DE112016006486B4 - Elektronenmikroskop - Google Patents

Elektronenmikroskop Download PDF

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Publication number
DE112016006486B4
DE112016006486B4 DE112016006486.1T DE112016006486T DE112016006486B4 DE 112016006486 B4 DE112016006486 B4 DE 112016006486B4 DE 112016006486 T DE112016006486 T DE 112016006486T DE 112016006486 B4 DE112016006486 B4 DE 112016006486B4
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DE
Germany
Prior art keywords
electron
excitation light
photocathode
optical system
excitation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE112016006486.1T
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German (de)
English (en)
Other versions
DE112016006486T5 (de
Inventor
Takashi Ohshima
Hiroyuki Minemura
Yumiko Anzai
Momoyo Enyama
Yoichi Ose
Toshihide Agemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
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Publication date
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Publication of DE112016006486T5 publication Critical patent/DE112016006486T5/de
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/065—Source emittance characteristics
    • H01J2237/0656—Density
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
DE112016006486.1T 2016-03-29 2016-03-29 Elektronenmikroskop Active DE112016006486B4 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2016/060089 WO2017168554A1 (fr) 2016-03-29 2016-03-29 Microscope électronique

Publications (2)

Publication Number Publication Date
DE112016006486T5 DE112016006486T5 (de) 2018-11-08
DE112016006486B4 true DE112016006486B4 (de) 2022-03-31

Family

ID=59963639

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112016006486.1T Active DE112016006486B4 (de) 2016-03-29 2016-03-29 Elektronenmikroskop

Country Status (5)

Country Link
US (1) US11251011B2 (fr)
JP (1) JP6568646B2 (fr)
CN (1) CN108885961B (fr)
DE (1) DE112016006486B4 (fr)
WO (1) WO2017168554A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10748737B2 (en) * 2017-10-10 2020-08-18 Kla-Tencor Corporation Electron beam generation and measurement
IL270143B2 (en) 2017-12-27 2023-11-01 Photo Electron Soul Inc Device and method for examining samples
US11232927B2 (en) 2018-02-01 2022-01-25 Hitachi High-Tech Corporation Spatially phase-modulated electron wave generation device
CN112106166B (zh) * 2018-05-21 2024-02-20 株式会社日立高新技术 电子射线应用装置
JP7193694B2 (ja) * 2018-07-26 2022-12-21 国立研究開発法人理化学研究所 電子顕微鏡およびそれを用いた試料観察方法
JP7106685B2 (ja) * 2019-01-28 2022-07-26 株式会社日立ハイテク 電子線応用装置
JP7155425B2 (ja) * 2019-06-06 2022-10-18 株式会社日立ハイテク 走査電子顕微鏡
JP6578529B1 (ja) * 2019-06-10 2019-09-25 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子銃、電子線適用装置、および、電子銃の制御方法
JP6679014B1 (ja) * 2019-08-20 2020-04-15 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ フォトカソードキット、電子銃および電子線適用装置
JP6722958B1 (ja) * 2019-11-20 2020-07-15 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子線適用装置および電子線適用装置における電子ビームの射出方法
US20230395349A1 (en) * 2022-06-01 2023-12-07 Kla Corporation Creating Multiple Electron Beams with a Photocathode Film

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001526446A (ja) 1997-12-09 2001-12-18 インテバック・インコーポレイテッド パターン化した負電子親和力フォトカソードを利用した電子ソース
JP2002124205A (ja) 2000-10-12 2002-04-26 Hitachi Ltd 走査荷電粒子顕微鏡
US20200108882A1 (en) 2018-09-25 2020-04-09 Brose Antriebstechnik GmbH & Co. Kommanditgesellschaft, Berlin Driving device for an electric bicycle with electronic anti-theft device and method of control

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2530591B2 (ja) 1984-10-12 1996-09-04 慶治 矢田 大電流密度の電子放出に適するパルス状レ−ザ−光励起による電子源装置
JPS6343251A (ja) * 1986-08-07 1988-02-24 Hamamatsu Photonics Kk 透過形電子顕微鏡の収差観測装置
US5684360A (en) 1995-07-10 1997-11-04 Intevac, Inc. Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
US6005247A (en) 1997-10-01 1999-12-21 Intevac, Inc. Electron beam microscope using electron beam patterns
JP3400334B2 (ja) * 1998-02-09 2003-04-28 住友重機械工業株式会社 光電子発生方法及び装置
JP2001143648A (ja) 1999-11-17 2001-05-25 Hitachi Ltd 光励起電子線源および電子線応用装置
JP2001176120A (ja) 1999-12-17 2001-06-29 Olympus Optical Co Ltd 光ピックアップ装置
US6828574B1 (en) 2000-08-08 2004-12-07 Applied Materials, Inc. Modulator driven photocathode electron beam generator
CN101446773A (zh) * 2001-11-07 2009-06-03 应用材料有限公司 无掩膜光子电子点格栅阵列光刻机
US7250618B2 (en) * 2005-02-02 2007-07-31 Nikon Corporation Radiantly heated cathode for an electron gun and heating assembly
US7573053B2 (en) * 2006-03-30 2009-08-11 Uchicago Argonne, Llc Polarized pulsed front-end beam source for electron microscope
JP2008294124A (ja) * 2007-05-23 2008-12-04 Fujitsu Ltd 光半導体素子
WO2009119074A1 (fr) 2008-03-25 2009-10-01 国立大学法人名古屋大学 Source d'électrons à spin polarisé
DE112009002439A5 (de) 2008-10-09 2012-05-10 California Institute Of Technology 4D-Bildgebung in einem ultraschnellen Elektronenmikroskop
JP5354657B2 (ja) * 2009-03-17 2013-11-27 独立行政法人理化学研究所 偏極電子銃、偏極電子線の発生方法、電子銃の評価方法、及び逆光電子分光方法
JP5626694B2 (ja) * 2010-03-29 2014-11-19 国立大学法人名古屋大学 電子顕微鏡
CN103261879B (zh) * 2010-10-01 2015-04-22 安托莱特公司 时间选通阴极发光图像的去卷积
JP6434878B2 (ja) 2015-09-10 2018-12-05 株式会社東芝 発光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001526446A (ja) 1997-12-09 2001-12-18 インテバック・インコーポレイテッド パターン化した負電子親和力フォトカソードを利用した電子ソース
JP2002124205A (ja) 2000-10-12 2002-04-26 Hitachi Ltd 走査荷電粒子顕微鏡
US20200108882A1 (en) 2018-09-25 2020-04-09 Brose Antriebstechnik GmbH & Co. Kommanditgesellschaft, Berlin Driving device for an electric bicycle with electronic anti-theft device and method of control

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
A. M. Weiner - Femtosecond pulse shaping using spatial light modulators, Review of scientific instruments 71 (2000), S. 1929 - 1960
H. S. Park et al., 4D ultrafast electron microscopy: Imaging of atomic motions, acoustic resonances, and moiré fringe dynamics, Ultramicroscopy 110 (2009), S. 7 - 19

Also Published As

Publication number Publication date
US11251011B2 (en) 2022-02-15
JPWO2017168554A1 (ja) 2019-01-17
CN108885961B (zh) 2020-05-01
JP6568646B2 (ja) 2019-08-28
DE112016006486T5 (de) 2018-11-08
CN108885961A (zh) 2018-11-23
US20200303152A1 (en) 2020-09-24
WO2017168554A1 (fr) 2017-10-05

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Owner name: HITACHI HIGH-TECH CORPORATION, JP

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Representative=s name: STREHL SCHUEBEL-HOPF & PARTNER MBB PATENTANWAE, DE

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