DE10341569A1 - Verfahren zur Herstellung von Extrem-Ultraviolett-Elementen aus Siliziumdioxid-Titandioxid - Google Patents

Verfahren zur Herstellung von Extrem-Ultraviolett-Elementen aus Siliziumdioxid-Titandioxid Download PDF

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Publication number
DE10341569A1
DE10341569A1 DE10341569A DE10341569A DE10341569A1 DE 10341569 A1 DE10341569 A1 DE 10341569A1 DE 10341569 A DE10341569 A DE 10341569A DE 10341569 A DE10341569 A DE 10341569A DE 10341569 A1 DE10341569 A1 DE 10341569A1
Authority
DE
Germany
Prior art keywords
titanium dioxide
titanium
silicon
gel
dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10341569A
Other languages
German (de)
English (en)
Inventor
Kenneth Edward Hrdina
Robert Sabia
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of DE10341569A1 publication Critical patent/DE10341569A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE10341569A 2002-09-09 2003-09-09 Verfahren zur Herstellung von Extrem-Ultraviolett-Elementen aus Siliziumdioxid-Titandioxid Withdrawn DE10341569A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40940402P 2002-09-09 2002-09-09
US60/409404 2002-09-09

Publications (1)

Publication Number Publication Date
DE10341569A1 true DE10341569A1 (de) 2004-03-18

Family

ID=31888404

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10341569A Withdrawn DE10341569A1 (de) 2002-09-09 2003-09-09 Verfahren zur Herstellung von Extrem-Ultraviolett-Elementen aus Siliziumdioxid-Titandioxid

Country Status (4)

Country Link
US (1) US20040045318A1 (ja)
JP (1) JP2004131373A (ja)
DE (1) DE10341569A1 (ja)
TW (1) TWI246990B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011084316A1 (de) * 2011-10-12 2013-04-18 Osram Gmbh Verfahren zur Herstellung eines optischen Elements

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030226377A1 (en) * 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements
US7155936B2 (en) * 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
DE102004024808B4 (de) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung
EP2241538B1 (en) * 2004-07-01 2013-05-29 Asahi Glass Company, Limited Silica glass containing TiO2 and process for its production
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
JP5035516B2 (ja) * 2005-12-08 2012-09-26 信越化学工業株式会社 フォトマスク用チタニアドープ石英ガラスの製造方法
US20070137253A1 (en) * 2005-12-21 2007-06-21 Beall Lorrie F Reduced striae low expansion glass and elements, and a method for making same
US20070137252A1 (en) * 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
RU2009107892A (ru) * 2007-08-03 2013-03-20 Теосс Ко., Лтд. Опорное устройство для кремниевого материала и оборудование для нагрева и быстрого охлаждения кремниевого материала с использованием этого устройства
JP2011505318A (ja) * 2007-11-30 2011-02-24 コーニング インコーポレイテッド 低い膨張係数勾配を有する低膨張性ガラス材料
KR101606225B1 (ko) * 2008-07-23 2016-03-24 가부시키가이샤 니콘 포토마스크용 광학 부재 및 그 제조 방법
US20100107696A1 (en) * 2008-10-30 2010-05-06 John Edward Maxon Method for reducing inclusions in silica-titania glass
US9034450B2 (en) * 2011-08-31 2015-05-19 Corning Incorporated Binary silica-titania glass articles having a ternary doped silica-titania critical zone
US8987155B2 (en) * 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
JP2014220289A (ja) * 2013-05-02 2014-11-20 独立行政法人物質・材料研究機構 光波長変換ガラスの製造方法、光波長変換ガラス及び発光装置
EP3858795A1 (en) * 2014-11-26 2021-08-04 Corning Incorporated Method for making halogen doped optical element
US10017413B2 (en) 2014-11-26 2018-07-10 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same
JP2018513093A (ja) * 2015-03-26 2018-05-24 コーニング インコーポレイテッド 極紫外線リソグラフィーに使用するためのガラス複合体
EP3830044A1 (en) * 2018-08-02 2021-06-09 Corning Incorporated Methods of capturing soot
JPWO2023038036A1 (ja) 2021-09-08 2023-03-16

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE438752A (ja) * 1939-04-22
US3790654A (en) * 1971-11-09 1974-02-05 Corning Glass Works Extrusion method for forming thinwalled honeycomb structures
DE2647701A1 (de) * 1975-10-22 1977-04-28 Atomic Energy Authority Uk Sole und gele und verfahren zu ihrer herstellung
US4278632A (en) * 1980-02-08 1981-07-14 Westinghouse Electric Corp. Method of conforming clear vitreous gal of silica-titania material
DE3226451C2 (de) * 1982-07-15 1984-09-27 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
US4786618A (en) * 1987-05-29 1988-11-22 Corning Glass Works Sol-gel method for making ultra-low expansion glass
US4902216A (en) * 1987-09-08 1990-02-20 Corning Incorporated Extrusion die for protrusion and/or high cell density ceramic honeycomb structures
US4940675A (en) * 1988-06-17 1990-07-10 Corning Incorporated Method for making low-expansion glass article of complex shape
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
DE4204406C2 (de) * 1992-02-14 1995-04-06 Heraeus Quarzglas Verfahren zur Herstellung eines homogenen, schlierenfreien Körpers aus Quarzglas oder aus einem hochkieselsäurehaltigen Glas durch Umformen eines stabförmigen Ausgangskörpers
US5250096A (en) * 1992-04-07 1993-10-05 At&T Bell Laboratories Sol-gel method of making multicomponent glass
JP3702903B2 (ja) * 1994-04-04 2005-10-05 セイコーエプソン株式会社 紫外線レーザ用合成石英ガラス及びその製造方法
US5473826A (en) * 1994-08-19 1995-12-12 Yazaki Corporation Process for drying sol-gel derived porous bodies at elevated subcritical temperatures and pressures
WO1998051630A1 (de) * 1997-05-15 1998-11-19 Schott Ml Gmbh Verfahren und vorrichtung zur herstellung einer homogenen, schlierenfreien quarzglasplatte
US6209357B1 (en) * 1998-07-21 2001-04-03 Lucent Technologies Inc. Method for forming article using sol-gel processing
US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
WO2000024684A1 (de) * 1998-10-28 2000-05-04 Schott Glas Quarzglasplatten hoher brechzahlhomogenität
TW581747B (en) * 1999-02-16 2004-04-01 Nikon Corp Synthetic quartz glass optical member for ultraviolet light
EP1138387A1 (de) * 2000-03-29 2001-10-04 Degussa AG Verfahren zur Herstellung eines Titansilicalitformkörpers
EP1195360A1 (de) * 2000-09-01 2002-04-10 Degussa AG Verfahren zur Herstellung von SiO2-TiO2-Gläsern mit geringem thermischen Ausdehnungskoeffizient
US6776006B2 (en) * 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
US20030159466A1 (en) * 2002-02-27 2003-08-28 Bowden Bradley F. Dry pressing of spray dried soot to make EUV components
US6829908B2 (en) * 2002-02-27 2004-12-14 Corning Incorporated Fabrication of inclusion free homogeneous glasses
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
US20030226377A1 (en) * 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011084316A1 (de) * 2011-10-12 2013-04-18 Osram Gmbh Verfahren zur Herstellung eines optischen Elements

Also Published As

Publication number Publication date
JP2004131373A (ja) 2004-04-30
US20040045318A1 (en) 2004-03-11
TWI246990B (en) 2006-01-11
TW200416202A (en) 2004-09-01

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