DE1622763B1 - Lichtempfindliche Schichten fuer den Siebdruck - Google Patents

Lichtempfindliche Schichten fuer den Siebdruck

Info

Publication number
DE1622763B1
DE1622763B1 DE19591622763D DE1622763DA DE1622763B1 DE 1622763 B1 DE1622763 B1 DE 1622763B1 DE 19591622763 D DE19591622763 D DE 19591622763D DE 1622763D A DE1622763D A DE 1622763DA DE 1622763 B1 DE1622763 B1 DE 1622763B1
Authority
DE
Germany
Prior art keywords
caprolactam
poly
formula
parts
photosensitive layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19591622763D
Other languages
German (de)
English (en)
Inventor
Reichel Dr M K
Neugebauer Dr Wilhelm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of DE1622763B1 publication Critical patent/DE1622763B1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D177/00Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D177/02Polyamides derived from omega-amino carboxylic acids or from lactams thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
DE19591622763D 1959-10-02 1959-10-02 Lichtempfindliche Schichten fuer den Siebdruck Pending DE1622763B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0038814 1959-10-02

Publications (1)

Publication Number Publication Date
DE1622763B1 true DE1622763B1 (de) 1970-05-21

Family

ID=7221512

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19591622763D Pending DE1622763B1 (de) 1959-10-02 1959-10-02 Lichtempfindliche Schichten fuer den Siebdruck

Country Status (6)

Country Link
US (1) US3143417A (US07321065-20080122-C00020.png)
BE (1) BE595628A (US07321065-20080122-C00020.png)
CH (1) CH390685A (US07321065-20080122-C00020.png)
DE (1) DE1622763B1 (US07321065-20080122-C00020.png)
GB (1) GB942147A (US07321065-20080122-C00020.png)
NL (2) NL256406A (US07321065-20080122-C00020.png)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL256473A (US07321065-20080122-C00020.png) * 1959-10-03
GB1230772A (US07321065-20080122-C00020.png) * 1967-03-31 1971-05-05
US4199359A (en) * 1968-05-16 1980-04-22 Xerox Corporation Photographic screen stencil printing process
US3658528A (en) * 1969-09-22 1972-04-25 Itek Corp Photochemical figuring of optical elements
US3853561A (en) * 1970-11-26 1974-12-10 Hoechst Ag Process for the preparation of screen printing stencils using intermediate support for light sensitive layer
JPS515935B2 (US07321065-20080122-C00020.png) * 1972-04-17 1976-02-24
JPS566530B2 (US07321065-20080122-C00020.png) * 1974-01-09 1981-02-12
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
US4254194A (en) * 1979-12-03 1981-03-03 Arthur D. Little, Inc. Screen printing stencils using novel compounds and compositions
NL8105657A (nl) * 1981-12-15 1983-07-01 Daan Van Roekel Zeefdrukprocede alsmede zeefdrukvorm die geschikt is om daarbij te worden gebruikt.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2299839A (en) * 1939-09-25 1942-10-27 Du Pont Polymeric materials
DE943928C (de) * 1954-04-05 1956-06-01 Time Inc Entwickler fuer das Entwickeln belichteter Flaechen lichtempfindlicher, synthetischer, linearer Polyamidmischungen mit durch Lichteinwirkung unloeslich gemachten Stellen und gegenueber der Entwicklerfluessigkeit Loeslichen Stellen
DE954308C (de) * 1954-06-19 1956-12-13 Kalle & Co Ag Lichtempfindliche Schicht fuer die Herstellung von Gerbbildern

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443450A (en) * 1943-07-01 1948-06-15 Du Pont Article coated with nu-alkoxymethyl polyamide and process of making same
US2412993A (en) * 1943-07-19 1946-12-24 Du Pont Polymeric materials
BE468087A (US07321065-20080122-C00020.png) * 1944-02-09
US2972540A (en) * 1958-08-05 1961-02-21 Du Pont Photopolymerizable compositions and elements

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2299839A (en) * 1939-09-25 1942-10-27 Du Pont Polymeric materials
DE943928C (de) * 1954-04-05 1956-06-01 Time Inc Entwickler fuer das Entwickeln belichteter Flaechen lichtempfindlicher, synthetischer, linearer Polyamidmischungen mit durch Lichteinwirkung unloeslich gemachten Stellen und gegenueber der Entwicklerfluessigkeit Loeslichen Stellen
DE954308C (de) * 1954-06-19 1956-12-13 Kalle & Co Ag Lichtempfindliche Schicht fuer die Herstellung von Gerbbildern

Also Published As

Publication number Publication date
US3143417A (en) 1964-08-04
BE595628A (US07321065-20080122-C00020.png)
NL131669C (US07321065-20080122-C00020.png)
NL256406A (US07321065-20080122-C00020.png)
GB942147A (en) 1963-11-20
CH390685A (de) 1965-04-15

Similar Documents

Publication Publication Date Title
DE3636697C2 (US07321065-20080122-C00020.png)
DE2508618C2 (de) Lichtempfindliches Gemisch
DE1289741B (de) Verwendung von Kondensationsprodukten des Diazodiphenylamins zum Vorsensibilisieren von Siebdruckmaterial
EP0126875B1 (de) Lichtempfindliches, Diazoniumgruppen enthaltendes Polykondensationsprodukt, Verfahren zu seiner Herstellung und lichtempfindliches Aufzeichnungsmaterial, das dieses Polykondensationsprodukt enthält
DE1622763B1 (de) Lichtempfindliche Schichten fuer den Siebdruck
DE1214086B (de) Kopierschichten fuer den Flach- und Offsetdruck
DE1237899B (de) Verfahren zur Herstellung von vorsensibilisierten Flachdruckfolien
DE68917880T2 (de) Lichtempfindliches Polyvinylalkoholderivat.
DE2065733C2 (de) Lichtempfindliches Aufzeichnungsmaterial
DE1572068C3 (de) Lichtempfindliche Schicht zur Herstellung von Druckformen
DE1622764B1 (de) Lichtempfindliche Schichten fuer den Siebdruck
DE2057473C2 (de) Lichtempfindliches Gemisch
DE1622763C (de) Lichtempfindliche Schichten fur den Siebdruck
DE4023586A1 (de) Lichtempfindliche siebdruckmasse und deren verwendung
AT221119B (de) Lichtempfindliches Material für den Siebdruck
DE1622764C (de) Lichtempfindliche Schichten fur den Siebdruck
DE954308C (de) Lichtempfindliche Schicht fuer die Herstellung von Gerbbildern
DE69308403T2 (de) Hitzebeständige, negativ-arbeitende Photoresistzusammensetzung, lichtempfindliches Substrat und Verfahren zur Herstellung eines negativen Musters
AT221118B (de) Lichtempfindliches Material für den Siebdruck
DE2047250A1 (de) Lichtempfindliche Materialien
DE2639610A1 (de) Photolackueberzugszubereitungen
US4312934A (en) Photosensitive compositions
DE1572067C3 (de) Lichtempfindliches Kopiermaterial
DE901500C (de) Lichtempfindliche Schichten auf Material zur photomechanischen Reproduktion
DE960335C (de) Lichtempfindliches Material