DE112022006865T5 - Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip - Google Patents
Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip Download PDFInfo
- Publication number
- DE112022006865T5 DE112022006865T5 DE112022006865.5T DE112022006865T DE112022006865T5 DE 112022006865 T5 DE112022006865 T5 DE 112022006865T5 DE 112022006865 T DE112022006865 T DE 112022006865T DE 112022006865 T5 DE112022006865 T5 DE 112022006865T5
- Authority
- DE
- Germany
- Prior art keywords
- processing
- irradiation position
- laser irradiation
- line
- machining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
- H10P72/53—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/018062 WO2023203612A1 (ja) | 2022-04-18 | 2022-04-18 | レーザ加工装置、レーザ加工方法、レーザ加工プログラム、記録媒体、半導体チップ製造方法および半導体チップ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE112022006865T5 true DE112022006865T5 (de) | 2025-02-20 |
Family
ID=88419414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112022006865.5T Pending DE112022006865T5 (de) | 2022-04-18 | 2022-04-18 | Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250256352A1 (https=) |
| JP (1) | JP7571344B2 (https=) |
| KR (1) | KR102948780B1 (https=) |
| CN (1) | CN118973755A (https=) |
| DE (1) | DE112022006865T5 (https=) |
| TW (1) | TWI856333B (https=) |
| WO (1) | WO2023203612A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5037082B1 (https=) | 1970-12-31 | 1975-11-29 | ||
| JPS5554593U (https=) | 1978-10-06 | 1980-04-12 | ||
| JPS584716U (ja) | 1981-07-02 | 1983-01-12 | 本田技研工業株式会社 | 内燃機関用消音器 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL135139A0 (en) | 1997-09-19 | 2001-05-20 | Nikon Corp | Stage apparatus, scanning type exposure apparatus, and device produced with the same |
| JP2000106340A (ja) | 1997-09-26 | 2000-04-11 | Nikon Corp | 露光装置及び走査露光方法、並びにステージ装置 |
| JP2008042032A (ja) * | 2006-08-08 | 2008-02-21 | Sumitomo Heavy Ind Ltd | ステージ駆動方法及び該方法を用いたレーザ加工装置 |
| JP5777415B2 (ja) | 2011-06-10 | 2015-09-09 | 株式会社ディスコ | 分割予定ライン検出方法 |
| JP6430836B2 (ja) * | 2015-01-16 | 2018-11-28 | 株式会社ディスコ | ウエーハの加工方法 |
| TW201636233A (zh) * | 2015-04-14 | 2016-10-16 | 鴻海精密工業股份有限公司 | 車輛控制系統及其操作方法 |
| JP2017056489A (ja) * | 2015-08-31 | 2017-03-23 | 株式会社リコー | 光加工装置及び光加工物の生産方法 |
| JP7032050B2 (ja) * | 2017-03-14 | 2022-03-08 | 株式会社ディスコ | レーザー加工装置 |
| JP2021163914A (ja) * | 2020-04-02 | 2021-10-11 | 浜松ホトニクス株式会社 | レーザ加工装置、レーザ加工方法及びウェハ |
| JP7599777B2 (ja) * | 2020-10-02 | 2024-12-16 | 株式会社ディスコ | 加工装置及び加工装置の使用方法 |
-
2022
- 2022-04-18 JP JP2024515754A patent/JP7571344B2/ja active Active
- 2022-04-18 US US18/856,365 patent/US20250256352A1/en active Pending
- 2022-04-18 CN CN202280094487.7A patent/CN118973755A/zh active Pending
- 2022-04-18 DE DE112022006865.5T patent/DE112022006865T5/de active Pending
- 2022-04-18 KR KR1020247030034A patent/KR102948780B1/ko active Active
- 2022-04-18 WO PCT/JP2022/018062 patent/WO2023203612A1/ja not_active Ceased
- 2022-06-20 TW TW111122834A patent/TWI856333B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5037082B1 (https=) | 1970-12-31 | 1975-11-29 | ||
| JPS5554593U (https=) | 1978-10-06 | 1980-04-12 | ||
| JPS584716U (ja) | 1981-07-02 | 1983-01-12 | 本田技研工業株式会社 | 内燃機関用消音器 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102948780B1 (ko) | 2026-04-06 |
| WO2023203612A1 (ja) | 2023-10-26 |
| TW202342219A (zh) | 2023-11-01 |
| TWI856333B (zh) | 2024-09-21 |
| KR20240148878A (ko) | 2024-10-11 |
| JP7571344B2 (ja) | 2024-10-22 |
| US20250256352A1 (en) | 2025-08-14 |
| CN118973755A (zh) | 2024-11-15 |
| JPWO2023203612A1 (https=) | 2023-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed |