GB1113759A - Lithographic printing plates - Google Patents
Lithographic printing platesInfo
- Publication number
- GB1113759A GB1113759A GB56469/66A GB5646966A GB1113759A GB 1113759 A GB1113759 A GB 1113759A GB 56469/66 A GB56469/66 A GB 56469/66A GB 5646966 A GB5646966 A GB 5646966A GB 1113759 A GB1113759 A GB 1113759A
- Authority
- GB
- United Kingdom
- Prior art keywords
- lithographic printing
- printing plates
- diazo
- naphthol
- reacted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyesters Or Polycarbonates (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7770365A JPS4328403B1 (enExample) | 1965-12-17 | 1965-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1113759A true GB1113759A (en) | 1968-05-15 |
Family
ID=13641244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB56469/66A Expired GB1113759A (en) | 1965-12-17 | 1966-12-16 | Lithographic printing plates |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS4328403B1 (enExample) |
| DE (1) | DE1522478B1 (enExample) |
| GB (1) | GB1113759A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0021716A1 (en) * | 1979-06-16 | 1981-01-07 | Konica Corporation | Condensation product and lithographic printing plates containing said product |
| US4424270A (en) | 1981-01-03 | 1984-01-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester |
| EP0110214A1 (en) * | 1982-11-12 | 1984-06-13 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| US4873169A (en) * | 1986-08-27 | 1989-10-10 | Hoechst Aktiengesellschaft | Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same |
| EP1405141A4 (en) * | 2001-06-25 | 2006-09-20 | Citiplate Inc | THERMALLY SENSITIVE COATING COMPOSITIONS WITH MIXED DIAZO NOVOLAKS SUITABLE FOR LITHOGRAPHIC ELEMENTS |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5723253B2 (enExample) * | 1974-03-25 | 1982-05-18 | ||
| JPS561044A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| JP3503839B2 (ja) | 1994-05-25 | 2004-03-08 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| EP1304229A3 (en) | 2001-10-22 | 2004-12-08 | Fuji Photo Film Co., Ltd. | Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate |
| US20040067435A1 (en) | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
| JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4404734B2 (ja) | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4404792B2 (ja) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP2009085984A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版原版 |
| JP4890403B2 (ja) | 2007-09-27 | 2012-03-07 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4790682B2 (ja) | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4994175B2 (ja) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | 平版印刷版原版、及びそれに用いる共重合体の製造方法 |
| JP2010237435A (ja) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 平版印刷版原版 |
| WO2025212234A1 (en) * | 2024-04-03 | 2025-10-09 | Swimc Llc | Functionalized novolac resins, coating compositions formed therefrom, and articles and methods of coating |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE506677A (enExample) * | 1950-10-31 | |||
| NL129162C (enExample) * | 1959-01-17 | |||
| NL255517A (enExample) * | 1959-09-04 |
-
1965
- 1965-12-17 JP JP7770365A patent/JPS4328403B1/ja active Pending
-
1966
- 1966-12-16 GB GB56469/66A patent/GB1113759A/en not_active Expired
- 1966-12-16 DE DE1966F0050982 patent/DE1522478B1/de not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0021716A1 (en) * | 1979-06-16 | 1981-01-07 | Konica Corporation | Condensation product and lithographic printing plates containing said product |
| US4424270A (en) | 1981-01-03 | 1984-01-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester |
| US4555469A (en) * | 1981-01-03 | 1985-11-26 | Hoechst Aktiengesellschaft | Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester |
| EP0110214A1 (en) * | 1982-11-12 | 1984-06-13 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| US4873169A (en) * | 1986-08-27 | 1989-10-10 | Hoechst Aktiengesellschaft | Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same |
| EP1405141A4 (en) * | 2001-06-25 | 2006-09-20 | Citiplate Inc | THERMALLY SENSITIVE COATING COMPOSITIONS WITH MIXED DIAZO NOVOLAKS SUITABLE FOR LITHOGRAPHIC ELEMENTS |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1522478B1 (de) | 1971-07-29 |
| JPS4328403B1 (enExample) | 1968-12-06 |
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