DE102009052393B8 - Halbleiterherstellungsverfahren - Google Patents

Halbleiterherstellungsverfahren Download PDF

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Publication number
DE102009052393B8
DE102009052393B8 DE102009052393.6A DE102009052393A DE102009052393B8 DE 102009052393 B8 DE102009052393 B8 DE 102009052393B8 DE 102009052393 A DE102009052393 A DE 102009052393A DE 102009052393 B8 DE102009052393 B8 DE 102009052393B8
Authority
DE
Germany
Prior art keywords
semiconductor manufacturing
manufacturing processes
processes
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE102009052393.6A
Other languages
German (de)
English (en)
Other versions
DE102009052393A1 (de
DE102009052393B4 (de
Inventor
Yigal Alon
Yakov Shor
Semeon Altshuler
Maor Rotlain
Dror Horvitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micron Technology Inc
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of DE102009052393A1 publication Critical patent/DE102009052393A1/de
Publication of DE102009052393B4 publication Critical patent/DE102009052393B4/de
Application granted granted Critical
Publication of DE102009052393B8 publication Critical patent/DE102009052393B8/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/418—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials the conductive layers comprising transition metals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111—Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111—Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H10D64/0112—Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors using conductive layers comprising silicides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/056—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches
    • H10W20/057—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches by selectively depositing, e.g. by using selective CVD or plating
DE102009052393.6A 2008-12-31 2009-11-09 Halbleiterherstellungsverfahren Active DE102009052393B8 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/347,721 2008-12-31
US12/347,721 US8236691B2 (en) 2008-12-31 2008-12-31 Method of high aspect ratio plug fill

Publications (3)

Publication Number Publication Date
DE102009052393A1 DE102009052393A1 (de) 2010-07-01
DE102009052393B4 DE102009052393B4 (de) 2017-11-16
DE102009052393B8 true DE102009052393B8 (de) 2018-02-08

Family

ID=42221054

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102009052393.6A Active DE102009052393B8 (de) 2008-12-31 2009-11-09 Halbleiterherstellungsverfahren

Country Status (5)

Country Link
US (1) US8236691B2 (https=)
JP (1) JP2010157700A (https=)
CN (1) CN101770978B (https=)
DE (1) DE102009052393B8 (https=)
TW (1) TWI415218B (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12444651B2 (en) 2009-08-04 2025-10-14 Novellus Systems, Inc. Tungsten feature fill with nucleation inhibition
US10256142B2 (en) 2009-08-04 2019-04-09 Novellus Systems, Inc. Tungsten feature fill with nucleation inhibition
US11437269B2 (en) 2012-03-27 2022-09-06 Novellus Systems, Inc. Tungsten feature fill with nucleation inhibition
CN113862634A (zh) * 2012-03-27 2021-12-31 诺发系统公司 钨特征填充
CN104157562A (zh) * 2014-08-26 2014-11-19 上海华虹宏力半导体制造有限公司 半导体结构的形成方法
US9997405B2 (en) 2014-09-30 2018-06-12 Lam Research Corporation Feature fill with nucleation inhibition
US9972504B2 (en) 2015-08-07 2018-05-15 Lam Research Corporation Atomic layer etching of tungsten for enhanced tungsten deposition fill
US9640482B1 (en) * 2016-04-13 2017-05-02 United Microelectronics Corp. Semiconductor device with a contact plug and method of fabricating the same
KR102441431B1 (ko) * 2016-06-06 2022-09-06 어플라이드 머티어리얼스, 인코포레이티드 표면을 갖는 기판을 프로세싱 챔버에 포지셔닝하는 단계를 포함하는 프로세싱 방법
US10573522B2 (en) 2016-08-16 2020-02-25 Lam Research Corporation Method for preventing line bending during metal fill process
KR20250073535A (ko) 2017-08-14 2025-05-27 램 리써치 코포레이션 3차원 수직 nand 워드라인을 위한 금속 충진 프로세스
KR102806630B1 (ko) 2018-05-03 2025-05-12 램 리써치 코포레이션 3d nand 구조체들에 텅스텐 및 다른 금속들을 증착하는 방법
WO2020118100A1 (en) 2018-12-05 2020-06-11 Lam Research Corporation Void free low stress fill
WO2020123987A1 (en) 2018-12-14 2020-06-18 Lam Research Corporation Atomic layer deposition on 3d nand structures
SG11202108725XA (en) 2019-02-13 2021-09-29 Lam Res Corp Tungsten feature fill with inhibition control
WO2020210260A1 (en) 2019-04-11 2020-10-15 Lam Research Corporation High step coverage tungsten deposition
US12237221B2 (en) 2019-05-22 2025-02-25 Lam Research Corporation Nucleation-free tungsten deposition
WO2021030836A1 (en) 2019-08-12 2021-02-18 Lam Research Corporation Tungsten deposition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5834846A (en) * 1995-01-10 1998-11-10 Kawasaki Steel Corporation Semiconductor device with contact structure and method of manufacturing the same
US6180513B1 (en) * 1996-08-13 2001-01-30 Kabushiki Kaisha Toshiba Apparatus and method for manufacturing a semiconductor device having a multi-wiring layer structure
US6406998B1 (en) * 1996-02-05 2002-06-18 Micron Technology, Inc. Formation of silicided contact by ion implantation

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Publication number Priority date Publication date Assignee Title
CA2061119C (en) * 1991-04-19 1998-02-03 Pei-Ing P. Lee Method of depositing conductors in high aspect ratio apertures
JP3149887B2 (ja) * 1991-11-08 2001-03-26 新日本製鐵株式会社 スパッタ成膜方法及びスパッタ成膜装置
JPH08213610A (ja) * 1995-02-07 1996-08-20 Sony Corp 電界効果型半導体装置及びその製造方法
US5757879A (en) * 1995-06-07 1998-05-26 International Business Machines Corporation Tungsten absorber for x-ray mask
US5918141A (en) * 1997-06-20 1999-06-29 National Semiconductor Corporation Method of masking silicide deposition utilizing a photoresist mask
US6696746B1 (en) * 1998-04-29 2004-02-24 Micron Technology, Inc. Buried conductors
TW439102B (en) * 1998-12-02 2001-06-07 Nippon Electric Co Field effect transistor and method of manufacturing the same
US6686278B2 (en) * 2001-06-19 2004-02-03 United Microelectronics Corp. Method for forming a plug metal layer
TWI270180B (en) * 2004-06-21 2007-01-01 Powerchip Semiconductor Corp Flash memory cell and manufacturing method thereof
ITMI20070446A1 (it) * 2007-03-06 2008-09-07 St Microelectronics Srl Processo perfabbricare circuiti integrati formati su un substrato seminconduttore e comprendenti strati di tungsteno
US8372744B2 (en) * 2007-04-20 2013-02-12 International Business Machines Corporation Fabricating a contact rhodium structure by electroplating and electroplating composition
KR20090074561A (ko) * 2008-01-02 2009-07-07 주식회사 하이닉스반도체 반도체소자의 컨택 형성방법
US20100065949A1 (en) * 2008-09-17 2010-03-18 Andreas Thies Stacked Semiconductor Chips with Through Substrate Vias

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5834846A (en) * 1995-01-10 1998-11-10 Kawasaki Steel Corporation Semiconductor device with contact structure and method of manufacturing the same
US6406998B1 (en) * 1996-02-05 2002-06-18 Micron Technology, Inc. Formation of silicided contact by ion implantation
US6180513B1 (en) * 1996-08-13 2001-01-30 Kabushiki Kaisha Toshiba Apparatus and method for manufacturing a semiconductor device having a multi-wiring layer structure

Also Published As

Publication number Publication date
DE102009052393A1 (de) 2010-07-01
TW201029112A (en) 2010-08-01
DE102009052393B4 (de) 2017-11-16
US8236691B2 (en) 2012-08-07
CN101770978A (zh) 2010-07-07
JP2010157700A (ja) 2010-07-15
US20100167532A1 (en) 2010-07-01
TWI415218B (zh) 2013-11-11
CN101770978B (zh) 2014-04-16

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8127 New person/name/address of the applicant

Owner name: NUMONYX B.V., ROLLE, CH

8181 Inventor (new situation)

Inventor name: SHOR, YAKOV, BEER, SHEVA, IL

Inventor name: HORVITZ, DROR, BEAR TUVIYA, IL

Inventor name: ROTLAIN, MAOR, QIRYAT GAT, IL

Inventor name: ALTSHULER, SEMEON, RISHON LE ZION, IL

Inventor name: ALOH, YIGAL, GAN YAVNE, IL

R082 Change of representative

Representative=s name: SAMSON & PARTNER, PATENTANWAELTE, 80538 MUENCHEN,

Representative=s name: SAMSON & PARTNER, PATENTANWAELTE, DE

R081 Change of applicant/patentee

Owner name: MICRON TECHNOLOGY, INC., BOISE, US

Free format text: FORMER OWNER: NUMONYX B.V., ROLLE, CH

Effective date: 20120521

R082 Change of representative

Representative=s name: SAMSON & PARTNER, PATENTANWAELTE, DE

Effective date: 20120521

Representative=s name: SAMSON & PARTNER PATENTANWAELTE MBB, DE

Effective date: 20120521

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R083 Amendment of/additions to inventor(s)
R020 Patent grant now final
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: H01L0021285000

Ipc: H10D0064010000