TWI878252B - 用於投影曝光裝置中照明光學單元的反射鏡、照明光學單元、與微影投影曝光裝置，以及用於在反射鏡上製作光柵結構形式頻譜濾波器的方法與用於製作微結構化或奈米結構化構件的方法 - Google Patents

用於投影曝光裝置中照明光學單元的反射鏡、照明光學單元、與微影投影曝光裝置，以及用於在反射鏡上製作光柵結構形式頻譜濾波器的方法與用於製作微結構化或奈米結構化構件的方法 Download PDF

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TWI878252B
TWI878252B TW108143436A TW108143436A TWI878252B TW I878252 B TWI878252 B TW I878252B TW 108143436 A TW108143436 A TW 108143436A TW 108143436 A TW108143436 A TW 108143436A TW I878252 B TWI878252 B TW I878252B
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Taiwan
Prior art keywords
projection exposure
substrate
optical unit
grating structure
grating
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TW108143436A
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English (en)
Chinese (zh)
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TW202038016A (zh
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克里斯多福 嘉立克斯
法比安 舒斯特
霍傑 肯利
安卓斯 山德納
托拜斯 麥許
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德商卡爾蔡司Ｓｍｔ有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW108143436A 2018-11-29 2019-11-28 用於投影曝光裝置中照明光學單元的反射鏡、照明光學單元、與微影投影曝光裝置，以及用於在反射鏡上製作光柵結構形式頻譜濾波器的方法與用於製作微結構化或奈米結構化構件的方法 TWI878252B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102018220629.5 2018-11-29
DE102018220629.5A DE102018220629A1 (de) 2018-11-29 2018-11-29 Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel

Publications (2)

Publication Number Publication Date
TW202038016A TW202038016A (zh) 2020-10-16
TWI878252B true TWI878252B (zh) 2025-04-01

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TW108143436A TWI878252B (zh) 2018-11-29 2019-11-28 用於投影曝光裝置中照明光學單元的反射鏡、照明光學單元、與微影投影曝光裝置，以及用於在反射鏡上製作光柵結構形式頻譜濾波器的方法與用於製作微結構化或奈米結構化構件的方法

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US (1) US12111578B2 (https=)
EP (1) EP3887878B1 (https=)
JP (1) JP7510418B2 (https=)
DE (1) DE102018220629A1 (https=)
TW (1) TWI878252B (https=)
WO (1) WO2020109225A2 (https=)

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DE102020207807A1 (de) 2020-06-24 2021-12-30 Carl Zeiss Smt Gmbh Optisches Element für eine EUV-Projektionsbelichtungsanlage
DE102020210553A1 (de) 2020-08-20 2022-03-24 Carl Zeiss Smt Gmbh Reflektierendes optisches Element, Beleuchtungsoptik, Projektionsbelichtungsanlage und Verfahren zum Bilden einer Schutzschicht
DE102020213639A1 (de) 2020-10-29 2022-05-05 Carl Zeiss Smt Gmbh Optisches Element, insbesondere zur Reflexion von EUV-Strahlung, optische Anordnung und Verfahren zum Herstellen eines optischen Elements
DE102022200526A1 (de) 2022-01-18 2022-10-13 Carl Zeiss Smt Gmbh Verfahren zur Herstellung einer Struktur auf einem Substrat sowie Vorrichtung zur Strukturherstellung mit einem derartigen Verfahren
DE102022202059A1 (de) 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
DE102022203644A1 (de) 2022-04-12 2023-04-20 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Substrats und eines reflektiven optischen Elements für die EUV-Lithographie
DE102022207052A1 (de) 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Spiegel für eine Projektionsbelichtungsanlage
DE102022208658A1 (de) 2022-08-22 2024-02-22 Carl Zeiss Smt Gmbh Zwischenprodukt zur Herstellung eines optischen Elements für eine Projektionsbelichtungsanlage, optisches Element für eine Projektionsbelichtungsanlage, Verfahren zur Herstellung eines Zwischenprodukts und Verfahren zur Herstellung eines optischen Elements

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WO2020109225A3 (en) 2020-07-30
JP7510418B2 (ja) 2024-07-03
US12111578B2 (en) 2024-10-08
TW202038016A (zh) 2020-10-16
EP3887878A2 (en) 2021-10-06
DE102018220629A1 (de) 2020-06-04
JP2022509663A (ja) 2022-01-21
EP3887878B1 (en) 2026-05-06
US20210263423A1 (en) 2021-08-26
WO2020109225A2 (en) 2020-06-04

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