DE1925938C3 - Vorsensibilisierte, negativ arbeitende lithographische Druckplatte - Google Patents
Vorsensibilisierte, negativ arbeitende lithographische DruckplatteInfo
- Publication number
- DE1925938C3 DE1925938C3 DE19691925938 DE1925938A DE1925938C3 DE 1925938 C3 DE1925938 C3 DE 1925938C3 DE 19691925938 DE19691925938 DE 19691925938 DE 1925938 A DE1925938 A DE 1925938A DE 1925938 C3 DE1925938 C3 DE 1925938C3
- Authority
- DE
- Germany
- Prior art keywords
- printing plate
- layer
- groups
- polymer
- polymeric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73118168A | 1968-05-22 | 1968-05-22 |
Publications (3)
Publication Number | Publication Date |
---|---|
DE1925938A1 DE1925938A1 (de) | 1970-01-15 |
DE1925938B2 DE1925938B2 (de) | 1975-09-18 |
DE1925938C3 true DE1925938C3 (de) | 1984-01-26 |
Family
ID=24938412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19691925938 Expired DE1925938C3 (de) | 1968-05-22 | 1969-05-21 | Vorsensibilisierte, negativ arbeitende lithographische Druckplatte |
Country Status (8)
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4104072A (en) * | 1977-05-19 | 1978-08-01 | Polychrome Corporation | Water developable lithographic printing plate having dual photosensitive layering |
FR2400221A1 (fr) * | 1977-08-09 | 1979-03-09 | Kodak Pathe | Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose |
JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS59208552A (ja) * | 1983-05-12 | 1984-11-26 | Fuji Yakuhin Kogyo Kk | 感光性平版印刷版 |
US4608331A (en) * | 1984-11-16 | 1986-08-26 | Witco Chemical Corporation | Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer |
US5275907A (en) * | 1992-07-23 | 1994-01-04 | Eastman Kodak Company | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding |
JP4152559B2 (ja) | 2000-03-06 | 2008-09-17 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
JP4119597B2 (ja) * | 2000-05-17 | 2008-07-16 | 富士フイルム株式会社 | 平版印刷版原版 |
US6596456B2 (en) | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
DE10233631B4 (de) * | 2002-07-24 | 2004-09-30 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten |
JP4291638B2 (ja) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
JP4429116B2 (ja) | 2004-08-27 | 2010-03-10 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の製版方法 |
EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4574506B2 (ja) | 2005-03-23 | 2010-11-04 | 富士フイルム株式会社 | 平版印刷版原版、及びその製版方法 |
JP4368323B2 (ja) | 2005-03-25 | 2009-11-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4457034B2 (ja) | 2005-03-28 | 2010-04-28 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4524235B2 (ja) | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | 平版印刷版原版 |
US7856985B2 (en) | 2005-04-22 | 2010-12-28 | Cynosure, Inc. | Method of treatment body tissue using a non-uniform laser beam |
JP4701042B2 (ja) | 2005-08-22 | 2011-06-15 | 富士フイルム株式会社 | 感光性平版印刷版 |
US7586957B2 (en) | 2006-08-02 | 2009-09-08 | Cynosure, Inc | Picosecond laser apparatus and methods for its operation and use |
JP4777226B2 (ja) | 2006-12-07 | 2011-09-21 | 富士フイルム株式会社 | 画像記録材料、及び新規化合物 |
JP4860525B2 (ja) | 2007-03-27 | 2012-01-25 | 富士フイルム株式会社 | 硬化性組成物及び平版印刷版原版 |
JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
JP2009086373A (ja) | 2007-09-28 | 2009-04-23 | Fujifilm Corp | ネガ型平版印刷版の現像方法 |
JP4890408B2 (ja) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法 |
JP4994175B2 (ja) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | 平版印刷版原版、及びそれに用いる共重合体の製造方法 |
EP2204698B1 (en) | 2009-01-06 | 2018-08-08 | FUJIFILM Corporation | Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate |
WO2013039235A1 (ja) | 2011-09-15 | 2013-03-21 | 富士フイルム株式会社 | 製版処理廃液のリサイクル方法 |
WO2013065853A1 (ja) | 2011-11-04 | 2013-05-10 | 富士フイルム株式会社 | 製版処理廃液のリサイクル方法 |
KR102183581B1 (ko) | 2012-04-18 | 2020-11-27 | 싸이노슈어, 엘엘씨 | 피코초 레이저 장치 및 그를 사용한 표적 조직의 치료 방법 |
US10285757B2 (en) | 2013-03-15 | 2019-05-14 | Cynosure, Llc | Picosecond optical radiation systems and methods of use |
CN106814540B (zh) * | 2015-11-30 | 2020-04-10 | 乐凯华光印刷科技有限公司 | 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法 |
CA3092248A1 (en) | 2018-02-26 | 2019-08-29 | Mirko Mirkov | Q-switched cavity dumped sub-nanosecond laser |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1205386B (de) * | 1955-10-03 | 1965-11-18 | Du Pont | Photopolymerisierbare Schicht zur Herstellung von Reliefbildern oder Druckformen |
BE563723A (US06262066-20010717-C00315.png) * | 1957-01-04 | |||
US3342601A (en) * | 1964-02-27 | 1967-09-19 | Eastman Kodak Co | Lithographic printing plate |
NL6610053A (US06262066-20010717-C00315.png) * | 1966-07-15 | 1968-01-16 |
-
0
- ZA ZA6903590D patent/ZA6903590B/xx unknown
-
1969
- 1969-05-16 JP JP3747169A patent/JPS507481B1/ja active Pending
- 1969-05-20 NL NL6907737A patent/NL6907737A/xx not_active Application Discontinuation
- 1969-05-21 FR FR6916526A patent/FR2009091B1/fr not_active Expired
- 1969-05-21 DE DE19691925938 patent/DE1925938C3/de not_active Expired
- 1969-05-22 CH CH781969A patent/CH501946A/fr not_active IP Right Cessation
- 1969-05-22 BE BE733491D patent/BE733491A/xx not_active IP Right Cessation
- 1969-05-22 GB GB2614869A patent/GB1274017A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1925938A1 (de) | 1970-01-15 |
JPS507481B1 (US06262066-20010717-C00315.png) | 1975-03-26 |
CH501946A (fr) | 1971-01-15 |
BE733491A (US06262066-20010717-C00315.png) | 1969-11-03 |
DE1925938B2 (de) | 1975-09-18 |
ZA6903590B (US06262066-20010717-C00315.png) | |
FR2009091A1 (US06262066-20010717-C00315.png) | 1970-01-30 |
FR2009091B1 (US06262066-20010717-C00315.png) | 1975-08-22 |
NL6907737A (US06262066-20010717-C00315.png) | 1969-11-25 |
GB1274017A (en) | 1972-05-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8228 | New agent |
Free format text: BRANDES, J., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN |
|
8281 | Inventor (new situation) |
Free format text: HOULE, JAMES FRANK VANNORMAN, GILDEN RAMON, ROCHESTER, N.Y., US |
|
C3 | Grant after two publication steps (3rd publication) |