DE1522478B1 - Vorsensibilisierte, positiv arbeitende Flachdruckplatte - Google Patents

Vorsensibilisierte, positiv arbeitende Flachdruckplatte

Info

Publication number
DE1522478B1
DE1522478B1 DE1966F0050982 DEF0050982A DE1522478B1 DE 1522478 B1 DE1522478 B1 DE 1522478B1 DE 1966F0050982 DE1966F0050982 DE 1966F0050982 DE F0050982 A DEF0050982 A DE F0050982A DE 1522478 B1 DE1522478 B1 DE 1522478B1
Authority
DE
Germany
Prior art keywords
plate
acid
layer
solution
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE1966F0050982
Other languages
German (de)
English (en)
Inventor
Kesanao Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of DE1522478B1 publication Critical patent/DE1522478B1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyesters Or Polycarbonates (AREA)
DE1966F0050982 1965-12-17 1966-12-16 Vorsensibilisierte, positiv arbeitende Flachdruckplatte Withdrawn DE1522478B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7770365A JPS4328403B1 (enExample) 1965-12-17 1965-12-17

Publications (1)

Publication Number Publication Date
DE1522478B1 true DE1522478B1 (de) 1971-07-29

Family

ID=13641244

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1966F0050982 Withdrawn DE1522478B1 (de) 1965-12-17 1966-12-16 Vorsensibilisierte, positiv arbeitende Flachdruckplatte

Country Status (3)

Country Link
JP (1) JPS4328403B1 (enExample)
DE (1) DE1522478B1 (enExample)
GB (1) GB1113759A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2512933A1 (de) * 1974-03-25 1975-10-02 Fuji Photo Film Co Ltd Lichtempfindliche planographische druckplatte

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物
DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
US6436601B1 (en) * 2001-06-25 2002-08-20 Citiplate, Inc. Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements
US6936399B2 (en) 2001-10-22 2005-08-30 Fuji Photo Film Co., Ltd. Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
WO2025212234A1 (en) * 2024-04-03 2025-10-09 Swimc Llc Functionalized novolac resins, coating compositions formed therefrom, and articles and methods of coating

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865860C (de) * 1950-10-31 1953-02-05 Kalle & Co Ag Lichtempfindliche Schichten fuer die photomechanische Reproduktion
DE1120273B (de) * 1959-01-17 1961-12-21 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
DE1195166B (de) * 1959-09-04 1965-06-16 Kalle Ag Auf Metallunterlagen haftende, aetzfaehige Kopierschichten

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865860C (de) * 1950-10-31 1953-02-05 Kalle & Co Ag Lichtempfindliche Schichten fuer die photomechanische Reproduktion
US3046120A (en) * 1950-10-31 1962-07-24 Azoplate Corp Light-sensitive layers for photomechanical reproduction
DE1120273B (de) * 1959-01-17 1961-12-21 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
DE1195166B (de) * 1959-09-04 1965-06-16 Kalle Ag Auf Metallunterlagen haftende, aetzfaehige Kopierschichten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2512933A1 (de) * 1974-03-25 1975-10-02 Fuji Photo Film Co Ltd Lichtempfindliche planographische druckplatte

Also Published As

Publication number Publication date
JPS4328403B1 (enExample) 1968-12-06
GB1113759A (en) 1968-05-15

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Legal Events

Date Code Title Description
E77 Valid patent as to the heymanns-index 1977
8328 Change in the person/name/address of the agent

Free format text: KOHLER, M., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee