DE1924790A1 - Ultrahochfrequenz-Plasmatron - Google Patents

Ultrahochfrequenz-Plasmatron

Info

Publication number
DE1924790A1
DE1924790A1 DE19691924790 DE1924790A DE1924790A1 DE 1924790 A1 DE1924790 A1 DE 1924790A1 DE 19691924790 DE19691924790 DE 19691924790 DE 1924790 A DE1924790 A DE 1924790A DE 1924790 A1 DE1924790 A1 DE 1924790A1
Authority
DE
Germany
Prior art keywords
waveguide
high frequency
ultra
gas discharge
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691924790
Other languages
German (de)
English (en)
Inventor
Kirjusin Vladimir P
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE1924790A1 publication Critical patent/DE1924790A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE19691924790 1969-05-07 1969-05-14 Ultrahochfrequenz-Plasmatron Pending DE1924790A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82245069A 1969-05-07 1969-05-07

Publications (1)

Publication Number Publication Date
DE1924790A1 true DE1924790A1 (de) 1970-11-19

Family

ID=25236065

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691924790 Pending DE1924790A1 (de) 1969-05-07 1969-05-14 Ultrahochfrequenz-Plasmatron

Country Status (4)

Country Link
US (1) US3577207A (enrdf_load_stackoverflow)
DE (1) DE1924790A1 (enrdf_load_stackoverflow)
FR (1) FR2050610A5 (enrdf_load_stackoverflow)
GB (1) GB1226278A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2632194A1 (de) * 1975-07-18 1977-01-20 Tokyo Shibaura Electric Co Aktivgas-reaktionsvorrichtung

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3757518A (en) * 1970-11-03 1973-09-11 Messerschmitt Boelkow Blohm Ion engine
US3911318A (en) * 1972-03-29 1975-10-07 Fusion Systems Corp Method and apparatus for generating electromagnetic radiation
CA1024246A (en) * 1973-08-22 1978-01-10 Donald M. Spero Apparatus and method for generating radiation
US4042850A (en) * 1976-03-17 1977-08-16 Fusion Systems Corporation Microwave generated radiation apparatus
JPS5939178B2 (ja) * 1977-04-25 1984-09-21 株式会社東芝 活性化ガス発生装置
FR2432820A2 (fr) * 1977-11-08 1980-02-29 Anvar Dispositif et procede de generation d'un gaz ionise ou plasma par ondes hyperfrequences
US4292344A (en) * 1979-02-23 1981-09-29 Union Carbide Corporation Fluidized bed heating process and apparatus
FR2473833A1 (fr) * 1980-01-11 1981-07-17 Petrov Evgeny Plasmatron a ultra-haute frequence
AT388814B (de) * 1985-11-15 1989-09-11 Paar Anton Kg Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas
DE3712971A1 (de) * 1987-04-16 1988-11-03 Plasonic Oberflaechentechnik G Verfahren und vorrichtung zum erzeugen eines plasmas
US4883570A (en) * 1987-06-08 1989-11-28 Research-Cottrell, Inc. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves
DE4235914A1 (de) * 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
US5470541A (en) * 1993-12-28 1995-11-28 E. I. Du Pont De Nemours And Company Apparatus and process for the preparation of hydrogen cyanide
GB9414561D0 (en) * 1994-07-19 1994-09-07 Ea Tech Ltd Method of and apparatus for microwave-plasma production
EP0702393A3 (en) * 1994-09-16 1997-03-26 Daihen Corp Plasma processing apparatus for introducing a micrometric wave from a rectangular waveguide, through an elongated sheet into the plasma chamber
US6193878B1 (en) * 1995-01-25 2001-02-27 Zpm, Inc. Multi-modal method and apparatus for treating a solution
US5798137A (en) * 1995-06-07 1998-08-25 Advanced Silicon Materials, Inc. Method for silicon deposition
DE19600223A1 (de) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen
DE19608949A1 (de) * 1996-03-08 1997-09-11 Ralf Dr Spitzl Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen
TW359847B (en) * 1996-11-01 1999-06-01 Matsushita Electric Ind Co Ltd High frequency discharge energy supply means and high frequency electrodeless discharge lamp device
TW385623B (en) * 1997-10-20 2000-03-21 Sumitomo Metal Ind Apparatus and method for microwave plasma process
US6057645A (en) * 1997-12-31 2000-05-02 Eaton Corporation Plasma discharge device with dynamic tuning by a movable microwave trap
US6362449B1 (en) 1998-08-12 2002-03-26 Massachusetts Institute Of Technology Very high power microwave-induced plasma
US6870123B2 (en) 1998-10-29 2005-03-22 Canon Kabushiki Kaisha Microwave applicator, plasma processing apparatus having same, and plasma processing method
EP0997927A3 (en) * 1998-10-29 2003-06-25 Canon Kabushiki Kaisha Microwave applicator with annular waveguide, plasma processing apparatus having the same, and plasma processing method
US6537493B1 (en) * 2000-09-06 2003-03-25 Microlizer Ltd. Sterilization apparatus
CN1516994A (zh) * 2001-04-27 2004-07-28 戴维系统技术公司 用来把在内燃机或燃气轮机中可用的燃料等离子体催化转换成一种合成气体的方法和等离子体催化转换器
US20030104139A1 (en) * 2001-11-30 2003-06-05 House Keith L. Apparatus for depositing a plasma chemical vapor deposition coating on the inside of an optical fiber preform
US6657171B1 (en) * 2002-11-20 2003-12-02 Maytag Corporation Toroidal waveguide for a microwave cooking appliance
EP2086285A1 (en) * 2008-02-01 2009-08-05 Anton Paar GmbH Applicator and Apparatus for heating samples by microwave radiation
JP5349923B2 (ja) * 2008-11-27 2013-11-20 東海ゴム工業株式会社 マイクロ波プラズマ処理装置
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
US20230080243A1 (en) 2020-06-02 2023-03-16 Tamara Renee WEBB Method for processing waste using low-temperature plasma and device therefor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1150717B (de) * 1961-06-29 1963-06-27 Max Planck Gesellschaft Anordnung zur Erzeugung hoechstfrequenter elektromagnetischer Schwingungen, vorzugsweise im Millimeter- und Submillimeterwellengebiet, mittels einer Gasentladung vom Penning-Typ
GB1020224A (en) * 1962-01-22 1966-02-16 Hitachi Ltd Improvements relating to an electron cyclotron resonance ultra-violet lamp
US3378723A (en) * 1964-01-02 1968-04-16 Rca Corp Fast wave transmission line coupled to a plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2632194A1 (de) * 1975-07-18 1977-01-20 Tokyo Shibaura Electric Co Aktivgas-reaktionsvorrichtung

Also Published As

Publication number Publication date
FR2050610A5 (enrdf_load_stackoverflow) 1971-04-02
US3577207A (en) 1971-05-04
GB1226278A (enrdf_load_stackoverflow) 1971-03-24

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