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Priority claimed from DE19671614644external-prioritypatent/DE1614644A1/de
Application filed by Siemens AgfiledCriticalSiemens Ag
Publication of SE353186BpublicationCriticalpatent/SE353186B/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)