DE102011119339A1 - Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas - Google Patents

Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas Download PDF

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Publication number
DE102011119339A1
DE102011119339A1 DE102011119339A DE102011119339A DE102011119339A1 DE 102011119339 A1 DE102011119339 A1 DE 102011119339A1 DE 102011119339 A DE102011119339 A DE 102011119339A DE 102011119339 A DE102011119339 A DE 102011119339A DE 102011119339 A1 DE102011119339 A1 DE 102011119339A1
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DE
Germany
Prior art keywords
sio
feedstock
liquid
droplets
expansion chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102011119339A
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German (de)
English (en)
Inventor
Heinz Fabian
Dr. Röper Jürgen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG filed Critical Heraeus Quarzglas GmbH and Co KG
Priority to DE102011119339A priority Critical patent/DE102011119339A1/de
Priority to KR1020147017200A priority patent/KR101625843B1/ko
Priority to PCT/EP2012/073345 priority patent/WO2013076195A1/de
Priority to CN201280057983.1A priority patent/CN103946168B/zh
Priority to JP2014542831A priority patent/JP6133319B2/ja
Priority to EP12794916.2A priority patent/EP2782877B1/de
Priority to US13/684,394 priority patent/US8984911B2/en
Publication of DE102011119339A1 publication Critical patent/DE102011119339A1/de
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/011—Manufacture of glass fibres or filaments starting from a liquid phase reaction process, e.g. through a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34—Liquid, e.g. mist or aerosol
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)
DE102011119339A 2011-11-25 2011-11-25 Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas Withdrawn DE102011119339A1 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE102011119339A DE102011119339A1 (de) 2011-11-25 2011-11-25 Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
KR1020147017200A KR101625843B1 (ko) 2011-11-25 2012-11-22 액체 실록산 출발 물질의 증기상 증착 및 분무화에 의한 합성 석영 유리 제조 방법
PCT/EP2012/073345 WO2013076195A1 (de) 2011-11-25 2012-11-22 Verfahren zur herstellung von synthetischem quarzglas durch abscheidung aus der dampfphase und mittels zerstäubung des flüssigen siloxaneinsatzmaterials
CN201280057983.1A CN103946168B (zh) 2011-11-25 2012-11-22 通过由蒸汽相沉积和借助液体硅氧烷原料制造合成石英玻璃的方法
JP2014542831A JP6133319B2 (ja) 2011-11-25 2012-11-22 気相からの堆積によって、かつ液状のシロキサン供給材料を霧化することによる合成石英ガラスの製造法
EP12794916.2A EP2782877B1 (de) 2011-11-25 2012-11-22 Verfahren zur herstellung von synthetischem quarzglas durch abscheidung aus der dampfphase und mittels zerstäubung des flüssigen siloxaneinsatzmaterials
US13/684,394 US8984911B2 (en) 2011-11-25 2012-11-23 Atomizing method for producing synthetic quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011119339A DE102011119339A1 (de) 2011-11-25 2011-11-25 Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas

Publications (1)

Publication Number Publication Date
DE102011119339A1 true DE102011119339A1 (de) 2013-05-29

Family

ID=48287834

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102011119339A Withdrawn DE102011119339A1 (de) 2011-11-25 2011-11-25 Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas

Country Status (7)

Country Link
US (1) US8984911B2 (https=)
EP (1) EP2782877B1 (https=)
JP (1) JP6133319B2 (https=)
KR (1) KR101625843B1 (https=)
CN (1) CN103946168B (https=)
DE (1) DE102011119339A1 (https=)
WO (1) WO2013076195A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011121190A1 (de) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS-Verdampfungsverfahren
CN104969099A (zh) 2012-09-26 2015-10-07 8797625加拿大有限公司 多层光干涉滤片
DE102013202256B3 (de) 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
US10464838B2 (en) * 2015-01-13 2019-11-05 Asi/Silica Machinery, Llc Enhanced particle deposition system and method
EP3424883A1 (de) * 2017-07-05 2019-01-09 Evonik Degussa GmbH Sprühverdampfung eines flüssigen rohstoffes zur herstellung von siliciumdioxid und metalloxiden
JP6793676B2 (ja) * 2018-04-02 2020-12-02 信越化学工業株式会社 光ファイバ用多孔質ガラス母材の製造装置および製造方法
CN109373196A (zh) * 2018-12-05 2019-02-22 上海正帆科技股份有限公司 一种八甲基环四硅氧烷的输送及汽化系统和方法
JP7058627B2 (ja) 2019-06-11 2022-04-22 信越化学工業株式会社 光ファイバ用多孔質ガラス母材の製造装置および製造方法
CN112028466B (zh) * 2020-09-01 2021-08-31 长飞光纤光缆股份有限公司 一种用于制备光纤预制棒的有机硅原料蒸发装置
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置
CN115583791B (zh) * 2022-10-18 2023-12-01 长飞光纤光缆股份有限公司 一种适用于ovd工艺的d4快速气化装置
CN117645406B (zh) * 2023-12-22 2025-08-01 湖北菲利华石英玻璃股份有限公司 一种低膨胀系数石英玻璃锭的生产方法及生产装置

Citations (1)

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Publication number Priority date Publication date Assignee Title
EP0463045A1 (en) 1989-03-15 1992-01-02 Tsl Group Plc IMPROVED VITREOUS SILICA PRODUCTS.

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Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0463045A1 (en) 1989-03-15 1992-01-02 Tsl Group Plc IMPROVED VITREOUS SILICA PRODUCTS.

Also Published As

Publication number Publication date
EP2782877B1 (de) 2016-05-25
US8984911B2 (en) 2015-03-24
CN103946168A (zh) 2014-07-23
CN103946168B (zh) 2017-02-22
KR20140098814A (ko) 2014-08-08
US20130133376A1 (en) 2013-05-30
EP2782877A1 (de) 2014-10-01
JP6133319B2 (ja) 2017-05-24
KR101625843B1 (ko) 2016-06-01
WO2013076195A1 (de) 2013-05-30
JP2015500785A (ja) 2015-01-08

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