JP7510418B2 - 格子構造の形態の分光フィルタを備える投影露光装置の照射光学ユニット用のミラー、およびミラー上に格子構造の形態の分光フィルタを生成するための方法 - Google Patents

格子構造の形態の分光フィルタを備える投影露光装置の照射光学ユニット用のミラー、およびミラー上に格子構造の形態の分光フィルタを生成するための方法 Download PDF

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JP7510418B2
JP7510418B2 JP2021530830A JP2021530830A JP7510418B2 JP 7510418 B2 JP7510418 B2 JP 7510418B2 JP 2021530830 A JP2021530830 A JP 2021530830A JP 2021530830 A JP2021530830 A JP 2021530830A JP 7510418 B2 JP7510418 B2 JP 7510418B2
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substrate
etching
mirror
structured layer
grating
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クリストフ ジャリックス
ファビアン シュスター
ホルガー キーリー
アンドレアス サンドナー
トビアス マイシュ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2021530830A 2018-11-29 2019-11-25 格子構造の形態の分光フィルタを備える投影露光装置の照射光学ユニット用のミラー、およびミラー上に格子構造の形態の分光フィルタを生成するための方法 Active JP7510418B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102018220629.5 2018-11-29
DE102018220629.5A DE102018220629A1 (de) 2018-11-29 2018-11-29 Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
PCT/EP2019/082407 WO2020109225A2 (en) 2018-11-29 2019-11-25 Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror

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JP2022509663A JP2022509663A (ja) 2022-01-21
JP2022509663A5 JP2022509663A5 (https=) 2022-12-05
JP7510418B2 true JP7510418B2 (ja) 2024-07-03

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US (1) US12111578B2 (https=)
EP (1) EP3887878B1 (https=)
JP (1) JP7510418B2 (https=)
DE (1) DE102018220629A1 (https=)
TW (1) TWI878252B (https=)
WO (1) WO2020109225A2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020207807A1 (de) 2020-06-24 2021-12-30 Carl Zeiss Smt Gmbh Optisches Element für eine EUV-Projektionsbelichtungsanlage
DE102020210553A1 (de) 2020-08-20 2022-03-24 Carl Zeiss Smt Gmbh Reflektierendes optisches Element, Beleuchtungsoptik, Projektionsbelichtungsanlage und Verfahren zum Bilden einer Schutzschicht
DE102020213639A1 (de) 2020-10-29 2022-05-05 Carl Zeiss Smt Gmbh Optisches Element, insbesondere zur Reflexion von EUV-Strahlung, optische Anordnung und Verfahren zum Herstellen eines optischen Elements
DE102022200526A1 (de) 2022-01-18 2022-10-13 Carl Zeiss Smt Gmbh Verfahren zur Herstellung einer Struktur auf einem Substrat sowie Vorrichtung zur Strukturherstellung mit einem derartigen Verfahren
DE102022202059A1 (de) 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
DE102022203644A1 (de) 2022-04-12 2023-04-20 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Substrats und eines reflektiven optischen Elements für die EUV-Lithographie
DE102022207052A1 (de) 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Spiegel für eine Projektionsbelichtungsanlage
DE102022208658A1 (de) 2022-08-22 2024-02-22 Carl Zeiss Smt Gmbh Zwischenprodukt zur Herstellung eines optischen Elements für eine Projektionsbelichtungsanlage, optisches Element für eine Projektionsbelichtungsanlage, Verfahren zur Herstellung eines Zwischenprodukts und Verfahren zur Herstellung eines optischen Elements

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010514204A (ja) 2006-12-22 2010-04-30 エーエスエムエル ネザーランズ ビー．ブイ． 照明システム、リソグラフィ装置、ミラー、ミラーから汚染を除去する方法、および、デバイス製造方法。
JP2011523782A (ja) 2008-05-30 2011-08-18 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタを形成する方法
JP2012235046A (ja) 2011-05-09 2012-11-29 Nikon Corp 光学ユニット、照明光学装置、露光装置及びデバイス製造方法
JP2018529117A (ja) 2015-09-03 2018-10-04 エーエスエムエル ネザーランズ ビー．ブイ． ビーム分割装置

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
US20020019305A1 (en) * 1996-10-31 2002-02-14 Che-Kuang Wu Gray scale all-glass photomasks
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
JP2002196320A (ja) * 2000-12-25 2002-07-12 Victor Co Of Japan Ltd 空間光変調素子
US6522465B1 (en) * 2001-09-27 2003-02-18 Intel Corporation Transmitting spectral filtering of high power extreme ultra-violet radiation
US6825988B2 (en) * 2002-09-04 2004-11-30 Intel Corporation Etched silicon diffraction gratings for use as EUV spectral purity filters
FR2921498B1 (fr) * 2007-09-25 2010-08-13 Commissariat Energie Atomique Dispositif optique dispersif a cristal photonique tridimensionnel.
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
TWI525353B (zh) * 2009-07-07 2016-03-11 加州太平洋生物科學公司 超高多工分析系統及方法
FR2954524B1 (fr) * 2009-12-17 2012-09-28 Ecole Polytech Reseau de diffraction reflechissant dielectrique optimise
WO2012119672A1 (en) * 2011-03-04 2012-09-13 Asml Netherlands B.V. Lithograpic apparatus, spectral purity filter and device manufacturing method
FR2987139B1 (fr) * 2012-02-21 2014-09-05 Commissariat Energie Atomique Dispositif optique de diffraction en reflexion a haute tenue au flux laser.
DE102012010093A1 (de) * 2012-05-23 2013-11-28 Carl Zeiss Smt Gmbh Facettenspiegel
US9435921B2 (en) * 2013-08-02 2016-09-06 Globalfoundries Inc. Blazed grating spectral purity filter and methods of making such a filter
WO2015052748A1 (ja) * 2013-10-07 2015-04-16 株式会社島津製作所 ブレーズド回折格子およびブレーズド回折格子の製造方法
EP3076208B1 (en) * 2015-04-04 2019-06-12 Fyzikální ústav AV CR, v.v.i. Multi-layer reflective diffraction grating and use thereof
DE102016213839A1 (de) * 2016-07-27 2016-12-15 Carl Zeiss Smt Gmbh Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels
US10458912B2 (en) * 2016-08-31 2019-10-29 Kla-Tencor Corporation Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity
CN112513688B (zh) * 2018-07-19 2023-05-26 应用材料公司 可变高度的斜向光栅方法
EP3719545A1 (en) * 2019-04-03 2020-10-07 ASML Netherlands B.V. Manufacturing a reflective diffraction grating
DE102019215829A1 (de) * 2019-10-15 2021-04-15 Asml Netherlands B.V. EUV-Kollektorspiegel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010514204A (ja) 2006-12-22 2010-04-30 エーエスエムエル ネザーランズ ビー．ブイ． 照明システム、リソグラフィ装置、ミラー、ミラーから汚染を除去する方法、および、デバイス製造方法。
JP2011523782A (ja) 2008-05-30 2011-08-18 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタを形成する方法
JP2012235046A (ja) 2011-05-09 2012-11-29 Nikon Corp 光学ユニット、照明光学装置、露光装置及びデバイス製造方法
JP2018529117A (ja) 2015-09-03 2018-10-04 エーエスエムエル ネザーランズ ビー．ブイ． ビーム分割装置

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WO2020109225A3 (en) 2020-07-30
TWI878252B (zh) 2025-04-01
US12111578B2 (en) 2024-10-08
TW202038016A (zh) 2020-10-16
EP3887878A2 (en) 2021-10-06
DE102018220629A1 (de) 2020-06-04
JP2022509663A (ja) 2022-01-21
EP3887878B1 (en) 2026-05-06
US20210263423A1 (en) 2021-08-26
WO2020109225A2 (en) 2020-06-04

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