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Publication of DE165706CpublicationCriticalpatent/DE165706C/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Verfahren zur Zerlegung von Halbtoenen in Druckelemente verschiedener Groesse unter Abtastung der Vorlage durch ein durchgehendes oder auffallendes Lichtbuendel von bestimmtem Querschnitt
Verfahren zur Herstellung aus Metall bestehender Kontraste in photographischem Material durch physikalische Entwicklung latenter Bilder in lichtempfindlich gemachten, fluessigkeitsabsorbierenden Traegern