DE1614644A1 - Vorrichtung zum Herstellen einer Photolackmaske - Google Patents
Vorrichtung zum Herstellen einer PhotolackmaskeInfo
- Publication number
- DE1614644A1 DE1614644A1 DE19671614644 DE1614644A DE1614644A1 DE 1614644 A1 DE1614644 A1 DE 1614644A1 DE 19671614644 DE19671614644 DE 19671614644 DE 1614644 A DE1614644 A DE 1614644A DE 1614644 A1 DE1614644 A1 DE 1614644A1
- Authority
- DE
- Germany
- Prior art keywords
- tables
- adjustment
- spring
- bad
- slide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims description 16
- 230000003287 optical effect Effects 0.000 claims description 9
- 230000008602 contraction Effects 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 230000009471 action Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 241000355945 Isolia Species 0.000 claims 1
- 150000003949 imides Chemical class 0.000 claims 1
- 239000011435 rock Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 235000010716 Vigna mungo Nutrition 0.000 description 1
- 244000042295 Vigna mungo Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000008710 crystal-8 Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000010181 polygamy Effects 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 101150096590 terB gene Proteins 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE14512/68D SE353186B (enrdf_load_stackoverflow) | 1967-10-27 | 1968-10-25 | |
| AT1044168A AT303870B (de) | 1967-10-27 | 1968-10-25 | Verfahren zum Erzeugen einer Photolackmaske an der Oberfläche eines scheibenförmigen Halbleiterkörpers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES0112621 | 1967-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1614644A1 true DE1614644A1 (de) | 1970-02-26 |
Family
ID=7531908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19671614644 Pending DE1614644A1 (de) | 1967-10-27 | 1967-10-27 | Vorrichtung zum Herstellen einer Photolackmaske |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH485328A (enrdf_load_stackoverflow) |
| DE (1) | DE1614644A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1587048A (enrdf_load_stackoverflow) |
| GB (1) | GB1250464A (enrdf_load_stackoverflow) |
| NL (1) | NL6811808A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4580892A (en) * | 1983-06-29 | 1986-04-08 | Dainippon Screen Mfg. Co., Ltd. | Contact printing apparatus |
| DE3374598D1 (en) * | 1983-08-09 | 1987-12-23 | Siemens Ag | Positioning and adjusting table and method of manufacture |
| US5459546A (en) * | 1992-08-28 | 1995-10-17 | Penn; Randy J. | Method and apparatus for accurate alignment of semiconductor wafers in photo printers |
| JP2002170765A (ja) * | 2000-12-04 | 2002-06-14 | Nikon Corp | ステージ装置及び露光装置 |
| CN113843636A (zh) * | 2021-10-22 | 2021-12-28 | 王德胜 | 工件加工精微快速调整角度装置及其调整方法 |
-
1967
- 1967-10-27 DE DE19671614644 patent/DE1614644A1/de active Pending
-
1968
- 1968-08-19 NL NL6811808A patent/NL6811808A/xx unknown
- 1968-10-24 FR FR1587048D patent/FR1587048A/fr not_active Expired
- 1968-10-25 CH CH1595468A patent/CH485328A/de not_active IP Right Cessation
- 1968-10-28 GB GB1250464D patent/GB1250464A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1587048A (enrdf_load_stackoverflow) | 1970-03-06 |
| GB1250464A (enrdf_load_stackoverflow) | 1971-10-20 |
| NL6811808A (enrdf_load_stackoverflow) | 1969-04-29 |
| CH485328A (de) | 1970-01-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |