DE102006024390B4 - Übertragungsvorrichtung - Google Patents

Übertragungsvorrichtung Download PDF

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Publication number
DE102006024390B4
DE102006024390B4 DE102006024390.0A DE102006024390A DE102006024390B4 DE 102006024390 B4 DE102006024390 B4 DE 102006024390B4 DE 102006024390 A DE102006024390 A DE 102006024390A DE 102006024390 B4 DE102006024390 B4 DE 102006024390B4
Authority
DE
Germany
Prior art keywords
die
gimbal
ultraviolet rays
transmission device
support body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE102006024390.0A
Other languages
German (de)
English (en)
Other versions
DE102006024390A1 (de
Inventor
Mitsunori Kokubo
Kentaro Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Publication of DE102006024390A1 publication Critical patent/DE102006024390A1/de
Application granted granted Critical
Publication of DE102006024390B4 publication Critical patent/DE102006024390B4/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
DE102006024390.0A 2005-05-25 2006-05-24 Übertragungsvorrichtung Active DE102006024390B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005153003A JP4701008B2 (ja) 2005-05-25 2005-05-25 ジンバル機構を備えた転写装置
JP2005-153003 2005-05-25

Publications (2)

Publication Number Publication Date
DE102006024390A1 DE102006024390A1 (de) 2006-11-30
DE102006024390B4 true DE102006024390B4 (de) 2016-12-29

Family

ID=37387904

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006024390.0A Active DE102006024390B4 (de) 2005-05-25 2006-05-24 Übertragungsvorrichtung

Country Status (5)

Country Link
US (1) US7448862B2 (https=)
JP (1) JP4701008B2 (https=)
KR (1) KR100764295B1 (https=)
DE (1) DE102006024390B4 (https=)
TW (1) TWI307314B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7648354B2 (en) * 2005-04-28 2010-01-19 Toshiba Kikai Kabushiki Kaisha Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
JP5517423B2 (ja) * 2008-08-26 2014-06-11 キヤノン株式会社 インプリント装置及びインプリント方法
JP5267174B2 (ja) * 2009-02-03 2013-08-21 ソニー株式会社 光造形装置及び造形ベース
JP4597254B1 (ja) * 2009-10-16 2010-12-15 株式会社ユアビジネス 回動体の回動構造
CN109501225B (zh) * 2018-12-31 2024-08-13 焦作飞鸿安全玻璃有限公司 一种注塑产品表面金属效果处理装置
US11567417B2 (en) 2021-01-20 2023-01-31 Applied Materials, Inc. Anti-slippery stamp landing ring
CN115872353B (zh) * 2022-12-06 2025-07-29 华中光电技术研究所(中国船舶集团有限公司第七一七研究所) 一种石英谐振梁芯片贴片装置和方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146601A (ja) * 2002-10-24 2004-05-20 National Institute Of Advanced Industrial & Technology アクティブダブルジョイント式加圧機構
US20050064054A1 (en) * 2003-09-24 2005-03-24 Canon Kabushiki Kaisha Pattern forming apparatus

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FR2151202A5 (https=) * 1971-08-25 1973-04-13 Lunetiers
US4316712A (en) * 1980-11-10 1982-02-23 Medendorp Roger L Press and actuator therefor
US4878826A (en) * 1987-12-07 1989-11-07 Wendt Michael L Apparatus for thermoforming plastic materials
US4907956A (en) * 1988-04-27 1990-03-13 Dainippon Ink And Chemicals, Inc. Apparatus for manufacturing optical information recording medium
US4969812A (en) * 1989-05-30 1990-11-13 Brown Gaylord W Fluid pressure operated apparatus for mounting a differential pressure mold on a platen
JP3230833B2 (ja) * 1992-03-27 2001-11-19 日立テクノエンジニアリング株式会社 ホットプレス
JPH11314231A (ja) * 1998-03-06 1999-11-16 Toshiba Corp 光学部品製造方法及びその装置
DE19819761C2 (de) * 1998-05-04 2000-05-31 Jenoptik Jena Gmbh Einrichtung zur Trennung eines geformten Substrates von einem Prägewerkzeug
DE19925175C1 (de) * 1999-05-27 2000-05-25 Jenoptik Jena Gmbh Einrichtung und Verfahren zur Übertragung von Mikrostrukturen
JP3558936B2 (ja) * 1999-11-10 2004-08-25 日本電信電話株式会社 薄膜形成装置
US6364648B1 (en) * 1999-12-21 2002-04-02 Johnson & Johnson Vision Care, Inc. Four axis casting fixture
US6808443B2 (en) * 2000-07-01 2004-10-26 Lam Research Corporation Projected gimbal point drive
JP2002251802A (ja) * 2001-02-23 2002-09-06 Sony Corp ディスク状記録媒体の製造方法及び金型装置
JP3679767B2 (ja) * 2002-02-26 2005-08-03 キヤノン株式会社 ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法
JP4395704B2 (ja) * 2002-05-17 2010-01-13 コニカミノルタホールディングス株式会社 成形装置
JP3472963B1 (ja) * 2002-05-30 2003-12-02 ミカドテクノス株式会社 高温用真空プレス装置
JP2004034300A (ja) 2002-06-28 2004-02-05 Elionix Kk 微小型押成形装置
MY164487A (en) * 2002-07-11 2017-12-29 Molecular Imprints Inc Step and repeat imprint lithography processes
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
JP4340086B2 (ja) * 2003-03-20 2009-10-07 株式会社日立製作所 ナノプリント用スタンパ、及び微細構造転写方法
JP4220282B2 (ja) 2003-03-20 2009-02-04 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
TW568349U (en) * 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
JP2004358857A (ja) 2003-06-06 2004-12-24 Meiki Co Ltd 微細な凹凸面を有する樹脂成形品の成形装置
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
JP4313109B2 (ja) * 2003-08-01 2009-08-12 明昌機工株式会社 高精度プレス機
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US7059198B2 (en) * 2004-08-17 2006-06-13 Amitkumar N. Dharia Apparatus to determine ability of plastic material to be shaped by thermoforming process
JP4500183B2 (ja) 2005-02-25 2010-07-14 東芝機械株式会社 転写装置
JP4700996B2 (ja) * 2005-04-19 2011-06-15 東芝機械株式会社 転写装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146601A (ja) * 2002-10-24 2004-05-20 National Institute Of Advanced Industrial & Technology アクティブダブルジョイント式加圧機構
US20050064054A1 (en) * 2003-09-24 2005-03-24 Canon Kabushiki Kaisha Pattern forming apparatus

Also Published As

Publication number Publication date
KR20060121743A (ko) 2006-11-29
JP4701008B2 (ja) 2011-06-15
TW200711852A (en) 2007-04-01
US7448862B2 (en) 2008-11-11
KR100764295B1 (ko) 2007-10-05
US20060269645A1 (en) 2006-11-30
TWI307314B (en) 2009-03-11
JP2006326992A (ja) 2006-12-07
DE102006024390A1 (de) 2006-11-30

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