-payment of the publication fee (examined application)