DE102018220629A1 - Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel - Google Patents
Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel Download PDFInfo
- Publication number
- DE102018220629A1 DE102018220629A1 DE102018220629.5A DE102018220629A DE102018220629A1 DE 102018220629 A1 DE102018220629 A1 DE 102018220629A1 DE 102018220629 A DE102018220629 A DE 102018220629A DE 102018220629 A1 DE102018220629 A1 DE 102018220629A1
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- structuring
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- mirror
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Links
- 238000005286 illumination Methods 0.000 title claims abstract description 16
- 230000003595 spectral effect Effects 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000758 substrate Substances 0.000 claims description 77
- 239000010410 layer Substances 0.000 claims description 76
- 238000005530 etching Methods 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 60
- 239000011241 protective layer Substances 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 17
- 238000001312 dry etching Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 11
- 238000001459 lithography Methods 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 238000003631 wet chemical etching Methods 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims description 3
- 238000001393 microlithography Methods 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- GALOTNBSUVEISR-UHFFFAOYSA-N molybdenum;silicon Chemical compound [Mo]#[Si] GALOTNBSUVEISR-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000003973 paint Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018220629.5A DE102018220629A1 (de) | 2018-11-29 | 2018-11-29 | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
| EP19809068.0A EP3887878B1 (en) | 2018-11-29 | 2019-11-25 | Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror |
| JP2021530830A JP7510418B2 (ja) | 2018-11-29 | 2019-11-25 | 格子構造の形態の分光フィルタを備える投影露光装置の照射光学ユニット用のミラー、およびミラー上に格子構造の形態の分光フィルタを生成するための方法 |
| PCT/EP2019/082407 WO2020109225A2 (en) | 2018-11-29 | 2019-11-25 | Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror |
| TW108143436A TWI878252B (zh) | 2018-11-29 | 2019-11-28 | 用於投影曝光裝置中照明光學單元的反射鏡、照明光學單元、與微影投影曝光裝置，以及用於在反射鏡上製作光柵結構形式頻譜濾波器的方法與用於製作微結構化或奈米結構化構件的方法 |
| US17/317,417 US12111578B2 (en) | 2018-11-29 | 2021-05-11 | Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018220629.5A DE102018220629A1 (de) | 2018-11-29 | 2018-11-29 | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102018220629A1 true DE102018220629A1 (de) | 2020-06-04 |
Family
ID=68655553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102018220629.5A Pending DE102018220629A1 (de) | 2018-11-29 | 2018-11-29 | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12111578B2 (https=) |
| EP (1) | EP3887878B1 (https=) |
| JP (1) | JP7510418B2 (https=) |
| DE (1) | DE102018220629A1 (https=) |
| TW (1) | TWI878252B (https=) |
| WO (1) | WO2020109225A2 (https=) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021259634A1 (de) | 2020-06-24 | 2021-12-30 | Carl Zeiss Smt Gmbh | Optisches element für eine euv-projektionsbelichtungsanlage |
| WO2022037846A1 (de) | 2020-08-20 | 2022-02-24 | Carl Zeiss Smt Gmbh | Reflektierendes optisches element, beleuchtungsoptik, projektionsbelichtungsanlage und verfahren zum bilden einer schutzschicht |
| DE102022203644A1 (de) | 2022-04-12 | 2023-04-20 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Substrats und eines reflektiven optischen Elements für die EUV-Lithographie |
| WO2023165814A1 (de) | 2022-03-01 | 2023-09-07 | Carl Zeiss Smt Gmbh | Verfahren zum bearbeiten eines werkstücks |
| DE102022207052A1 (de) | 2022-07-11 | 2024-01-11 | Carl Zeiss Smt Gmbh | Spiegel für eine Projektionsbelichtungsanlage |
| DE102022208658A1 (de) | 2022-08-22 | 2024-02-22 | Carl Zeiss Smt Gmbh | Zwischenprodukt zur Herstellung eines optischen Elements für eine Projektionsbelichtungsanlage, optisches Element für eine Projektionsbelichtungsanlage, Verfahren zur Herstellung eines Zwischenprodukts und Verfahren zur Herstellung eines optischen Elements |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020213639A1 (de) | 2020-10-29 | 2022-05-05 | Carl Zeiss Smt Gmbh | Optisches Element, insbesondere zur Reflexion von EUV-Strahlung, optische Anordnung und Verfahren zum Herstellen eines optischen Elements |
| DE102022200526A1 (de) | 2022-01-18 | 2022-10-13 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung einer Struktur auf einem Substrat sowie Vorrichtung zur Strukturherstellung mit einem derartigen Verfahren |
Citations (6)
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| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| DE102012010093A1 (de) | 2012-05-23 | 2013-11-28 | Carl Zeiss Smt Gmbh | Facettenspiegel |
| US20140085619A1 (en) * | 2011-03-04 | 2014-03-27 | Asml Netherlands B.V. | Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method |
| US20150036978A1 (en) * | 2013-08-02 | 2015-02-05 | Globalfoundries Inc. | Blazed grating spectral purity filter and methods of making such a filter |
| DE102016213839A1 (de) * | 2016-07-27 | 2016-12-15 | Carl Zeiss Smt Gmbh | Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels |
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| US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
| US20020019305A1 (en) * | 1996-10-31 | 2002-02-14 | Che-Kuang Wu | Gray scale all-glass photomasks |
| JP2002196320A (ja) * | 2000-12-25 | 2002-07-12 | Victor Co Of Japan Ltd | 空間光変調素子 |
| US6522465B1 (en) * | 2001-09-27 | 2003-02-18 | Intel Corporation | Transmitting spectral filtering of high power extreme ultra-violet radiation |
| US6825988B2 (en) * | 2002-09-04 | 2004-11-30 | Intel Corporation | Etched silicon diffraction gratings for use as EUV spectral purity filters |
| US7875863B2 (en) | 2006-12-22 | 2011-01-25 | Asml Netherlands B.V. | Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method |
| FR2921498B1 (fr) * | 2007-09-25 | 2010-08-13 | Commissariat Energie Atomique | Dispositif optique dispersif a cristal photonique tridimensionnel. |
| US8227778B2 (en) * | 2008-05-20 | 2012-07-24 | Komatsu Ltd. | Semiconductor exposure device using extreme ultra violet radiation |
| CN102047151B (zh) | 2008-05-30 | 2014-07-16 | Asml荷兰有限公司 | 辐射系统、辐射收集器、辐射束调节系统、用于辐射系统的光谱纯度滤光片以及用于形成光谱纯度滤光片的方法 |
| TWI525353B (zh) * | 2009-07-07 | 2016-03-11 | 加州太平洋生物科學公司 | 超高多工分析系統及方法 |
| FR2954524B1 (fr) * | 2009-12-17 | 2012-09-28 | Ecole Polytech | Reseau de diffraction reflechissant dielectrique optimise |
| JP5953656B2 (ja) * | 2011-05-09 | 2016-07-20 | 株式会社ニコン | 照明光学装置、露光装置、及びデバイス製造方法 |
| FR2987139B1 (fr) * | 2012-02-21 | 2014-09-05 | Commissariat Energie Atomique | Dispositif optique de diffraction en reflexion a haute tenue au flux laser. |
| WO2015052748A1 (ja) * | 2013-10-07 | 2015-04-16 | 株式会社島津製作所 | ブレーズド回折格子およびブレーズド回折格子の製造方法 |
| EP3076208B1 (en) * | 2015-04-04 | 2019-06-12 | Fyzikální ústav AV CR, v.v.i. | Multi-layer reflective diffraction grating and use thereof |
| NL2017275A (en) * | 2015-09-03 | 2017-03-08 | Asml Netherlands Bv | Beam splitting apparatus |
| US10458912B2 (en) * | 2016-08-31 | 2019-10-29 | Kla-Tencor Corporation | Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity |
| CN112513688B (zh) * | 2018-07-19 | 2023-05-26 | 应用材料公司 | 可变高度的斜向光栅方法 |
| EP3719545A1 (en) * | 2019-04-03 | 2020-10-07 | ASML Netherlands B.V. | Manufacturing a reflective diffraction grating |
| DE102019215829A1 (de) * | 2019-10-15 | 2021-04-15 | Asml Netherlands B.V. | EUV-Kollektorspiegel |
-
2018
- 2018-11-29 DE DE102018220629.5A patent/DE102018220629A1/de active Pending
-
2019
- 2019-11-25 EP EP19809068.0A patent/EP3887878B1/en active Active
- 2019-11-25 WO PCT/EP2019/082407 patent/WO2020109225A2/en not_active Ceased
- 2019-11-25 JP JP2021530830A patent/JP7510418B2/ja active Active
- 2019-11-28 TW TW108143436A patent/TWI878252B/zh active
-
2021
- 2021-05-11 US US17/317,417 patent/US12111578B2/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US20140085619A1 (en) * | 2011-03-04 | 2014-03-27 | Asml Netherlands B.V. | Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method |
| DE102012010093A1 (de) | 2012-05-23 | 2013-11-28 | Carl Zeiss Smt Gmbh | Facettenspiegel |
| US20150036978A1 (en) * | 2013-08-02 | 2015-02-05 | Globalfoundries Inc. | Blazed grating spectral purity filter and methods of making such a filter |
| DE102016213839A1 (de) * | 2016-07-27 | 2016-12-15 | Carl Zeiss Smt Gmbh | Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021259634A1 (de) | 2020-06-24 | 2021-12-30 | Carl Zeiss Smt Gmbh | Optisches element für eine euv-projektionsbelichtungsanlage |
| DE102020207807A1 (de) | 2020-06-24 | 2021-12-30 | Carl Zeiss Smt Gmbh | Optisches Element für eine EUV-Projektionsbelichtungsanlage |
| US12406777B2 (en) | 2020-06-24 | 2025-09-02 | Carl Zeiss Smt Gmbh | Optical element for a EUV projection exposure system |
| WO2022037846A1 (de) | 2020-08-20 | 2022-02-24 | Carl Zeiss Smt Gmbh | Reflektierendes optisches element, beleuchtungsoptik, projektionsbelichtungsanlage und verfahren zum bilden einer schutzschicht |
| DE102020210553A1 (de) | 2020-08-20 | 2022-03-24 | Carl Zeiss Smt Gmbh | Reflektierendes optisches Element, Beleuchtungsoptik, Projektionsbelichtungsanlage und Verfahren zum Bilden einer Schutzschicht |
| US12386263B2 (en) | 2020-08-20 | 2025-08-12 | Carl Zeiss Smt Gmbh | Reflective optical element, illumination optical unit, projection exposure apparatus, and method for producing a protective layer |
| DE102022202059A1 (de) | 2022-03-01 | 2023-09-07 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks |
| WO2023165814A1 (de) | 2022-03-01 | 2023-09-07 | Carl Zeiss Smt Gmbh | Verfahren zum bearbeiten eines werkstücks |
| DE102022203644A1 (de) | 2022-04-12 | 2023-04-20 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Substrats und eines reflektiven optischen Elements für die EUV-Lithographie |
| DE102022207052A1 (de) | 2022-07-11 | 2024-01-11 | Carl Zeiss Smt Gmbh | Spiegel für eine Projektionsbelichtungsanlage |
| WO2024012978A1 (en) | 2022-07-11 | 2024-01-18 | Carl Zeiss Smt Gmbh | Mirror for a projection exposure apparatus |
| DE102022208658A1 (de) | 2022-08-22 | 2024-02-22 | Carl Zeiss Smt Gmbh | Zwischenprodukt zur Herstellung eines optischen Elements für eine Projektionsbelichtungsanlage, optisches Element für eine Projektionsbelichtungsanlage, Verfahren zur Herstellung eines Zwischenprodukts und Verfahren zur Herstellung eines optischen Elements |
| WO2024041875A1 (de) | 2022-08-22 | 2024-02-29 | Carl Zeiss Smt Gmbh | Zwischenprodukt zur herstellung eines optischen elements für eine projektionsbelichtungsanlage, optisches element für eine projektionsbelichtungsanlage, verfahren zur herstellung eines zwischenprodukts und verfahren zur herstellung eines optischen elements |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020109225A3 (en) | 2020-07-30 |
| TWI878252B (zh) | 2025-04-01 |
| JP7510418B2 (ja) | 2024-07-03 |
| US12111578B2 (en) | 2024-10-08 |
| TW202038016A (zh) | 2020-10-16 |
| EP3887878A2 (en) | 2021-10-06 |
| JP2022509663A (ja) | 2022-01-21 |
| EP3887878B1 (en) | 2026-05-06 |
| US20210263423A1 (en) | 2021-08-26 |
| WO2020109225A2 (en) | 2020-06-04 |
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