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Individual
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Individual
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Priority to BE569366DpriorityCriticalpatent/BE569366A/xx
Application filed by IndividualfiledCriticalIndividual
Priority to DEG22522Aprioritypatent/DE1051641B/de
Publication of DE1051641BpublicationCriticalpatent/DE1051641B/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/04—Chromates
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Paper
(AREA)
DEG22522A1957-07-121957-07-12Verfahren zur Herstellung von AEtzungen fuer den Kupfertiefdruck
PendingDE1051641B
(de)
Verfahren zur Herstellung einer fuer Lichtdruck oder Lichtleimdruck verwendbaren kornlosen Druckflaeche aus einem in einer Silberkolloidschicht enthaltenen unsicht-barenBilde
Verfahren zum Herstellen von positiven bzw. negativen Kopiervorlagen von Raster- oder Strichpositiven bzw. -negativen unter Verwendung eines Auswaschreliefs